Patents by Inventor Chan Yoo
Chan Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12696802Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: GrantFiled: September 23, 2022Date of Patent: July 28, 2026Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20230020689Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: ApplicationFiled: September 23, 2022Publication date: January 19, 2023Inventors: Chan Yoo, Todd O. Bolken
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Patent number: 11456286Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: GrantFiled: April 6, 2020Date of Patent: September 27, 2022Assignee: Micron Technology, Inc.Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20200243493Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: ApplicationFiled: April 6, 2020Publication date: July 30, 2020Inventors: Chan Yoo, Todd O. Bolken
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Patent number: 10615154Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: GrantFiled: March 30, 2018Date of Patent: April 7, 2020Assignee: Micron Technology, Inc.Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20200075548Abstract: Systems, devices, and methods for interconnects for a multi-die package are described. A multi-die package may include a set of conductive pillars and two or more semiconductor dice that each include a bond pad. In some cases, the multi-die package may include a plurality of pillar-wire combinations, and a bond wire may couple a corresponding conductive pillar with a corresponding bond pad. Pillar-wire combinations may each collectively have a matched impedance, or pillar-wire combinations in different groups may have different collective impedances. In other cases, a conductive pillar may be directly coupled with a corresponding bond pad without a bond wire. Different pillar-wire combinations or directly-coupled pillars may carry different signals. In some cases, pillars may be individually impedance-matched to a desired impedance.Type: ApplicationFiled: September 4, 2018Publication date: March 5, 2020Inventors: Kang-Yong Kim, Chan Yoo, Dong Soon Lim, Jaekyu Song
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Patent number: 10366934Abstract: A semiconductor die that includes a first die located on a first side of an interposer and a second die located on a second side of the interposer. Active sides of the first and second dies may each face the interposer. A bond wire may electrically connect the first die to the second side of the interposer and a bond wire may electrically connect the second die to the first side of the interposer. The bond wires may extend through a plurality of windows in the interposer. First and second dies may be attached to a first side of an interposer and may be electrically connected to a second side of the interposer through windows and third and fourth dies may be attached to a second side of the interposer and may be electrically connected to the first side of the interposer through windows.Type: GrantFiled: November 20, 2018Date of Patent: July 30, 2019Assignee: Micron Technology, Inc.Inventors: Chan Yoo, Akshay Singh, Yi Xu, Liana Foster, Steven Eskildsen
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Publication number: 20190088565Abstract: A semiconductor die that includes a first die located on a first side of an interposer and a second die located on a second side of the interposer. Active sides of the first and second dies may each face the interposer. A bond wire may electrically connect the first die to the second side of the interposer and a bond wire may electrically connect the second die to the first side of the interposer. The bond wires may extend through a plurality of windows in the interposer. First and second dies may be attached to a first side of an interposer and may be electrically connected to a second side of the interposer through windows and third and fourth dies may be attached to a second side of the interposer and may be electrically connected to the first side of the interposer through windows.Type: ApplicationFiled: November 20, 2018Publication date: March 21, 2019Inventors: Chan Yoo, Akshay Singh, Yi Xu, Liana Foster, Steven Eskildsen
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Publication number: 20180358275Abstract: A semiconductor die that includes a first die located on a first side of an interposer and a second die located on a second side of the interposer. Active sides of the first and second dies may each face the interposer. A bond wire may electrically connect the first die to the second side of the interposer and a bond wire may electrically connect the second die to the first side of the interposer. The bond wires may extend through a plurality of windows in the interposer. First and second dies may be attached to a first side of an interposer and may be electrically connected to a second side of the interposer through windows and third and fourth dies may be attached to a second side of the interposer and may be electrically connected to the first side of the interposer through windows.Type: ApplicationFiled: June 13, 2017Publication date: December 13, 2018Inventors: Chan Yoo, Akshay Singh, Yi Xu, Liana Foster, Steven Eskildsen
