Abstract: The present invention relates to a method for handling an ultra-thin glass for a display panel and, more specifically, the invention enables the ultra-thin glass to be easily attached to or detached from a carrier glass for supporting the ultra-thin glass before and after a surface treatment process for applying the ultra-thin glass to a display panel. To this end, the method for handling an ultra-thin glass for a display panel, according to the present invention, comprises: a bonding step for bonding an ultra-thin glass and a carrier glass for supporting the ultra-thin glass by means of a phase transition material; a surface treatment step for treating a surface of the ultra-thin glass; and a separation step for separating the ultra-thin glass from the carrier glass.

Abstract: The present invention relates to a method for handling an ultra-thin glass for a display panel and, more specifically, the invention enables the ultra-thin glass to be easily attached to or detached from a carrier glass for supporting the ultra-thin glass before and after a surface treatment process for applying the ultra-thin glass to a display panel. To this end, the method for handling an ultra-thin glass for a display panel, according to the present invention, comprises: a bonding step for bonding an ultra-thin glass and a carrier glass for supporting the ultra-thin glass by means of a phase transition material; a surface treatment step for treating a surface of the ultra-thin glass; and a separation step for separating the ultra-thin glass from the carrier glass.

Abstract: A transparent conductive substrate, a method of fabricating the same, and a touch panel including the same. The transparent conductive substrate includes a first thin film layer, a second thin film layer and a transparent conductive film which are sequentially provided on a glass substrate. The first thin film layer has a refractive index ranging from 2.2 to 2.7 at a wavelength of 550 nm and a thickness ranging from 7.6 to 9.4 nm. The second thin film layer has a refractive index ranging from 1.4 to 1.5 at a wavelength of 550 nm and a thickness ranging from 37 to 46.2 nm. The transparent conductive film is made of a transparent conductive material having a refractive index material ranging from 1.8 to 2.0 at a wavelength of 550 nm. The thickness of the transparent conductive film ranges from 24 to 38.5 nm.

Abstract: A transparent conductive substrate that is used for detecting a touched position on a touch screen panel (TSP), and a touch panel including the same. The transparent conductive substrate includes a base substrate and a transparent conductive layer formed on the base substrate. The transparent conductive layer includes a patterned area which is provided by coating the base substrate with a transparent conductive film containing indium tin oxide and a non-patterned area through which the base substrate is exposed. The thickness of the transparent conductive layer ranges from 110 to 180 nm.

Abstract: A roll-to-roll sputtering method transports a flexible substrate wound on an unwinder roll to a depositing part, forms a deposited film on the flexible substrate, and winds the flexible substrate on a winder roll. The depositing part includes a first depositing part. The first depositing part includes a first sputtering part which deposits a first target material on one surface of the flexible substrate and a heater which is disposed at a side of the other surface of the flexible substrate to heat the flexible substrate.