Abstract: A wireless charging method for charging an underwater moving device is implemented by a charging device. The charging device receives electricity from a cable, and includes a first underwater wireless communication unit, a position holding unit, a first control unit, and a wireless charging transmitter. The underwater moving device includes a second underwater wireless communication unit, a wireless charging receiver, and a rechargeable battery. The first underwater wireless communication unit obtains moving device information by communicating with the second underwater wireless communication unit. The position holding unit holds the underwater moving device at a charging location, and generates a positioning success signal after the underwater moving device is held at the charging location. Upon receiving the positioning success signal, the first control unit controls the wireless charging transmitter to charge the rechargeable battery based on the moving device information.

Abstract: A robot fish system includes a robot fish, and a light-emitting device emitting a light signal. The robot fish includes a housing, on which first and second light receivers, a driving module and a processor are disposed. The processor is connected to the first and second light receivers and the driving module. The processor controls the driving module to operate in a left-turn mode to make the robot fish turn left when only the first light receiver receives the light signal, in a right-turn mode to make the robot fish turn right when only the second light receiver receives the light signal, in a straight-moving mode to make the robot fish move straight when both the first and second light receivers receive the light signal, and in a random mode to make the robot fish move randomly when none of the first and second light receivers receives the light signal.

Abstract: An image sensor is provided. The image sensor includes a substrate having a first pixel region and a second pixel region. The image sensor also includes a resonator structure disposed over the substrate. The resonator structure includes a first metal layer over the first pixel region and the second pixel region. The resonator structure also includes a first insulating layer over the first metal layer and the first pixel region. The first insulating layer has a first thickness. The resonator structure further includes a second insulating layer over the first metal layer and the second pixel region. The second insulating layer has a second thickness that is greater than the first thickness. In addition, the resonator structure includes a second metal layer over the first insulating layer and the second insulating layer.

Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Abstract: A coating apparatus includes a process chamber, a rotation device, and a rotation holder. The rotation device is disposed in the process chamber. The rotation holder is connected to the rotation device. The rotation holder includes two extension elements, two retaining elements, and two pins. The two extension elements are disposed around a center axis and separated from each other, wherein each of the two extension elements has a side surface. Each of the two retaining elements has a bottom surface, one of the two retaining elements is connected to one of the side surfaces, and the other of the two retaining elements is connected to the other of the side surfaces. One of the two pins is connected to one of the bottom surfaces, and the other of the two pins is connected to the other of the bottom surfaces.

Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of first dielectric layers, a plurality of metal layers of Ag or its alloy and a plurality of second dielectric layers are formed over the substrate. The plurality of first dielectric layers and the plurality of metal layers are alternately formed over the substrate. The plurality of second dielectric layers are formed on one side away from the substrate of the plurality of metal layers and located between the plurality of metal layers and the plurality of first dielectric layers. An optical element fabricated by the method is also provided.

Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Abstract: A coating apparatus includes a process chamber, a rotation device, and a rotation holder. The rotation device is disposed in the process chamber. The rotation holder is connected to the rotation device. The rotation holder includes two extension elements, two retaining elements, and two pins. The two extension elements are disposed around a center axis and separated from each other, wherein each of the two extension elements has a side surface. Each of the two retaining elements has a bottom surface, one of the two retaining elements is connected to one of the side surfaces, and the other of the two retaining elements is connected to the other of the side surfaces. One of the two pins is connected to one of the bottom surfaces, and the other of the two pins is connected to the other of the bottom surfaces.

Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of first dielectric layers, a plurality of metal layers of Ag or its alloy and a plurality of second dielectric layers are formed over the substrate. The plurality of first dielectric layers and the plurality of metal layers are alternately formed over the substrate. The plurality of second dielectric layers are formed on one side away from the substrate of the plurality of metal layers and located between the plurality of metal layers and the plurality of first dielectric layers. An optical element fabricated by the method is also provided.

Abstract: A wafer shipping box includes a case and a positioning unit. The case includes a base, a cover, and a receiving space defined by the base and the cover. The positioning unit is disposed in the receiving space and includes a lower retaining member connected to the base, an upper retaining member connected to the cover, and a cassette disposed therebetween. The cassette includes two upright holding walls spaced apart from each other, each of which has a plurality of lateral confining slots aligned in a front-rear direction. The lower retaining member is formed with a plurality of lower confining slots, each of which is defined by two slot walls interconnected at bottom ends thereof to form a slot bottom. The slot bottoms are respectively misaligned from central positions of the lateral confining slots along the front-rear direction.

Abstract: An image sensor is provided. The image sensor includes a substrate having a first pixel region and a second pixel region. The image sensor also includes a resonator structure disposed over the substrate. The resonator structure includes a first metal layer over the first pixel region and the second pixel region. The resonator structure also includes a first insulating layer over the first metal layer and the first pixel region. The first insulating layer has a first thickness. The resonator structure further includes a second insulating layer over the first metal layer and the second pixel region. The second insulating layer has a second thickness that is greater than the first thickness. In addition, the resonator structure includes a second metal layer over the first insulating layer and the second insulating layer.

Abstract: A wafer shipping box includes a case and a positioning unit. The case includes a base, a cover, and a receiving space defined by the base and the cover. The positioning unit is disposed in the receiving space and includes a lower retaining member connected to the base, an upper retaining member connected to the cover, and a cassette disposed therebetween. The cassette includes two upright holding walls spaced apart from each other, each of which has a plurality of lateral confining slots aligned in a front-rear direction. The lower retaining member is formed with a plurality of lower confining slots, each of which is defined by two slot walls interconnected at bottom ends thereof to form a slot bottom. The slot bottoms are respectively misaligned from central positions of the lateral confining slots along the front-rear direction.

Abstract: An image-sensing apparatus is provided. The image-sensing apparatus includes: an optical filter array including a two-band passing filter and an infrared filter; an RGB pixel array placed below the two-band passing filter; and a TOF pixel array adjacent to the RGB pixel array and placed below the two-band passing filter and the infrared filter, wherein a combination of the two-band passing filter and the infrared passing filter permits only the incident light in the infrared region to pass to the ToF pixel array.

Abstract: An image sensor for light field devices includes a plurality of sub-microlenses, a space layer, and a plurality of main microlenses. The space layer is disposed on the sub-microlenses, and the main microlenses are disposed on the space layer. The diameter of each of the main microlenses exceeds that of each of the sub-microlenses.

Abstract: An image-sensing apparatus is provided. The image-sensing apparatus includes: an optical filter array including a two-band passing filter and an infrared filter; an RGB pixel array placed below the two-band passing filter; and a TOF pixel array adjacent to the RGB pixel array and placed below the two-band passing filter and the infrared filter, wherein a combination of the two-band passing filter and the infrared passing filter permits only the incident light in the infrared region to pass to the ToF pixel array.

Abstract: A tunable micro-aspherical lens is disclosed, which employs two potential differences provided by two sets of electrodes to dynamically change the bottom area and the central height of the liquid polymer lens. The tunable micro-aspherical lens includes a tunable lens, a lower electrode plate, a hydrophobic pattern, an insulation layer and an upper transparent electrode plate. Also, a manufacturing method of a tunable micro-aspherical lens is disclosed, which includes forming a lower electrode plate, forming an insulation layer, determining a position of the tunable lens, controlling the bottom area and the central height of the tunable lens. The tunable micro-aspherical lens of the present invention eliminates spherical aberration and improves the focus spot resolution to shrink the focus spot and thus to provide better optical quality.