Abstract: A reaction apparatus for atomic layer deposition includes a vacuum chamber having a gas inlet, a gas outlet, and a gas flow path for connecting the gas inlet and the gas outlet; a reactor located in the vacuum chamber, including a reaction chamber where a first gas, which is input through the gas flow path, reacts with a specimen in the reaction chamber, the reactor further including a gas distributor, which is located in the reaction chamber to evenly supply the gas; a specimen location controller for moving the specimen located in the vacuum chamber to the reaction chamber; and an analyzer, which is connected to the reaction chamber, for analyzing a second gas generated in the reaction chamber. The apparatus is able to deposit uniform atomic layers on a specimen by maintaining the pressure and flow of reactant gas and can deposit and analyze an atomic layer simultaneously.

Abstract: An X-ray photoelectron spectroscopy includes an X-ray generator generating an X-ray, a collimator collimating the X-ray generated in the X-ray generator, a monochromator for converting the collimated X-ray into a single wavelength X-ray and reflecting the single wavelength X-ray to a test sample, the monochromator being installed to be displaceable and rotatable in response to an irradiating direction of the X-ray, an analysis chamber in which the test sample is disposed, the analysis chamber being installed to be rotatable in response to the displacement of the monochromator so as to allow the single wavelength to be accurately irradiated to the test sample, an energy analyzer for measuring kinetic energy of an electron that is emitted from the test sample by the single wavelength X-ray, and an electron detector for detecting an electron passing to the energy analyzer.

Abstract: Provided is an in-situ analysis method for an atomic layer deposition (ALD) process. The provided method includes transferring a substrate to a reaction chamber in a vacuum container, depositing an atomic layer on the upper surface of the substrate, and analyzing the state of the atomic layer to determine the quality of the atomic layer in real time. Using the method decreases failure and the cost for additional analysis.

Abstract: A reaction apparatus for atomic layer deposition includes a vacuum chamber having a gas inlet, a gas outlet, and a gas flow path for connecting the gas inlet and the gas outlet; a reactor located in the vacuum chamber, including a reaction chamber where a first gas, which is input through the gas flow path, reacts with a specimen in the reaction chamber, the reactor further including a gas distributor, which is located in the reaction chamber to evenly supply the gas; a specimen location controller for moving the specimen located in the vacuum chamber to the reaction chamber; and an analyzer, which is connected to the reaction chamber, for analyzing a second gas generated in the reaction chamber. The apparatus is able to deposit uniform atomic layers on a specimen by maintaining the pressure and flow of reactant gas and can deposit and analyze an atomic layer simultaneously.

Abstract: An electron spectroscopic analyzer using X-rays is provided. The electron spectroscopic analyzer includes an X-ray generator for generating X-rays, an optical system for detecting charged particles emitted from an object irradiated with the X-rays to analyze the object, a vacuum system whose inside is maintained at a low pressure near to vacuum pressure, the vacuum system being provided between the X-ray generator and the optical system, and a blocking unit provided between the X-ray generator and the optical system for preventing elements other than the X-rays emitted from the X-ray generator from flowing into the optical system.

Abstract: An electron spectroscopic analyzer using X-rays is provided. The electron spectroscopic analyzer includes an X-ray generator for generating X-rays, an optical system for detecting charged particles emitted from an object irradiated with the X-rays to analyze the object, a vacuum system whose inside is maintained at a low pressure near to vacuum pressure, the vacuum system being provided between the X-ray generator and the optical system, and a blocking unit provided between the X-ray generator and the optical system for preventing elements other than the X-rays emitted from the X-ray generator from flowing into the optical system.

Abstract: A catalyst for purifying exhaust gases from diesel engines with an improved purification efficiency for both nitrogen oxide and particulates in exhaust emissions is provided. The catalyst includes: (i) a first catalytic layer containing a carrier portion including iron (Fe)-doped modified zirconium dioxide, and a catalyst portion including a material selected from the group consisting of copper (Cu), copper oxide, and mixtures thereof, and (ii) a second catalytic layer containing a carrier portion including Cu-doped modified zirconium dioxide, a main catalyst portion including platinum (Pt) and tin (Sn), and a co-catalyst portion including copper oxide. The catalyst portion of the first catalytic layer may contain palladium (Pd) instead of Cu.

Abstract: A ceramic heater for a gas sensor has a heater substrate, a laminating substrate made of the same material as the heater substrate, and an electrode made of platinum and at least one lanthanide oxide disposed between the heater substrate and the laminating substrates. The ceramic heater exhibits improved durability without migration patterns, is free of cracks on the substrate, is free of short circuits in the heat electrode and is low in production cost.

Abstract: A wide-range air fuel ratio oxygen sensor including a pump cell, a sensor cell, and a porous diffusion layer interposed between the pump cell and the sensor cell and a method for fabricating the oxygen sensor. The oxygen sensor generates output pumping current with a very small dispersion range of about .+-.2% by virtue of the activation effect of the catalyst such as Pt mixed into Al.sub.2 O.sub.3 of the porous diffusion layer.