Patents by Inventor Chang C. Tsuei

Chang C. Tsuei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8954125
    Abstract: Low-loss superconducting devices and methods for fabricating low loss superconducting devices. For example, superconducting devices, such as superconducting resonator devices, are formed with a (200)-oriented texture titanium nitride (TiN) layer to provide high Q, low loss resonator structures particularly suitable for application to radio-frequency (RF) and/or microwave superconducting resonators, such as coplanar waveguide superconducting resonators. In one aspect, a method of forming a superconducting device includes forming a silicon nitride (SiN) seed layer on a substrate, and forming a (200)-oriented texture titanium nitride (TiN) layer on the SiN seed layer.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: February 10, 2015
    Assignees: International Business Machines Corporation, The United States of America, as represented by the Secretary of Commerce, The National Institute of Standards
    Inventors: Antonio D. Corcoles Gonzalez, Jiansong Gao, Dustin A. Hite, George A. Keefe, David P. Pappas, Mary E. Rothwell, Matthias Steffen, Chang C. Tsuei, Michael R. Vissers, David S. Wisbey
  • Publication number: 20130029848
    Abstract: Low-loss superconducting devices and methods for fabricating low loss superconducting devices. For example, superconducting devices, such as superconducting resonator devices, are formed with a (200)-oriented texture titanium nitride (TiN) layer to provide high Q, low loss resonator structures particularly suitable for application to radio-frequency (RF) and/or microwave superconducting resonators, such as coplanar waveguide superconducting resonators. In one aspect, a method of forming a superconducting device includes foaming a silicon nitride (SiN) seed layer on a substrate, and forming a (200)-oriented texture titanium nitride (TiN) layer on the SiN seed layer.
    Type: Application
    Filed: July 28, 2011
    Publication date: January 31, 2013
    Applicant: International Business Machines Corporation
    Inventors: Antonio D. Corcoles Gonzalez, Jiansong Gao, Dustin A. Hite, George A. Keefe, David P. Pappas, Mary E. Rothwell, Matthias Steffen, Chang C. Tsuei, Michael R. Vissers, David S. Wisbey
  • Patent number: 7534710
    Abstract: The present invention relates to a device structure that contains two or more conducting layers, two peripheral insulating layers, one or more intermediate insulating layers, and two or more conductive contacts. The two or more conducting layers are sandwiched between the two peripheral insulating layers, and they are spaced apart by the intermediate insulating layers to form two or more quantum wells. Each of the conductive contacts is directly and selectively connected with one of the conducting layers, so the individual quantum wells can be selectively accessed through the conductive contacts. Such a device structure preferably contains a coupled quantum well devices having two or more quantum wells that can be coupled together by inter-well tunneling effect at degenerate energy levels. More preferably, the device structure contains a memory cell having three quantum wells that can be arranged and constructed to define two different memory states.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: May 19, 2009
    Assignee: International Business Machines Corporation
    Inventors: Yasunao Katayama, Dennis M. Newns, Chang C. Tsuei
  • Patent number: 6890766
    Abstract: A microelectronic device includes a gate layer adapted to receive an input voltage. An insulating layer is formed on the gate layer, and a conductive channel layer is formed on the insulating layer and carries current between a source and a drain. The conductive channel layer is adapted to provide a dual channel. The dual channel includes both a p-channel and an n-channel wherein one of the p-channel and the n-channel are selectively enabled responsive to the input voltage polarity. A method for forming the device and applications are also disclosed and claimed.
    Type: Grant
    Filed: April 21, 2003
    Date of Patent: May 10, 2005
    Assignee: International Business Machines Corporation
    Inventors: Thomas Doderer, Wei Hwang, Chang C. Tsuei
  • Patent number: 6649929
    Abstract: A method and structure for a d-wave qubit structure includes a qubit disk formed at a multi-crystal junction (or qubit ring) and a superconducting screening structure surrounding the qubit. The structure may also include a superconducting sensing loop, where the superconducting sensing loop comprises an s-wave superconducting ring. The structure may also include a superconducting field effect transistor.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: November 18, 2003
    Assignee: International Business Machines Corporation
    Inventors: Dennis M. Newns, Chang C. Tsuei
  • Publication number: 20030201495
    Abstract: A microelectronic device includes a gate layer adapted to receive an input voltage. An insulating layer is formed on the gate layer, and a conductive channel layer is formed on the insulating layer and carries current between a source and a drain. The conductive channel layer is adapted to provide a dual channel. The dual channel includes both a p-channel and an n-channel wherein one of the p-channel and the n-channel are selectively enabled responsive to the input voltage polarity. A method for forming the device and applications are also disclosed and claimed.
    Type: Application
    Filed: April 21, 2003
    Publication date: October 30, 2003
    Inventors: Thomas Doderer, Wei Hwang, Chang C. Tsuei
  • Publication number: 20030094606
    Abstract: A method and structure for a d-wave qubit structure includes a qubit disk formed at a multi-crystal junction (or qubit ring) and a superconducting screening structure surrounding the qubit. The structure may also include a superconducting sensing loop, where the superconducting sensing loop comprises an s-wave superconducting ring. The structure may also include a superconducting field effect transistor.
    Type: Application
    Filed: May 16, 2002
    Publication date: May 22, 2003
    Inventors: Dennis M. Newns, Chang C. Tsuei
  • Patent number: 6495854
    Abstract: A method and structure for a d-wave qubit structure includes a qubit disk formed at a multi-crystal junction (or qubit ring) and a superconducting screening structure surrounding the qubit. The structure may also include a superconducting sensing loop, where the superconducting sensing loop comprises an s-wave superconducting ring. The structure may also include a superconducting field effect transistor.
    Type: Grant
    Filed: December 30, 1999
    Date of Patent: December 17, 2002
    Assignee: International Business Machines Corporation
    Inventors: Dennis M. Newns, Chang C. Tsuei
  • Patent number: 5278140
    Abstract: A method is disclosed for fabricating grain boundary junction devices, which comprises preparing a crystalline substrate containing at least one grain boundary therein, epitaxially depositing a high Tc superconducting layer on the substrate, patterning the superconducting layer to leave at least two superconducting regions on either side of the grain boundary and making electrical contacts to the superconducting regions so that bias currents can be produced across the grain boundary.
    Type: Grant
    Filed: September 16, 1992
    Date of Patent: January 11, 1994
    Assignee: International Business Machines Corporation
    Inventors: Praveen Chaudhari, Cheng-Chung J. Chi, Duane B. Dimos, Jochen D. Mannhart, Chang C. Tsuei
  • Patent number: 5162298
    Abstract: High T.sub.c superconducting devices are described in which controlled grain boundaries in a layer of the superconductors forms a weak link or barrier between superconducting grains of the layer. A method is described for reproducibly fabricating these devices, including first preparing a substrate to include at least one grain boundary therein. A high T.sub.c superconductor layer is then epitaxially deposited on the substrate in order to produce a corresponding grain boundary in the superconducting layer. This superconducting layer is then patterned to leave at least two regions on either side of the grain boundary, the two regions functioning as contact areas for a barrier device including the grain boundary as a current flow barrier. Electrical contacts can be made to the superconducting regions so that bias currents can be produced across the grain boundary which acts as a tunnel barrier or weak link connection.
    Type: Grant
    Filed: February 16, 1988
    Date of Patent: November 10, 1992
    Assignee: International Business Machines Corporation
    Inventors: Praveen Chaudhari, Cheng-Chung J. Chi, Duane B. Dimos, Jochen D. Mannhart, Chang C. Tsuei