Patents by Inventor Chang-Jun Kim
Chang-Jun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240136531Abstract: A conductive composite material, a method of preparing the same, and a secondary battery including the same. The conductive composite material may increase the proportion of an active material when forming an electrode by chemically bonding a conductive material and a binder to each other. A method of preparing the conductive composite material comprises ionizing carbon-based particles in a predetermined polarity, ionizing PTFE particles in a polarity different from that of the carbon-based particles, and chemically bonding the ionized carbon-based particles and the ionized PTFE particles, which are ionized in different polarities, to each other.Type: ApplicationFiled: September 20, 2023Publication date: April 25, 2024Inventors: Seung Min Oh, Sung Ho Ban, Sang Hun Lee, Ko Eun Kim, Yoon Sung Lee, Chang Hoon Song, Hyeong Jun Choi, Jun Myoung Sheem, Jin Kyo Koo, Young Jun Kim
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Patent number: 11949881Abstract: The present invention discloses an encoding apparatus using a Discrete Cosine Transform (DCT) scanning, which includes a mode selection means for selecting an optimal mode for intra prediction; an intra prediction means for performing intra prediction onto video inputted based on the mode selected in the mode selection means; a DCT and quantization means for performing DCT and quantization onto residual coefficients of a block outputted from the intra prediction means; and an entropy encoding means for performing entropy encoding onto DCT coefficients acquired from the DCT and quantization by using a scanning mode decided based on pixel similarity of the residual coefficients.Type: GrantFiled: April 1, 2021Date of Patent: April 2, 2024Assignees: Electronics and Telecommunications Research Institute, Kwangwoon University Research Institute for Industry Cooperation, Industry-Academia Cooperation Group of Sejong UniversityInventors: Se-Yoon Jeong, Hae-Chul Choi, Jeong-Il Seo, Seung-Kwon Beack, In-Seon Jang, Jae-Gon Kim, Kyung-Ae Moon, Dae-Young Jang, Jin-Woo Hong, Jin-Woong Kim, Yung-Lyul Lee, Dong-Gyu Sim, Seoung-Jun Oh, Chang-Beom Ahn, Dae-Yeon Kim, Dong-Kyun Kim
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Publication number: 20240082095Abstract: Disclosed is an exoskeleton-type rehabilitation robot system, including: a body part provided on a chair in which a user sits and provided with a robot arm capable of moving left or right based on the user seated on the chair; a conversion part configured to convert a position of the robot arm with respect to the body part; a driving part configured to articulate the robot arm with respect to the body part; and a controller configured to detect a change in a position of the robot arm and control a left or right driving mode of the driving part according to the position of the robot arm. In accordance with such a configuration, the exoskeleton-type rehabilitation robot system of the present invention is provided integrally with a chair, thereby having excellent space utilization. In addition, the user's initial preparation for rehabilitation training is simple, which can improve efficiency.Type: ApplicationFiled: December 27, 2021Publication date: March 14, 2024Applicant: HEXARHUMANCAR CO., LTDInventors: Chang Soo HAN, Ho Jun KIM, Su Hyun PARK, Young Hoon JI, Jeong Ho CHO, Byung Gab RYU, Jeong Gyu PARK, Dong Eun CHOI
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Publication number: 20240075988Abstract: An embodiment roof assembly for a vehicle includes a roof panel including a core, an upper skin attached to a top surface of the core, and a lower skin attached to a bottom surface of the core, a face sheet disposed above the roof panel, and a foam layer interposed between the roof panel and the face sheet.Type: ApplicationFiled: March 21, 2023Publication date: March 7, 2024Inventors: Kyung Min Yu, Dong Won Kim, Chang Hun Lee, Min Jun Kim, Young Ju Kim, Hyun Chul Lee
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Patent number: 11915782Abstract: An electronic device including a memory device with improved reliability is provided. The semiconductor device comprises a data pin configured to transmit a data signal, a command/address pin configured to transmit a command and an address, a command/address receiver connected to the command/address pin, and a computing unit connected to the command/address receiver, wherein the command/address receiver receives a first command and a first address from the outside through the command/address pin and generates a first instruction on the basis of the first command and the first address, and the computing unit receives the first instruction and performs computation based on the first instruction.Type: GrantFiled: August 20, 2021Date of Patent: February 27, 2024Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chang Min Lee, Nam Hyung Kim, Dae Jeong Kim, Do Han Kim, Min Su Kim, Deok Ho Seo, Won Jae Shin, Yong Jun Yu, Il Gyu Jung, In Su Choi
