Abstract: A tilting device for repeatedly tilting light reflected from a micro-mirror device, and a vibration type tilting device and an image projection device having the tilting device are disclosed, which uses viscous fluids to improve vibration performance. A vibration type tilting device, comprising a tilting part which vibrates periodically to tilt an incident light by a predetermined angle, and a driving part which provides driving power to the tilting part, may not only provide a smooth and natural display by periodically tilting light reflected from a digital micro-mirror device in constant time intervals but also may reduce overshooting and residual vibration of the tilting part.

Abstract: The present invention relates, in general, to an optical pickup actuator and, more particularly, to an optical pickup actuator, in which a depression (120) is formed in a center portion of a rear surface of a wire holder (100) to be depressed, and the position of a bobbin (20) is adjusted by straining wires (30) while a center portion of a printed circuit board (200), closely attached to the rear surface of the wire holder, is pressurized using a control screw (300) to allow the printed circuit board to be arcuately deformed.

Abstract: A sofa equipped with a radiant heating mattress for fomentation and/or massage, wherein a bed part equipped with the radiant heating mattress and a heating system internally built therein is mounted on one side of a seat part of the sofa, thereby allowing a user to rest comfortably and to enjoy fomentation and health massages by anions and far infrared rays from the radiant heating mattress of the bed part, with the use of sofa. The sofa has the seat part, a back part, an arm part and a frame, wherein one side of the seat part constitutes the bed part which is formed of a flat board having a wide area and is equipped with the radiant heating mattress produced with a board made of jade, gold-coated board, stone, mixture of yellow earth and hardwood charcoals, or ceramics so as to emit anions and far infrared rays.

Abstract: An apparatus for thermal treatment of a thin film wafer is disclosed including a vacuum chamber (10) with a heater assembly (20) positioned in the vacuum chamber (10) and a clamp (31) which presses against the wafer positioned on the heater assembly (20) with the force of the weight of the clamp (31). A vacuum generator (60) forms a vacuum in the vacuum chamber (10) and a gas supply network (100) supplies gas into the vacuum chamber (20) to provide a uniform temperature for the thermal treatment of the wafer. A wafer supply mechanism (50) supplies the wafer to the clamp (31) for thermal treatment.