Abstract: An exemplary embodiment of the present disclosure provides a chip-scale atomic beam system comprising an atomic vapor source, a plurality of channels, and a propagation chamber. The atomic vapor source chamber can comprise an atomic vapor source configured to emit an atomic vapor. The plurality of channels can have first ends and second ends. The first ends can be in fluid communication with the atomic vapor source chamber. The plurality of channels can be configured to collimate the atomic vapor as it moves through the plurality of channels from the first ends to the second ends. The propagation chamber can be in fluid communication with the second ends of the plurality of channels. The propagation chamber can have an internal pressure less than an internal pressure of the atomic vapor source chamber to enable the collimated atomic vapor to propagate through the propagation chamber.

Abstract: The present disclosure provides an aerosol particle detection system comprising an incoherent light source configured to generate incoherent light, a first mirror and a second mirror positioned to define an optical cavity region therebetween, wherein the optical cavity region receives the incoherent light and allows particles to pass through, and a photodetector positioned to detect transmitted light that has passed through the optical cavity region, wherein the photodetector detects changes in intensity of the transmitted light caused by particles passing through the optical cavity region. The incoherent light source comprises a light-emitting diode configured to emit blue light having a wavelength centered at approximately 430 nanometers. The optical cavity region has a length of approximately 6-10 millimeters. The system further comprises an enclosure defining the optical cavity region with an opening configured to allow particles to enter.

Abstract: An exemplary embodiment of the present disclosure provides a chip-scale atomic beam system comprising an atomic vapor source, a plurality of channels, and a propagation chamber. The atomic vapor source chamber can comprise an atomic vapor source configured to emit an atomic vapor. The plurality of channels can have first ends and second ends. The first ends can be in fluid communication with the atomic vapor source chamber. The plurality of channels can be configured to collimate the atomic vapor as it moves through the plurality of channels from the first ends to the second ends. The propagation chamber can be in fluid communication with the second ends of the plurality of channels. The propagation chamber can have an internal pressure less than an internal pressure of the atomic vapor source chamber to enable the collimated atomic vapor to propagate through the propagation chamber.

Abstract: An exemplary embodiment of the present disclosure provides a chip-scale atomic beam system comprising an atomic vapor source, a plurality of channels, and a propagation chamber. The atomic vapor source chamber can comprise an atomic vapor source configured to emit an atomic vapor. The plurality of channels can have first ends and second ends. The first ends can be in fluid communication with the atomic vapor source chamber. The plurality of channels can be configured to collimate the atomic vapor as it moves through the plurality of channels from the first ends to the second ends. The propagation chamber can be in fluid communication with the second ends of the plurality of channels. The propagation chamber can have an internal pressure less than an internal pressure of the atomic vapor source chamber to enable the collimated atomic vapor to propagate through the propagation chamber.

Abstract: An exemplary embodiment of the present disclosure provides a method of sensing at least one characteristic of an analyte comprising: flowing media with the analyte through one or more microcavities; energizing the microcavity; and sensing at least one of the characteristics of the analyte via interrogation of the energized microcavity. Each of the one or more microcavities can comprise: a first mirror on a first planar surface; a second mirror on a second planar surface opposing the first planar surface; and at least one spacer between the first and second mirrors. The first mirror, second mirror, and at least one spacer can define a channel having an inlet and an outlet. The first and second mirrors can be positioned between the inlet and outlet.

Abstract: An exemplary embodiment of the present disclosure provides a collimated atomic beam generator. The generator can comprise an atomic vapor chamber, a collimator plate, and an insulative adhesive layer. The atomic vapor chamber can comprise an atomic vapor source. The collimator plate can comprise a first side facing the atomic vapor chamber, an opposing second side, and a plurality of channels extending between the first side and the second side. The insulative adhesive layer can be positioned between and coupling the atomic vapor chamber to the collimator plate. The collimator plate can be configured to collimate atomic vapors generated by the atomic vapor source in the atomic vapor chamber.

Abstract: Embodiments of the present disclosure relate to atomic beam collimators and, more particularly, to miniaturized coplanar atomic beam collimators. In some examples, an atomic beam collimator may comprise an atomic channel disposed in a substrate. Additional atomic channels may be provided coplanar with the first atomic channel in the substrate. Some examples include a series of cascaded atomic channels, each cascaded atomic channel separated by a gap. The gaps may reduce the off-flux atoms in the output of the atomic collimator. In some examples, a system may comprise an atomic collimator, an atom source, and/or a microelectromechanical system device. These component can be separate devices or can be incorporated into a common substrate.

Abstract: Embodiments of the present disclosure relate to atomic beam collimators and, more particularly, to miniaturized coplanar atomic beam collimators. In some examples, an atomic beam collimator may comprise an atomic channel disposed in a substrate. Additional atomic channels may be provided coplanar with the first atomic channel in the substrate. Some examples include a series of cascaded atomic channels, each cascaded atomic channel separated by a gap. The one or gaps may reduce the off-flux atoms in the output of the atomic collimator. In some examples, a system may comprise an atomic collimator, an atom source, and/or a micro-electromechanical system device. These component can be separate devices or can be incorporated into a common substrate.