Patents by Inventor Chang-Ryol KIM

Chang-Ryol KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210124010
    Abstract: The present invention relates to an air-coupled type bistatic ground penetrating radar (GPR) antenna and, more specifically, to an air-coupled type ground penetrating radar (GPR) antenna which reduces reception of a direct wave, which is a factor limiting imaging performance of a system when being received at a receiving side of the GPR antenna, by placing a loop antenna at a receiver point so as to be vertical to an antenna plane with respect to a polarization direction of a transmitting antenna and configuring a feeding direction to be orthogonal to a feeding direction of a transmitter and the ground surface.
    Type: Application
    Filed: July 8, 2019
    Publication date: April 29, 2021
    Inventors: Woong KANG, Chang Ryol KIM, Seong Jun CHO
  • Patent number: 10475646
    Abstract: The present invention relates to a process for producing of polycrystalline silicon, and the method includes (1) preparing a silicon-containing gas; (2) storing the silicon-containing gas in a storage tank; (3) depositing polycrystalline silicon by injecting the silicon-containing gas stored in the storage tank to a CVD reactor; (4) treating an off-gas emitted in the depositing step; and (5) injecting the gas treated in the treating step to the storage tank.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: November 12, 2019
    Assignee: OCI COMPANY LTD.
    Inventors: Chang Ryol Kim, A Youn Cho, Ja Cheol Koo, Yong Chul Shin
  • Publication number: 20180226249
    Abstract: The present invention relates to a process for producing of polycrystalline silicon, and the method includes (1) preparing a silicon-containing gas; (2) storing the silicon-containing gas in a storage tank; (3) depositing polycrystalline silicon by injecting the silicon-containing gas stored in the storage tank to a CVD reactor; (4) treating an off-gas emitted in the depositing step; and (5) injecting the gas treated in the treating step to the storage tank.
    Type: Application
    Filed: February 2, 2018
    Publication date: August 9, 2018
    Inventors: Chang Ryol Kim, A Youn Cho, Ja Cheol Koo, Yong Chul Shin
  • Publication number: 20180050917
    Abstract: The present invention relates to a polysilicon filament manufacturing device, and more specifically, to a polysilicon filament binding device for manufacturing a polysilicon filament having a desired length by connecting polysilicon fragments cut from damage, etc. The present invention provides a polysilicon filament binding device comprising: a body part having a barrel-shape; a guide part provided inside the body part, guiding incoming polysilicon fragments; and a main light source for heating the binding surfaces of the polysilicon fragments.
    Type: Application
    Filed: June 26, 2015
    Publication date: February 22, 2018
    Inventors: Byung-Chang KANG, Chang-Ryol KIM