Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a semiconductor substrate, active devices and transparent conductive patterns. The active devices are formed on the semiconductor substrate. The transparent conductive patterns are formed over the active devices and electrically connected to the active devices. The transparent conductive patterns are made of a metal oxide material. The metal oxide material has a first crystalline phase with a prefer growth plane rich in oxygen vacancy, and has a second crystalline phase with a prefer growth plane poor in oxygen vacancy.

Abstract: A rotational positioning apparatus includes a fixed member having a first wear portion and a stopper portion; at least a positioning washer disposed on the first wear portion, the positioning washer is formed with a positioning portion to abut against the stopper portion and at least a protruding portion radially extending outward; and a rotating member having a second wear portion engaged with the positioning washer, and a push portion for pushing the protruding portion of the positioning washer. With the relative locations for the stopper portion, positioning portion, protruding portion, and pushing portion, a relative rotation track between the fixed member and the positioning washer is summed with a relative rotation track between the rotating member and the positioning washer to flexibly design a rotational angle for the rotational positioning apparatus and ensure that the rotating member is firmly positioned at a desired location.