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Patent number: 11400978Abstract: Provided are a vehicle control apparatus and a vehicle control method, a vehicle control apparatus including: a sensor configured to sense at least one of a vehicle speed value and a lateral acceleration value of a vehicle; an active camber device including a knuckle for supporting a wheel of the vehicle, an upper arm having one end rotatably connected to the knuckle to form a stroke node, and a actuator for rotationally shifting the stroke node of the upper arm with respect to a connection point with the knuckle in a vertical direction; and a controller configured to vary a position of the stoke node of the upper arm through the actuator on the basis of one of the sensed vehicle speed value and the sensed lateral acceleration value.Type: GrantFiled: June 7, 2019Date of Patent: August 2, 2022Assignee: MANDO CORPORATIONInventors: Eun Jung No, Chang Jun Kim, Sarang Cha
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Patent number: 10960725Abstract: Provided is an active roll control apparatus for controlling a stiffness value of a stabilizer bar by moving the stabilizer bar, which is installed between left and right wheels of a vehicle and extends in a first direction, and a stabilizer link connected with the stabilizer bar to improve turning stability of the vehicle by actively controlling roll stiffness of the vehicle. The active roll control apparatus includes rotating shafts having one ends connected to both ends of the stabilizer bar, moving units into which the rotating shafts are inserted and which are movable along outer side surfaces of the rotating shafts in a second direction perpendicular to the first direction, and a driving unit configured to rotate the rotating shafts to move the moving units.Type: GrantFiled: February 22, 2018Date of Patent: March 30, 2021Assignee: MANDO CORPORATIONInventor: Chang Jun Kim
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Publication number: 20190375455Abstract: Provided are a vehicle control apparatus and a vehicle control method, a vehicle control apparatus including: a sensor configured to sense at least one of a vehicle speed value and a lateral acceleration value of a vehicle; an active camber device including a knuckle for supporting a wheel of the vehicle, an upper arm having one end rotatably connected to the knuckle to form a stroke node, and a actuator for rotationally shifting the stroke node of the upper arm with respect to a connection point with the knuckle in a vertical direction; and a controller configured to vary a position of the stoke node of the upper arm through the actuator on the basis of one of the sensed vehicle speed value and the sensed lateral acceleration value.Type: ApplicationFiled: June 7, 2019Publication date: December 12, 2019Inventors: Eun Jung NO, Chang Jun Kim, Sarang Cha
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Patent number: 10336153Abstract: An active roll control apparatus is provided. To adjust a stiffness value of the stabilizer bar by moving a stabilizer bar installed between left and right wheels of a vehicle and extending in a first direction and a stabilizer link connected to the stabilizer bar, the active roll control apparatus includes a sliding part having one side connected to the stabilizer bar and the other side connected to the stabilizer link to slide the stabilizer link in a second direction perpendicular to the first direction, and a movement restricting part installed at the sliding part to restrict movement when the sliding part slides.Type: GrantFiled: April 20, 2017Date of Patent: July 2, 2019Assignee: MANDO CORPORATIONInventors: Jun Ho Seong, Jae Hoon Jang, Chang Jun Kim
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Publication number: 20180335692Abstract: Disclosed are a phase-shift blankmask and a phase-shift photomask, which includes a phase-shift film made of silicon (Si) or a silicon (Si) compound on a transparent substrate and has a high transmittance characteristic. In the phase-shift blankmask according to the present disclosure, the phase-shift film has a high transmittance of 50% or higher, thereby achieving a micro pattern smaller than or equal to 32 nm, preferably 14 nm, and more preferably 10 nm for a semiconductor device, for example, a DRAM, a flash memory, a logic device.Type: ApplicationFiled: May 9, 2018Publication date: November 22, 2018Applicant: S&S TECH Co., Ltd.Inventors: Kee-Soo NAM, Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Chang-Jun KIM, Seung-Hyup SHIN, Gil-Woo KONG
