Abstract: The present invention relates to a ruthenium-type dye and a making method thereof, and more particularly, to a ruthenium-type dye which is used to manufacture a dye-sensitized solar cell, drastically improves a molar extinction coefficient to enhance efficiency of a solar cell with only a small amount of a dye and oxide semiconductor particles, allows a thin film solar cell element to be manufactured without difficulty and sharply reduces manufacturing costs of a solar cell, and a making method thereof.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

Abstract: The present invention relates to a photosensitive resin composition, a preparation method thereof, and a dry film resist comprising the same. More particularly, the photosensitive resin composition of the present invention is directed to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator. According to the photosensitive resin composition and the dry film resist, it is easy to finely pattern using a laser direct image (LDI) with high density and the dry film has excellent sensitivity, resolution, and adhesiveness to the substrate.

Abstract: The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.

Abstract: Disclosed are a compound which works as electronic materials such as a molecular memory, a molecular switch, a molecular rectifier, a molecular wire, and so on, and a molecular electronic device including the same. The compound for molecular electronic device has the structure of following Formula 1, (MnRM)n??<Formula 1> wherein, R is a single molecule having an electrical conductivity, M is independently a repeating unit constituting a polymer having an electrical conductivity, and n is independently an integer ranging from 100 to 500.

Abstract: The present invention relates to a photosensitive resin composition, and more particularly, to a photosensitive resin composition for forming an over coating layer of a color filter. The photosensitive resin composition according to the present invention includes a UV absorber. The photosensitive resin composition according to the present invention adjusts line width and height of a pattern without difficulty, forms a linear pattern, provides good transmittance and is adequate to form the over coating layer of the color filter.

Abstract: The present invention provides a Pb free Ag paste composition for a PDP address electrode comprising a) 60 to 90% by weight of an Ag powder; b) 1 to 10% by weight of a Pb free inorganic binder; c) 0.001 to 1% by weight of an inorganic thickener; and d) 5 to 38% by weight of an alkali-soluble, negative photoresist composition for fine conductive powder dispersion. The Pb free Ag paste composition according to the invention i) is environment-friendly by using a Pb free inorganic binder, ii) is suitable for the fabrication of fine electrodes by using the prior electrode formation processes, iii) can apply the formed pattern to low temperature sintering processes of not higher than 600° C., iv) does not use a surfactant and stabilizer and has excellent printing, leveling and sintering performances by using an inorganic thickener and conductive Ag powder, and v) enables sintering to be carried out at a sintering target temperature without binder burning off zone.

Abstract: The present invention provides an ink for a color filter comprising a polymer binder, a crosslinking monomer, a solvent, a pigment, and a polymerization initiator. The polymer binder comprises acrylate or methacrylate including a hydroxy group. The polymer binder may comprise 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.

Abstract: The present invention relates to an alkali-soluble photosensitive resin composition and a dry film resist using the same, more particularly to a photosensitive resin composition having superior heat resistance, chemical resistance and long-time stability and good adhesivity to a Cu or ITO (indium tin oxide) substrate by containing an acrylate resin, which is effective in improving adhesivity, and a photosensitive dry film resist using the same.

Abstract: The present invention relates to a photosensitive resin composition, a preparation method thereof, and a dry film resist comprising the same. More particularly, the photosensitive resin composition of the present invention is directed to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphine oxide based photopolymerization initiator and an acridon based photopolymerization initiator. According to the photosensitive resin composition and the dry film resist, it is easy to finely pattern using a laser direct image with high density and the dry film has excellent sensitivity, resolution, and adhesiveness to the substrate.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: An ink composition comprising dipropylene glycol monomethyl ether acetate (DPMA). For example, an ink composition for a color filter includes a binder material, a monomer material, a polymerization initiator, a pigment dispersion, and a solvent including dipropylene glycol monomethyl ether acetate (DPMA).

Abstract: The present invention provides a Pb free Ag paste composition for a PDP address electrode comprising a) 60 to 90% by weight of an Ag powder; b) 1 to 10% by weight of a Pb free inorganic binder; c) 0.001 to 1% by weight of an inorganic thickener; and d) 5 to 38% by weight of an alkali-soluble, negative photoresist composition for fine conductive powder dispersion. The Pb free Ag paste composition according to the invention i) is environment-friendly by using a Pb free inorganic binder, ii) is suitable for the fabrication of fine electrodes by using the prior electrode formation processes, iii) can apply the formed pattern to low temperature sintering processes of not higher than 600° C., iv) does not use a surfactant and stabilizer and has excellent printing, leveling and sintering performances by using an inorganic thickener and conductive Ag powder, and v) enables sintering to be carried out at a sintering target temperature without binder burning off zone.

Abstract: The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

Abstract: Disclosed is an electric fan including a driving motor, a blower fan unit, and front and rear safety nets. A far infrared ray lamp part including a socket and a far infrared ray lamp is positioned in front of the blower fan unit. The front and rear safety nets are detachably fastened to each other by a fastening ring. A lamp protective net, which is covered with a stainless coating to be decreased in heat conductivity and heat-resistant, is placed in front of the far infrared ray lamp part where heat is generated.

Abstract: Disclosed is an electrically-driven portable dirt scrubber which is portable, and conveniently usable for diverse portions of the body while effectively scrubbing off foreign matters from the skin without any damage to the skin, thereby keeping the skin clean while providing a massage effect. The dirt scrubber includes a main body having a handle configured to be grasped by the user, a connecting assembly connected at one end thereof to the handle and configured to be longitudinally adjustable in length, and a head pivotally coupled to the other end of the connecting assembly, a power supply mounted in the main body and charged with electric power supplied from an external power source, a motor configured to be driven by electric power supplied from the power supply in accordance with a drive signal, thereby rotating the head, and a contact member attached to the outer surface of the head, and adapted to remove foreign matters from the skin of the user in accordance with rotation of the head.