Patents by Inventor Chang-Chu Yao

Chang-Chu Yao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for automatic purge of HMDS vapor piping
    Patent number: 6019849
    Abstract: A number of air actuated valves are added to a conventional apparatus for treating semiconductor wafers with HMDS, hexamethyl-disilazane, vapor to improve the adhesion between the wafers and resist layers. These valves allow for automatic purging of the HMDS vapor from the pipes in the apparatus by dry nitrogen thereby preventing HMDS vapor condensation in the pipes which leads to contamination of the HMDS supply. The valve system prevents any backstreaming of nitrogen gas into the HMDS supply tank.
    Type: Grant
    Filed: December 22, 1997
    Date of Patent: February 1, 2000
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Chang Chu Yao, Tsun-Ching Lin, Jo-Fei Wang, Hsiao-Lan Yeh
  • Method and apparatus for automatic purge of HMDS vapor piping
    Patent number: 5763006
    Abstract: A number of air actuated valves are added to a conventional apparatus for treating semiconductor wafers with HMDS, hexamethyl-disilazane, vapor to improve the adhesion between the wafers and resist layers. These valves allow for automatic purging of the HMDS vapor from the pipes in the apparatus by dry nitrogen thereby preventing HMDS vapor condensation in the pipes which leads to contamination of the HMDS supply. The valve system prevents any backstreaming of nitrogen gas into the HMDS supply tank.
    Type: Grant
    Filed: October 4, 1996
    Date of Patent: June 9, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chang-Chu Yao, Tsun-Ching Lin, Jo-Fei Wang, Hsiao-Lan Yeh