Patents by Inventor Chang-Koo Kim

Chang-Koo Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220246439
    Abstract: A plasma etching method includes a first step of supplying a mixed gas containing vaporized heptafluoroisopropyl methyl ether gas having a molecular structure of a following Chemical Formula 1 or vaporized heptafluoropropyl methyl ether gas having a molecular structure of a following Chemical Formula 2 and argon gas into a plasma chamber in which an etching target is disposed; and a second step of etching the etching target using plasma generated from the mixed gas:
    Type: Application
    Filed: June 1, 2020
    Publication date: August 4, 2022
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC CORPORATION FOUNDATION
    Inventors: Chang-Koo KIM, Jun-Hyun KIM, Jin-Su PARK
  • Patent number: 11372890
    Abstract: Technologies are described for facilitating transaction processing within a database environment having a coordinator node, a first worker node, and at least a second worker node. The coordinator node receives local transaction tokens from the first and the at least a second worker nodes. The coordinator nodes determines a synchronized transaction token using at least the local transaction tokens from the first and the at least a second worker nodes. The coordinator node sends the synchronized transaction token to the first and the at least a second worker nodes.
    Type: Grant
    Filed: October 8, 2019
    Date of Patent: June 28, 2022
    Assignee: SAP SE
    Inventors: Juchang Lee, Chang Gyoo Park, Deok Koo Kim
  • Publication number: 20220196879
    Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
    Type: Application
    Filed: March 10, 2022
    Publication date: June 23, 2022
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo KIM, Jun-Hyun KIM
  • Patent number: 11300711
    Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: April 12, 2022
    Assignee: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo Kim, Jun-Hyun Kim
  • Patent number: 11081361
    Abstract: Provided is a plasma etching method comprising supplying both hexafluoroisopropanol (HFIP) gas and argon (Ar) gas to a plasma chamber receiving an etching target therein, thereby to plasma-etch the etching target.
    Type: Grant
    Filed: July 25, 2019
    Date of Patent: August 3, 2021
    Assignee: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo Kim, Jun-Hyun Kim, Jin-Su Park
  • Publication number: 20210226422
    Abstract: A method for manufacturing a surge absorbing device is provided. The method includes providing an elongate ceramic tube having a hollow space defined therein and having open and opposite first and second end; forming a first plating layer and a second plating layer on the first end and the second end, respectively; placing a surge absorbing element within the hollow space within the ceramic tube; disposing first and second brazing rings on the first plating layer and the second plating layer, respectively; disposing first and second sealing electrodes on the first and second brazing rings respectively; and melting the first and second brazing rings in an inert gas atmosphere to attach the first and second sealing electrodes onto the first plating layer and the second plating layer, respectively.
    Type: Application
    Filed: April 6, 2021
    Publication date: July 22, 2021
    Applicants: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION, SMART ELECTRONICS INC.
    Inventors: Chang-Koo Kim, Hae-Min Lee, Doo Won Kang, Hyun Chang Kim
  • Patent number: 11005235
    Abstract: A method for manufacturing a surge absorbing device is provided. The method includes providing an elongate ceramic tube having a hollow space defined therein and having open and opposite first and second end; forming a first plating layer and a second plating layer on the first end and the second end, respectively; placing a surge absorbing element within the hollow space within the ceramic tube; disposing first and second brazing rings on the first plating layer and the second plating layer, respectively; disposing first and second sealing electrodes on the first and second brazing rings respectively; and melting the first and second brazing rings in an inert gas atmosphere to attach the first and second sealing electrodes onto the first plating layer and the second plating layer, respectively.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: May 11, 2021
    Assignees: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION, SMART ELECTRONICS INC.
    Inventors: Chang-Koo Kim, Hae-Min Lee, Doo Won Kang, Hyun Chang Kim
  • Patent number: 10865343
    Abstract: Provided is a plasma etching method comprising supplying heptafluoropropyl methyl ether (HFE) gas, argon (Ar) gas and oxygen (O2) gas to a plasma chamber receiving an etching target therein, thereby to plasma-etch the etching target.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: December 15, 2020
    Assignee: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo Kim, Jun-Hyun Kim, Jin-Su Park
  • Publication number: 20200264339
    Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
    Type: Application
    Filed: May 4, 2020
    Publication date: August 20, 2020
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo KIM, Jun-Hyun KIM
  • Patent number: 10690811
    Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: June 23, 2020
    Assignee: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo Kim, Jun-Hyun Kim
  • Publication number: 20200048550
    Abstract: Provided is a plasma etching method comprising supplying heptafluoropropyl methyl ether (HFE) gas, argon (Ar) gas and oxygen (O2) gas to a plasma chamber receiving an etching target therein, thereby to plasma-etch the etching target.
    Type: Application
    Filed: August 12, 2019
    Publication date: February 13, 2020
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo KIM, Jun-Hyun KIM, Jin-Su PARK
  • Publication number: 20200035502
    Abstract: Provided is a plasma etching method comprising supplying both hexafluoroisopropanol (HFIP) gas and argon (Ar) gas to a plasma chamber receiving an etching target therein, thereby to plasma-etch the etching target.
