Abstract: Various aspects of the present disclosure generally relate to wireless communication. In some aspects, a user equipment (UE) may receive, from a network node, a network assistant information (NAI) message identifying a set of characteristics of a network connection. The UE may communicate with the network node using a communication configuration associated with the set of characteristics of the network connection. Numerous other aspects are described.

Abstract: The present disclosure provides a method of forming N-type and P-type source/drain features using one patterned mask and one self-aligned mask to increase windows of error tolerance and provide flexibilities for source/drain features of various shapes and/or volumes. The present disclosure also includes forming a trench between neighboring source/drain features to remove bridging between the neighboring source/drain features. In some embodiments, the trenches between the source/drain features are formed by etching from the backside of the substrate.

Abstract: The present disclosure describes an inner spacer structure for a semiconductor device and a method for forming the same. The method for forming the inner spacer structure in the semiconductor device can include forming a vertical structure over a substrate, forming a gate structure over a portion of the vertical structure, exposing sidewalls of the portion of the vertical structure, forming multiple spacers over the sidewalls of the portion of the vertical structure, and forming a void in each of the multiple spacers.

Abstract: A server comprising a circuitry, wherein the circuitry is configured to perform: generating an emulator in response to a request from a first user terminal of a first user; launching an application via the emulator; receiving streaming data and interaction data via the application; rendering the streaming data with the interaction data; recording the rendered streaming data and interaction data as a clip; and storing the clip for access from the first user terminal of the first user. According to the present disclosure, the clips may be generated in a more efficient and accurate manner, and a more immersive experience on watching the clips may be provided. Moreover, the review and share of clips may be more flexible. Therefore, the user experience may be improved.

Abstract: A semiconductor device includes a first fin protruding upwardly from a substrate, a second fin protruding upwardly from the substrate, a first gate structure having a first portion that at least partially wraps around an upper portion of the first fin and a second portion that at least partially wraps around an upper portion of the second fin, a second gate structure having a portion that at least partially wraps around the upper portion of the first fin, and a dielectric feature having a first portion between the first and second portions of the first gate structure. In a lengthwise direction of the first fin, the dielectric feature has a second portion extending to a sidewall of the second gate structure.

Abstract: An integrated circuit includes a first nanostructure transistor including a plurality of first semiconductor nanostructures over a substrate and a source/drain region in contact with each of the first semiconductor nanostructures. The integrated circuit includes a second nanostructure transistor including a plurality of second semiconductor nanostructures and a second source/drain region in contact with one or more of the second semiconductor nanostructures but not in contact with one or more other second semiconductor nanostructures.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a stack of semiconductor layers spaced apart from and aligned with each other, a first source/drain epitaxial feature in contact with a first one or more semiconductor layers of the stack of semiconductor layers, and a second source/drain epitaxial feature disposed over the first source/drain epitaxial feature. The second source/drain epitaxial feature is in contact with a second one or more semiconductor layers of the stack of semiconductor layers. The structure further includes a first dielectric material disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature and a first liner disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature. The first liner is in contact with the first source/drain epitaxial feature and the first dielectric material.

Abstract: A method includes forming a multi-layer stack including a plurality of semiconductor nanostructures. The multi-layer stack includes a semiconductor nanostructure, and a sacrificial semiconductor layer over the semiconductor nanostructure. The method further includes depositing a semiconductor layer over and contacting the semiconductor nanostructure, removing the sacrificial semiconductor layer, and forming a replacement gate stack encircling a combined region of the semiconductor nanostructure and the semiconductor layer.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a plurality of first nanostructures stacked over a substrate in a vertical direction. The semiconductor device structure also includes a first bottom layer formed adjacent to the first nanostructures, and a first dielectric liner layer formed over the first bottom layer and adjacent to the first nanostructures. The semiconductor device structure further includes a first source/drain (S/D) structure formed over the first dielectric liner layer, and the first S/D structure is isolated from the first bottom layer by the first dielectric liner layer.

Abstract: An integrated circuit includes a first nanostructure transistor and a second nanostructure transistor on a substrate. The source/drain regions of the first nanostructure are electrically isolated from the semiconductor substrate by dielectric barriers. The source/drain regions of the second nanostructure transistor in direct contact with the semiconductor substrate.

