Patents by Inventor Chang-Sheng LIAO

Chang-Sheng LIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955070
    Abstract: A first driver circuit is configured to cooperate with a second driver circuit to control a display panel, wherein the first driver circuit is configured to output display data to a first area of the display panel and the second driver circuit is configured to output display data to a second area of the display panel. A method used for the first driver circuit includes outputting at least one emission control signal to control the second area of the display panel when the second driver circuit is disabled.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: April 9, 2024
    Assignee: NOVATEK Microelectronics Corp.
    Inventors: Kun-Zheng Lin, Chang-Hung Chen, Wei-Chieh Lin, Po-Sheng Liao
  • Patent number: 10796759
    Abstract: The present disclosure, in some embodiments, relates to a method of operating a resistive random access memory (RRAM) array. The method includes applying a word-line voltage to a selected word-line during a read operation. A non-zero voltage is applied to a selected bit-line during the read operation. A first voltage is applied to a selected source-line during the read operation. The first voltage is smaller than a second voltage applied to an unselected source-line during the read operation.
    Type: Grant
    Filed: May 16, 2019
    Date of Patent: October 6, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Chang-Sheng Liao, Hsia-Wei Chen, Jen-Sheng Yang, Kuo-Chi Tu, Sheng-Hung Shih, Wen-Ting Chu, Manish Kumar Singh, Chi-Tsai Chen
  • Publication number: 20190272873
    Abstract: The present disclosure, in some embodiments, relates to a method of operating a resistive random access memory (RRAM) array. The method includes applying a word-line voltage to a selected word-line during a read operation. A non-zero voltage is applied to a selected bit-line during the read operation. A first voltage is applied to a selected source-line during the read operation. The first voltage is smaller than a second voltage applied to an unselected source-line during the read operation.
    Type: Application
    Filed: May 16, 2019
    Publication date: September 5, 2019
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Chang-Sheng Liao, Hsia-Wei Chen, Jen-Sheng Yang, Kuo-Chi Tu, Sheng-Hung Shih, Wen-Ting Chu, Manish Kumar Singh, Chi-Tsai Chen
  • Patent number: 10311952
    Abstract: In some embodiments, the present disclosure relates to a resistive random access memory (RRAM) memory circuit. The memory circuit has a word-line decoder operably coupled to a first RRAM device and a second RRAM device by a word-line. A bit-line decoder is coupled to the first RRAM device by a first bit-line and to the second RRAM device by a second bit-line. A bias element is configured to apply a first non-zero bias voltage to the second bit-line concurrent to the bit-line decoder applying a non-zero voltage to the first bit-line.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: June 4, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Chang-Sheng Liao, Hsia-Wei Chen, Jen-Sheng Yang, Kuo-Chi Tu, Sheng-Hung Shih, Wen-Ting Chu, Manish Kumar Singh, Chi-Tsai Chen
  • Publication number: 20180218770
    Abstract: In some embodiments, the present disclosure relates to a resistive random access memory (RRAM) memory circuit. The memory circuit has a word-line decoder operably coupled to a first RRAM device and a second RRAM device by a word-line. A bit-line decoder is coupled to the first RRAM device by a first bit-line and to the second RRAM device by a second bit-line. A bias element is configured to apply a first non-zero bias voltage to the second bit-line concurrent to the bit-line decoder applying a non-zero voltage to the first bit-line.
    Type: Application
    Filed: March 27, 2018
    Publication date: August 2, 2018
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Chang-Sheng Liao, Hsia-Wei Chen, Jen-Sheng Yang, Kuo-Chi Tu, Sheng-Hung Shih, Wen-Ting Chu, Manish Kumar Singh, Chi-Tsai Chen
  • Patent number: 9934853
    Abstract: The present disclosure relates to a method and apparatus for performing a read operation of an RRAM cell, which applies a non-zero bias voltage to unselected bit-lines and select-lines to increase a read current window without damaging corresponding access transistors. In some embodiments, the method may be performed by activating a word-line coupled to a row of RRAM cells comprising a selected RRAM device by applying a first read voltage to the word-line. A second read voltage is applied to a bit-line coupled to a first electrode of the selected RRAM device. One or more non-zero bias voltages are applied to bit-lines and select-lines coupled to RRAM cells, within the row of RRAM cells, having unselected RRAM devices.
