Patents by Inventor Chang-Lee Chen

Chang-Lee Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5653939
    Abstract: A method and apparatus are disclosed for identifying molecular structures within a sample substance using a monolithic array of test sites formed on a substrate upon which the sample substance is applied. Each test site includes probes formed therein to bond with a predetermined target molecular structure or structures. A signal is applied to the test sites and certain electrical, mechanical and/or optical properties of the test sites are detected to determine which probes have bonded to an associated target molecular structure.
    Type: Grant
    Filed: August 7, 1995
    Date of Patent: August 5, 1997
    Assignees: Massachusetts Institute of Technology, Houston Advanced Research Center, Baylor College of Medicine
    Inventors: Mark A. Hollis, Daniel J. Ehrlich, R. Allen Murphy, Bernard B. Kosicki, Dennis D. Rathman, Chang-Lee Chen, Richard H. Mathews, Barry E. Burke, Mitch D. Eggers, Michael E. Hogan, Rajender Singh Varma
  • Patent number: 5411914
    Abstract: A new III-V buffer or passivation material is described which is produced by low temperature growth (LTG) of III-V compounds. The material has unique and desirable properties, particularly for closely spaced, submicron gate length active III-V semiconductor FET devices, such as HEMT's, MESFET's and MISFET's. The LTG material is grown under ambient conditions which incorporate an excess of the more volatile of the III-V species into the grown material. The new material is crystalline, highly resistive, relatively insensitive to light, and can be overgrown with high quality III-V active layers or used as a passivation material to insulate and protect active device structures.
    Type: Grant
    Filed: May 15, 1992
    Date of Patent: May 2, 1995
    Assignee: Massachusetts Institute of Technology
    Inventors: Chang-Lee Chen, Leonard J. Mahoney, Michael J. Manfra, Frank W. Smith, Arthur R. Calawa
  • Patent number: 4952527
    Abstract: A new III-IV buffer material is described which is produced by low temperature growth of III-V compounds by MBE that has unique and desirable properties, particularly for closely spaced, submicron gate length active III-V semiconductor devices, such as HEMT's, MESFET's and MISFET's. In the case of the III-V material, GaAs, the buffer is grown under arsenic stable growth conditions, at a growth rate of 1 micron/hour, and at a substrate temperature preferably in the range of 150 to about 300.degree. C. The new material is crystalline, highly resistive, optically inactive, and can be overgrown with high quality III-V active layers.
    Type: Grant
    Filed: February 19, 1988
    Date of Patent: August 28, 1990
    Assignee: Massachusetts Institute of Technology
    Inventors: Arthur R. Calawa, Frank W. Smith, Michael J. Manfra, Chang-Lee Chen