Patents by Inventor Chang-Hoon YUN

Chang-Hoon YUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11242601
    Abstract: According to an embodiment of the present invention, a substrate processing apparatus includes: a chamber in which a process for a substrate is performed; a showerhead installed in the chamber to inject a reaction gas toward the substrate; and a susceptor installed below the showerhead to support the substrate. Here, the showerhead includes: a showerhead main body including an inner space to which the reaction gas is supplied from the outside and a plurality of injection holes configured to inject the reaction gas while communicating with the inner space; an inflow plate installed in the inner space to divide the inner space into an inflow space and a buffer space and including a plurality of inflow holes configured to allow the inflow space and the buffer space to communicate with each other; and a plurality of adjustment plates installed on the inflow holes in a movable manner, respectively, and configured to restrict movement of the reaction gas from the inflow space to the buffer space.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: February 8, 2022
    Assignee: EUGENE TECHNOLOGY CO., LTD.
    Inventors: Sung Tae Je, Chan Yong Park, Jae Ho Lee, Gil Sun Jang, Chang Hoon Yun, Han June Lim, Woo Young Kang
  • Publication number: 20200263303
    Abstract: According to an embodiment of the present invention, a substrate processing apparatus includes: a chamber in which a process for a substrate is performed; a showerhead installed in the chamber to inject a reaction gas toward the substrate; and a susceptor installed below the showerhead to support the substrate. Here, the showerhead includes: a showerhead main body including an inner space to which the reaction gas is supplied from the outside and a plurality of injection holes configured to inject the reaction gas while communicating with the inner space; an inflow plate installed in the inner space to divide the inner space into an inflow space and a buffer space and including a plurality of inflow holes configured to allow the inflow space and the buffer space to communicate with each other; and a plurality of adjustment plates installed on the inflow holes in a movable manner, respectively, and configured to restrict movement of the reaction gas from the inflow space to the buffer space.
    Type: Application
    Filed: September 7, 2018
    Publication date: August 20, 2020
    Applicant: EUGENE TECHNOLOGY CO., LTD.
    Inventors: Sung Tae JE, Chan Yong PARK, Jae Ho LEE, Gil Sun JANG, Chang Hoon YUN, Han June LIM, Woo Young KANG
  • Patent number: 10145012
    Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a lower chamber having an opened upper side, an upper chamber opening or closing the upper side of the lower chamber, the upper chamber defining an inner space, in which a process is performed on a substrate, together with the lower chamber, a showerhead disposed on a lower portion of the upper chamber to supply a reaction gas toward the inner space, wherein a buffer space is defined between the showerhead and the upper chamber, a partition member disposed in the buffer space to partition the buffer space into a plurality of diffusion regions, and a plurality of gas supply ports disposed in the upper chamber to supply the reaction gas toward each of the diffusion regions.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: December 4, 2018
    Assignee: EUGENE TECHNOLOGY CO., LTD.
    Inventors: Sung-Tae Je, Gil Sun Jang, Chang-Hoon Yun, Kyong-Hun Kim
  • Publication number: 20160289831
    Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a lower chamber having an opened upper side, an upper chamber opening or closing the upper side of the lower chamber, the upper chamber defining an inner space, in which a process is performed on a substrate, together with the lower chamber, a showerhead disposed on a lower portion of the upper chamber to supply a reaction gas toward the inner space, wherein a buffer space is defined between the showerhead and the upper chamber, a partition member disposed in the buffer space to partition the buffer space into a plurality of diffusion regions, and a plurality of gas supply ports disposed in the upper chamber to supply the reaction gas toward each of the diffusion regions.
    Type: Application
    Filed: December 10, 2014
    Publication date: October 6, 2016
    Applicant: EUGENE TECHNOLOGY CO., LTD.
    Inventors: Sung-Tae JE, Gil Sun JANG, Chang-Hoon YUN, Kyong-Hun KIM