    Type: Grant
    Filed: February 6, 2017
    Date of Patent: April 3, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Chang-Sheng Liao, Hsia-Wei Chen, Jen-Sheng Yang, Kuo-Chi Tu, Sheng-Hung Shih, Wen-Ting Chu, Manish Kumar Singh, Chi-Tsai Chen
  • Patent number: 9825118
    Abstract: A high voltage metal-oxide-metal (HV-MOM) layout includes a first conductive element. The first element includes a first leg extending in a first direction, a second leg connected to the first leg, the second leg extending in a second direction different from the first direction, and a third leg connected to the second leg, the third leg extending in a first direction. The HV-MOM layout further includes a second conductive element separated from the first conductive element by a space. The second conductive element includes a serpentine structure, wherein the serpentine structure is enclosed on at least three sides by the first conductive element. The HV-MOM layout further includes a dielectric material filling the space between the first conductive element and the second conductive element.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: November 21, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Chung Chen, Shu Fang Fu, Chang-Sheng Liao
  • Publication number: 20170236581
    Abstract: The present disclosure relates to a method and apparatus for performing a read operation of an RRAM cell, which applies a non-zero bias voltage to unselected bit-lines and select-lines to increase a read current window without damaging corresponding access transistors. In some embodiments, the method may be performed by activating a word-line coupled to a row of RRAM cells comprising a selected RRAM device by applying a first read voltage to the word-line. A second read voltage is applied to a bit-line coupled to a first electrode of the selected RRAM device. One or more non-zero bias voltages are applied to bit-lines and select-lines coupled to RRAM cells, within the row of RRAM cells, having unselected RRAM devices.
    Type: Application
    Filed: February 6, 2017
    Publication date: August 17, 2017
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Chang-Sheng Liao, Hsia-Wei Chen, Jen-Sheng Yang, Kuo-Chi Tu, Sheng-Hung Shih, Wen-Ting Chu, Manish Kumar Singh, Chi-Tsai Chen
  • Publication number: 20160197138
    Abstract: A high voltage metal-oxide-metal (HV-MOM) layout includes a first conductive element. The first element includes a first leg extending in a first direction, a second leg connected to the first leg, the second leg extending in a second direction different from the first direction, and a third leg connected to the second leg, the third leg extending in a first direction. The HV-MOM layout further includes a second conductive element separated from the first conductive element by a space. The second conductive element includes a serpentine structure, wherein the serpentine structure is enclosed on at least three sides by the first conductive element. The HV-MOM layout further includes a dielectric material filling the space between the first conductive element and the second conductive element.
    Type: Application
    Filed: March 16, 2016
    Publication date: July 7, 2016
    Inventors: Chia-Chung CHEN, Shu Fang FU, Chang-Sheng LIAO
  • Patent number: 9305920
    Abstract: A high voltage metal-oxide-metal (HV-MOM) device includes a substrate, a deep well in the substrate and at least one high voltage well in the substrate over the deep well. The HV-MOM device further includes a dielectric layer over each high voltage well of the at least one high voltage well and a gate structure over the dielectric layer. The HV-MOM device further includes an inter-layer dielectric (ILD) layer over the substrate, the ILD layer surrounding the gate structure. The HV-MOM device further includes a first inter-metal dielectric (IMD) layer over the ILD layer and a first metal feature in the first IMD layer, wherein the first metal feature is part of a MOM capacitor.
    Type: Grant
    Filed: July 18, 2013
    Date of Patent: April 5, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Chung Chen, Shu Fang Fu, Chang-Sheng Liao
  • Publication number: 20150021676
    Abstract: A high voltage metal-oxide-metal (HV-MOM) device includes a substrate, a deep well in the substrate and at least one high voltage well in the substrate over the deep well. The HV-MOM device further includes a dielectric layer over each high voltage well of the at least one high voltage well and a gate structure over the dielectric layer. The HV-MOM device further includes an inter-layer dielectric (ILD) layer over the substrate, the ILD layer surrounding the gate structure. The HV-MOM device further includes a first inter-metal dielectric (IMD) layer over the ILD layer and a first metal feature in the first IMD layer, wherein the first metal feature is part of a MOM capacitor.
    Type: Application
    Filed: July 18, 2013
    Publication date: January 22, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Chung CHEN, Shu Fang FU, Chang-Sheng LIAO