Abstract: An electronic package is provided in the present disclosure. The electronic package comprises: an electronic component; a thermal conductive element above the electronic component, wherein thermal conductive element includes a first metal; an adhesive layer between the electronic component and the thermal conductive element, wherein the first adhesive layer includes a second metal; and an intermetallic compound (IMC) between the first metal and the second metal.

Abstract: Ophthalmic compositions including compatible solute components and/or polyanionic components are useful in treating eyes, for example, to relieve dry eye syndrome, to protect the eyes against hypertonic insult and/or the adverse effects of cationic species on the ocular surfaces of eyes and/or to facilitate recovery from eye surgery.

Abstract: Provided are FinFET devices and methods of forming the same. A FinFET device includes a substrate, a metal gate strip, gate spacers and a dielectric helmet. The substrate has fins. The metal gate strip is disposed across the fins and has a reversed T-shaped portion between two adjacent fins. The gate spacers are disposed on opposing sidewalls of the metal gate strip. A dielectric helmet is disposed over the metal gate strip.

Abstract: A method for fabricating magnetoresistive random-access memory cells (MRAM) on a substrate is provided. The substrate is formed with a magnetic tunneling junction (MTJ) layer thereon. When the MTJ layer is etched to form the MRAM cells, there may be metal components deposited on a surface of the MRAM cells and between the MRAM cells. The metal components are then removed by chemical reaction. However, the removal of the metal components may form extra substances on the substrate. A further etching process is then performed to remove the extra substances by physical etching.

Abstract: There is provided an imaging system including a camera and a control host. The camera identifies ambient light intensity and performs trigger event detection in a low power mode. When the camera detects a trigger event in the low power mode, the control host is woken up. The camera also determines an exposure mode according the ambient light intensity and informs the exposure mode to the control host such that an operating mode of the control host after being woken up matches the exposure mode of the camera.

Abstract: Semiconductor structures and methods for manufacturing the same are provided. The semiconductor structure includes a substrate and a bottom isolation feature formed over the substrate. The semiconductor structure also includes a bottom semiconductor layer formed over the bottom isolation feature and nanostructures formed over the bottom semiconductor layer. The semiconductor structure also includes a source/drain structure attached to the nanostructures and covering a portion of the bottom isolation feature.

Abstract: A memory management circuit, an electronic device and a memory management method are provided. The memory management circuit includes a controller and an address mapping logic. The controller records addresses of available storage spaces within a memory device, wherein a searching logic of the controller stores the addresses in a storage device, and the addresses are queued with a specific order in the storage device. When a computing circuit send a storage request to request for a storage resource, the searching logic obtains at least one address queued in the storage device according to the specific order of the addresses queued in the storage device, to accordingly generate a mapping table, and the address mapping logic performs an address mapping operation upon the storage request according to the mapping table, to allow the computing circuit to utilize the available storage spaces according to the mapping table.

Abstract: An electronic device is provided by the present disclosure. The electronic device includes a substrate, an electronic component, and a bonding structure. The bonding structure is disposed between the electronic component and the substrate, and the bonding structure includes at least a first bonding layer and at least one compressible layer.

Abstract: An optical device for coupling light propagating between a waveguide and an optical transmission component is provided. The optical device includes a taper portion and a grating portion. The taper portion is disposed between the grating portion and the waveguide. The grating portion includes rows of grating patterns. A first size of a first grating pattern in a first row of grating patterns is larger than a second size of a second grating pattern in a second row of grating patterns. A first distance between the first row of grating patterns and the waveguide is less than a second distance between the second row of grating patterns and the waveguide.

Abstract: A smart ring with a physiological feature detecting method is applied to a target object. The smart ring includes a pressure sensor and an operation processor. The pressure sensor is adapted to detect a pressure value of the target object applied for the smart ring. The operation processor is electrically connected with the pressure sensor, and adapted to compare the pressure value with a preset condition and determine a behavior of the target object according to a comparison result of the pressure value and the preset condition for generating a related operation command.