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Publication number: 20180244126Abstract: Provided is an active roll control apparatus for controlling a stiffness value of a stabilizer bar by moving the stabilizer bar, which is installed between left and right wheels of a vehicle and extends in a first direction, and a stabilizer link connected with the stabilizer bar to improve turning stability of the vehicle by actively controlling roll stiffness of the vehicle. The active roll control apparatus includes rotating shafts having one ends connected to both ends of the stabilizer bar, moving units into which the rotating shafts are inserted and which are movable along outer side surfaces of the rotating shafts in a second direction perpendicular to the first direction, and a driving unit configured to rotate the rotating shafts to move the moving units.Type: ApplicationFiled: February 22, 2018Publication date: August 30, 2018Inventor: Chang Jun KIM
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Patent number: 10036947Abstract: Disclosed are a blankmask and a photomask, in which compositions of metal and light elements of a light-shielding film are controlled so that the light-shielding film can guarantee a light-shielding efficiency, increase an etching speed, become thinner, and have a minimum sheet-resistance. To this end, the blankmask according to the present invention includes at least a light-shielding film on a transparent substrate, and the light-shielding film includes a first light-shielding layer adjacent to the transparent substrate and a second light-shielding layer formed on the first light-shielding layer, in which the first and the second light-shielding film contains chrome (Cr) and molybdenum (Mo).Type: GrantFiled: October 8, 2015Date of Patent: July 31, 2018Assignee: S&S TECH CO., LTD.Inventors: Kee-Soo Nam, Cheol Shin, Jong-Hwa Lee, Chul-Kyu Yang, Min-Ki Choi, Chang-Jun Kim, Young-Jo Jeon
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Patent number: 10018905Abstract: Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14 nm, and more preferably not greater than 10 nm. To this end, a phase-shift film, a light-shielding film, an etch-stopping film and a hard film are provided on a transparent substrate, in which the light-shielding film has a multi-layered structure of two or more layers different in composition, one of which essentially contains oxygen (O), a light-shielding layer essentially having oxygen (O) occupies 50%˜100% of the whole thickness of the light-shielding film, and the phase-shift film has a transmissivity of 10%˜50%.Type: GrantFiled: November 19, 2015Date of Patent: July 10, 2018Assignee: S & S TECH CO., LTDInventors: Kee-Soo Nam, Cheol Shin, Jong-Hwa Lee, Chul-Kyu Yang, Min-Ki Choi, Chang-Jun Kim, Kyu-Jin Jang
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Patent number: 9851632Abstract: Disclosed is a phase-shift blankmask, in which a light-shielding film includes a metal compound and having a structure of a multi-layer film or a continuous film, which includes a first light-shielding layer and a second light-shielding layer. The second light-shielding layer has higher optical density at an exposure wavelength per unit thickness (?) than the first light-shielding layer. The first light-shielding layer occupies 70% to 90% of the whole thickness of the light-shielding film. With this, the blankmask secures a light-shielding effect, has an improved etching speed, and makes a resist film thinner, thereby achieving a fine pattern.Type: GrantFiled: July 21, 2015Date of Patent: December 26, 2017Assignee: S&S TECH CO., LTD.Inventors: Kee-Soo Nam, Cheol Shin, Chul-Kyu Yang, Jong-Hwa Lee, Min-Ki Choi, Chang-Jun Kim, Kyu-Jin Jang
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Publication number: 20170305227Abstract: An active roll control apparatus is provided. To adjust a stiffness value of the stabilizer bar by moving a stabilizer bar installed between left and right wheels of a vehicle and extending in a first direction and a stabilizer link connected to the stabilizer bar, the active roll control apparatus includes a sliding part having one side connected to the stabilizer bar and the other side connected to the stabilizer link to slide the stabilizer link in a second direction perpendicular to the first direction, and a movement restricting part installed at the sliding part to restrict movement when the sliding part slides.Type: ApplicationFiled: April 20, 2017Publication date: October 26, 2017Inventors: Jun Ho SEONG, Jae Hoon JANG, Chang Jun KIM