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Patent number: 10153221Abstract: A semiconductor die that includes a first die located on a first side of an interposer and a second die located on a second side of the interposer. Active sides of the first and second dies may each face the interposer. A bond wire may electrically connect the first die to the second side of the interposer and a bond wire may electrically connect the second die to the first side of the interposer. The bond wires may extend through a plurality of windows in the interposer. First and second dies may be attached to a first side of an interposer and may be electrically connected to a second side of the interposer through windows and third and fourth dies may be attached to a second side of the interposer and may be electrically connected to the first side of the interposer through windows.Type: GrantFiled: June 13, 2017Date of Patent: December 11, 2018Assignee: MICRON TECHNOLOGY, INC.Inventors: Chan Yoo, Akshay Singh, Yi Xu, Liana Foster, Steven Eskildsen
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Publication number: 20180226387Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: ApplicationFiled: March 30, 2018Publication date: August 9, 2018Inventors: Chan Yoo, Todd O. Bolken
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Patent number: 9978730Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: GrantFiled: October 25, 2016Date of Patent: May 22, 2018Assignee: Micron Technology, Inc.Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20170040303Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: ApplicationFiled: October 25, 2016Publication date: February 9, 2017Inventors: Chan Yoo, Todd O. Bolken
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Patent number: 9508686Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: GrantFiled: December 8, 2014Date of Patent: November 29, 2016Assignee: Micron Technology, Inc.Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20150137365Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: ApplicationFiled: December 8, 2014Publication date: May 21, 2015Applicant: MICRON TECHNOLOGY, INC.Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20150010986Abstract: Provided are a new microalgae strain and a use thereof, and more particularly, Ettlia sp. YC001 (KCTC 12109BP) having high carbon dioxide fixability, lipid productivity and carotenoid productivity, and a use thereof. The strain may be used for producing high quality biodiesel by controlling a lipid content and a composition ratio of a fatty acid according to culture conditions and/or culture time, and may be easily used for industrial uses, for examples, cosmetics, health foods, and medicines since large amounts of carotenoid and pigments are accumulated in cells.Type: ApplicationFiled: April 4, 2012Publication date: January 8, 2015Inventors: Hee Mock Oh, Chan Yoo, Gang Guk Choi, Hee Sik Kim, Hyun Joon La, Chi Yong Ahn
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Patent number: 8906743Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: GrantFiled: January 11, 2013Date of Patent: December 9, 2014Assignee: Micron Technology, Inc.Inventors: Chan Yoo, Todd O. Bolken
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Publication number: 20140197526Abstract: Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a spacer material on an encapsulant such that the encapsulant separates the spacer material from an active surface of a semiconductor device and at least one interconnect projecting away from the active surface. The method further includes molding the encapsulant such that at least a portion of the interconnect extends through the encapsulant and into the spacer material. The interconnect can include a contact surface that is substantially co-planar with the active surface of the semiconductor device for providing an electrical connection with the semiconductor device.Type: ApplicationFiled: January 11, 2013Publication date: July 17, 2014Applicant: MICRON TECHNOLOGY, INC.Inventors: Chan Yoo, Todd O. Bolken
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Patent number: 6934455Abstract: Optical waveguides with power monitoring or optical detection capabilities are disclosed. The waveguide includes a lower cladding, a core disposed on the lower cladding, an upper cladding disposed on the core and a trench extending transversely through a distal end of the lower cladding, core and upper cladding. The trench includes a distal wall that provides a reflective surface disposed at an angle relative to the end of the core of greater than 90°. A detector is disposed above the trench for receiving a reflected light beam off of the reflective surface. Various methods of manufacturing these devices are also disclosed.Type: GrantFiled: December 24, 2002Date of Patent: August 23, 2005Assignee: Intel CorporationInventors: Michael Skinner, Bidhan Chaudhuri, Chan Yoo, Mahmood Toofan, Gabel Chong, Achintya Bhowmik
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Publication number: 20040120675Abstract: Optical waveguides with power monitoring or optical detection capabilities are disclosed. The waveguide includes a lower cladding, a core disposed on the lower cladding, an upper cladding disposed on the core and a trench extending transversely through a distal end of the lower cladding, core and upper cladding. The trench includes a distal wall that provides a reflective surface disposed at an angle relative to the end of the core of greater than 90°. A detector is disposed above the trench for receiving a reflected light beam off of the reflective surface. Various methods of manufacturing these devices are also disclosed.Type: ApplicationFiled: December 24, 2002Publication date: June 24, 2004Inventors: Michael Skinner, Bidhan Chaudhuri, Chan Yoo, Mahmood Toofan, Gabel Chong, Achintya Bhowmik