    Type: Application
    Filed: July 25, 2019
    Publication date: January 30, 2020
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
    Inventors: Chang-Koo KIM, Jun-Hyun KIM, Jin-Su PARK
  • Publication number: 20190049628
    Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
    Type: Application
    Filed: August 7, 2018
    Publication date: February 14, 2019
    Applicant: Ajou University Industry-Academic Cooperation Foundation
    Inventors: Chang-Koo KIM, Jun-Hyun KIM
  • Patent number: 10199226
    Abstract: There is provided a method for manufacturing a flexible electrode, the method comprising: cleaning a plastic substrate; forming a metal-oxide seed layer on the plastic substrate by sputtering a metal oxide on the plastic substrate; and forming a metal plating layer on the metal oxide seed layer using an electroless plating.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: February 5, 2019
    Assignee: Industry-Academic Corporation Foundation of ajou University
    Inventors: Chang-Koo Kim, Hae-Min Lee, Chang-Jin Park
  • Publication number: 20180254612
    Abstract: The present disclosure provides a method for manufacturing a surge absorbing device, the method comprising: providing an elongate ceramic tube having a hollow space defined therein and having open and opposite first and second end; forming a first plating layer and a second plating layer on the first end and the second end, respectively; placing a surge absorbing element within the hollow space within the ceramic tube; disposing first and second brazing rings on the first plating layer and the second plating layer, respectively; disposing first and second sealing electrodes on the first and second brazing rings respectively; and melting the first and second brazing rings in an inert gas atmosphere to attach the first and second sealing electrodes onto the first plating layer and the second plating layer, respectively.
    Type: Application
    Filed: August 10, 2016
    Publication date: September 6, 2018
    Applicants: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUN DATION, SMART ELECTRONICS INC.
    Inventors: Chang-Koo KIM, Hae-Min LEE, Doo Won KANG, Hyun Chang KIM
  • Publication number: 20180166289
    Abstract: The present invention relates to a method for producing a super-hydrophobic surface, and to a stack having a super-hydrophobic surface prepared by the above method. The super-hydrophobic surface may be realized only by plasma etching and deposition. The super-hydrophobic surface according to the present invention has a very low work of adhesion less than or equal to 3 mJ/m2. This super-hydrophobic surface may be applied to various fields including self-cleaning surface, anti-fogging surface, automobile glass surface, and drug delivery device surface.
    Type: Application
    Filed: June 7, 2016
    Publication date: June 14, 2018
    Applicant: Industry-Academic Cooperation Foundation of Ajou University
    Inventors: Chang-Koo KIM, Sung-Woon CHO, Jun-Hyun KIM, Jeong-Geun BAK
  • Publication number: 20170358454
    Abstract: There is provided a method for manufacturing a flexible electrode, the method comprising: cleaning a plastic substrate; forming a metal-oxide seed layer on the plastic substrate by sputtering a metal oxide on the plastic substrate; and forming a metal plating layer on the metal oxide seed layer using an electroless plating.
    Type: Application
    Filed: June 7, 2017
    Publication date: December 14, 2017
    Applicant: Industry-Academic Cooperation Foundation of Ajou University
    Inventors: Chang-Koo KIM, Hae-Min LEE, Chang-Jin PARK
  • Publication number: 20170263463
    Abstract: There is provided a method for etching a silicon substrate, the method comprising: forming an etch mask on a silicon substrate; forming a first gas comprising a halogen-based gas, a fluorocarbon gas and oxygen; and etching the silicon substrate by generating a plasma on the silicon substrate using the first gas.
    Type: Application
    Filed: November 10, 2015
    Publication date: September 14, 2017
    Applicant: Industry-Academic Cooperation Foundation of Ajou University
    Inventors: Chang-Koo KIM, Sung-Woon CHO, Jun-Hyun KIM
  • Patent number: 9493345
    Abstract: The present invention provides a method for fabricating slanted copper nanorods. The method includes manufacturing a workpiece configured to include an etch stop layer on a wafer, placing the workpiece in a slanted position, and etching the slanted workpiece, forming a copper (Cu) layer on the slanted workpiece by plating, removing an over-plated portion from the copper layer, and removing a polysilicon (poly Si) excluding copper from the surface of the workpiece. According to the invention, copper nanorod structures having a uniform array can be fabricated in a large area at a high process yield compared to conventional methods. In addition, the angle and diameter of copper nanorods can be controlled as desired so that the applicability thereof can be greatly increased. Moreover, the present invention can be applied to processes for fabricating various devices, including semiconductor devices, MEMSs (microelectromechanical systems), optical devices, gas sensors, display devices, etc.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: November 15, 2016
    Assignee: Ajou University Industry-Academic Cooperation Foundation
    Inventors: Sung-Woon Cho, Chang-Koo Kim
  • Publication number: 20160218353
    Abstract: Disclosed is a method of preparing a metal oxide-graphene nanocomposite, including preparing a nanocomposite material, forming graphene flakes by pretreating the nanocomposite material, and hydrothermally synthesizing the pretreated nanocomposite material. A method of manufacturing an electrode using the metal oxide-graphene nanocomposite is also provided. According to this invention, the metal oxide-graphene nanocomposite is synthesized from inexpensive graphite through one-step processing using only a surfactant, in place of conventional methods using oxidants, reductants and high-temperature heat, thereby lowering the number of processing steps and processing costs. Also, in the fabrication of the electrode, low electrical resistance characteristic of graphene is applied as it is, in place of the conventional use of active material, conductive material and binder, thereby exhibiting desired processing efficiency without the addition of the conductive material.
    Type: Application
    Filed: July 31, 2014
    Publication date: July 28, 2016
    Applicant: AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUN DATION
    Inventors: Chang Koo KIM, Sang Wook KIM, Gyoung Hwa JEONG, Hae Min LEE