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Publication number: 20170023854Abstract: Disclosed are a blankmask and a photomask, in which compositions of metal and light elements of a light-shielding film are controlled so that the light-shielding film can guarantee a light-shielding efficiency, increase an etching speed, become thinner, and have a minimum sheet-resistance. To this end, the blankmask according to the present invention includes at least a light-shielding film on a transparent substrate, and the light-shielding film includes a first light-shielding layer adjacent to the transparent substrate and a second light-shielding layer formed on the first light-shielding layer, in which the first and the second light-shielding film contains chrome (Cr) and molybdenum (Mo).Type: ApplicationFiled: October 8, 2015Publication date: January 26, 2017Inventors: Kee-Soo NAM, Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Min-Ki CHOI, Chang-Jun KIM, Young-Jo JEON
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Patent number: 9551925Abstract: A blankmask and a photomask using the same are provided. The blankmask can be useful in preventing the loss in thickness of lateral, top and bottom surfaces of a pattern of a light shielding film or a phase shifting film after the manufacture of the photomask by forming protective film, which has an etch selectivity with respect to a pattern of a hard film or the light shielding film, on the light shielding film or the phase shifting film so that the loss of the phase shifting film formed under the light shielding film or the phase shifting film can be prevented when a process of removing the light shielding film disposed under the hard film or a pattern of the light shielding film is performed during a washing process and a process of removing a pattern of the hard film in a method of manufacturing a photomask, thereby securing uniformity in thickness.Type: GrantFiled: January 23, 2015Date of Patent: January 24, 2017Assignee: S&S TECH CO., LTDInventors: Kee-Soo Nam, Chul-Kyu Yang, Geung-Won Kang, Cheol Shin, Jong-Hwa Lee, Min-Ki Choi, Chang-Jun Kim, Kyu-Jin Jang
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Patent number: 9482940Abstract: Provided is a photomask having a high-resolution pattern of a half-pitch of 32 nm or less (particularly, a half-pitch of 22 nm or less), which is manufactured by forming a blankmask in which a light-proof film and a hard film having a small thickness and high etch selectivity with respect to the light-proof film are formed on a transparent substrate. The photomask may have a high quality by adjusting a composition ratio of a metal, silicon (Si), and light elements that constitute the light-proof film to suppress damage to the pattern caused by an XeF2 gas in an electron-beam repair process.Type: GrantFiled: October 1, 2014Date of Patent: November 1, 2016Assignee: S&S TECH CO., LTD.Inventors: Kee-Soo Nam, Geung-Won Kang, Cheol Shin, Jong-Hwa Lee, Chul-Kyu Yang, Chang-Jun Kim, See-Jun Jeong, Kyu-Jin Jang
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Publication number: 20160291451Abstract: Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14 nm, and more preferably not greater than 10 nm. To this end, a phase-shift film, a light-shielding film, an etch-stopping film and a hard film are provided on a transparent substrate, in which the light-shielding film has a multi-layered structure of two or more layers different in composition, one of which essentially contains oxygen (O), a light-shielding layer essentially having oxygen (O) occupies 50%˜100% of the whole thickness of the light-shielding film, and the phase-shift film has a transmissivity of 10%˜50%.Type: ApplicationFiled: November 19, 2015Publication date: October 6, 2016Inventors: Kee-Soo NAM, Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Min-Ki CHOI, Chang-Jun KIM, Kyu-Jin JANG
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Publication number: 20160054650Abstract: Disclosed is a phase-shift blankmask, in which a light-shielding film includes a metal compound and having a structure of a multi-layer film or a continuous film, which includes a first light-shielding layer and a second light-shielding layer. The second light-shielding layer has higher optical density at an exposure wavelength per unit thickness (?) than the first light-shielding layer. The first light-shielding layer occupies 70% to 90% of the whole thickness of the light-shielding film. With this, the blankmask secures a light-shielding effect, has an improved etching speed, and makes a resist film thinner, thereby achieving a fine pattern.Type: ApplicationFiled: July 21, 2015Publication date: February 25, 2016Inventors: Kee-Soo NAM, Cheol SHIN, Chul-Kyu YANG, Jong-Hwa LEE, Min-Ki CHOI, Chang-Jun KIM, Kyu-Jin JANG