Abstract: The invention provides a layout pattern cell of a static random access memory (SRAM), which at least comprises a first SRAM cell, a plurality of gate structures spanning a plurality of fin structures, so as to form a first pull-up transistor, a second pull-up transistor, a first pull-down transistor, a second pull-down transistor, a first access transistor, a second access transistor, a third access transistor, a fourth access transistor, a first parasitic transistor and a second parasitic transistor located on a substrate, the first parasitic transistor and the first pull-down transistor span the same fin structure, and the fin structure spanned by the first parasitic transistor and the first pull-down transistor is a continuous structure.

Abstract: A method for detecting an object containing recycled plastic materials by qualitative and semi-quantitative detections is revealed, in which observing a yellowing condition of the object using a first light source, and illuminating the object using a second light source for observing a defect amount on the surface image of the object. When a yellowing index of the object is smaller than a standard yellowing index as well as a second defect condition is greater than a first defect condition, and an activation energy value of the object from a thermogravimetric analyzer is smaller than a standard activation energy value, the object does contain recycled plastic materials. Since the spectrums of recycled PET and native PET are different, the object contains recycled PET and the proportion of the recycled PET are determined according to the spectrums of fluorescent spectrum analysis and the difference ratio between the spectrums respectively.

Abstract: A blood characteristic measurer includes multiple light sources, a light sensor and a processor. The multiple light sources emit multiple beams of light of different dominant lightening wavelength. The light sensor receives multiple reflected light beams due to the reflection of incident light from a skin surface. The processor is electrically coupled to the light sensor and produces the blood characteristic according to reconstructed spectra generated by the multiple reflected light beams and absorption coefficient spectra generated by the skin surface.

Abstract: A circuit includes a voltage divider circuit configured to generate a feedback voltage according to an output voltage, an operational amplifier configured to output a driving signal according to the feedback voltage and a reference voltage and a pass gate circuit including multiple current paths. The current paths are controlled by the driving signal and connected in parallel between the voltage divider circuit and a power reference node.

Abstract: A hub motor includes an axle, a stator, a rotor, a casing, a sleeve, and a mounting seat. The axle has a first end, a second end, and a bump protruding out of a radial-outer-side surface of the axle. The bump is located on a side close to the second end in the extension direction. The stator is fixed to the axle and is close to the first end. The rotor is sleeved on the axle and pivots around the stator with the axle as an axis. The casing is sleeved on the axle, is driven by the rotor to pivot with the axle serving as an axis, and accommodates the stator and the rotor. The sleeve is rotatably sleeved on the second end of the axle and is connected to the casing. The mounting seat is connected to the axle and sleeved on the bump.

Abstract: A hub motor includes an axle, a rotor, a stator, and a casing. The axle is fixed to a frame of a bicycle. The rotor is sleeved on the axle and pivots with the axle. The stator is fixed to the axle and adjacent to the rotor. The casing is sleeved on the axle and driven by the rotor to pivot with the axle. The casing has an accommodating space, a first perforation, and a second perforation. The accommodating space accommodates the stator and the rotor. The axle includes a first component and a second component. The first component is sleeved on the second component. The first component is arranged to pass through the first perforation. The second component is arranged to pass through the second perforation. The first component and the second component cannot rotate relative to each other after being sleeved.

Abstract: A wireless charging method for charging an underwater moving device is implemented by a charging device. The charging device receives electricity from a cable, and includes a first underwater wireless communication unit, a position holding unit, a first control unit, and a wireless charging transmitter. The underwater moving device includes a second underwater wireless communication unit, a wireless charging receiver, and a rechargeable battery. The first underwater wireless communication unit obtains moving device information by communicating with the second underwater wireless communication unit. The position holding unit holds the underwater moving device at a charging location, and generates a positioning success signal after the underwater moving device is held at the charging location. Upon receiving the positioning success signal, the first control unit controls the wireless charging transmitter to charge the rechargeable battery based on the moving device information.

Abstract: A robot fish system includes a robot fish, and a light-emitting device emitting a light signal. The robot fish includes a housing, on which first and second light receivers, a driving module and a processor are disposed. The processor is connected to the first and second light receivers and the driving module. The processor controls the driving module to operate in a left-turn mode to make the robot fish turn left when only the first light receiver receives the light signal, in a right-turn mode to make the robot fish turn right when only the second light receiver receives the light signal, in a straight-moving mode to make the robot fish move straight when both the first and second light receivers receive the light signal, and in a random mode to make the robot fish move randomly when none of the first and second light receivers receives the light signal.

Abstract: An image sensor is provided. The image sensor includes a substrate having a first pixel region and a second pixel region. The image sensor also includes a resonator structure disposed over the substrate. The resonator structure includes a first metal layer over the first pixel region and the second pixel region. The resonator structure also includes a first insulating layer over the first metal layer and the first pixel region. The first insulating layer has a first thickness. The resonator structure further includes a second insulating layer over the first metal layer and the second pixel region. The second insulating layer has a second thickness that is greater than the first thickness. In addition, the resonator structure includes a second metal layer over the first insulating layer and the second insulating layer.

Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Abstract: A coating apparatus includes a process chamber, a rotation device, and a rotation holder. The rotation device is disposed in the process chamber. The rotation holder is connected to the rotation device. The rotation holder includes two extension elements, two retaining elements, and two pins. The two extension elements are disposed around a center axis and separated from each other, wherein each of the two extension elements has a side surface. Each of the two retaining elements has a bottom surface, one of the two retaining elements is connected to one of the side surfaces, and the other of the two retaining elements is connected to the other of the side surfaces. One of the two pins is connected to one of the bottom surfaces, and the other of the two pins is connected to the other of the bottom surfaces.

Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of first dielectric layers, a plurality of metal layers of Ag or its alloy and a plurality of second dielectric layers are formed over the substrate. The plurality of first dielectric layers and the plurality of metal layers are alternately formed over the substrate. The plurality of second dielectric layers are formed on one side away from the substrate of the plurality of metal layers and located between the plurality of metal layers and the plurality of first dielectric layers. An optical element fabricated by the method is also provided.

Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.

Abstract: A method for determining a correction to a patterning process. The method includes obtaining a plurality of qualities of the patterning process (e.g., a plurality of parameter maps, or one or more corrections) derived from metrology data and data of an apparatus used in the patterning process, selecting, by a hardware computer system, a representative quality from the plurality of qualities, and determining, by the hardware computer system, a correction to the patterning process based on the representative quality.

Abstract: A coating apparatus includes a process chamber, a rotation device, and a rotation holder. The rotation device is disposed in the process chamber. The rotation holder is connected to the rotation device. The rotation holder includes two extension elements, two retaining elements, and two pins. The two extension elements are disposed around a center axis and separated from each other, wherein each of the two extension elements has a side surface. Each of the two retaining elements has a bottom surface, one of the two retaining elements is connected to one of the side surfaces, and the other of the two retaining elements is connected to the other of the side surfaces. One of the two pins is connected to one of the bottom surfaces, and the other of the two pins is connected to the other of the bottom surfaces.

Abstract: A method for fabricating an optical element is provided. The fabrication method includes the following steps. A substrate is provided. A plurality of first dielectric layers, a plurality of metal layers of Ag or its alloy and a plurality of second dielectric layers are formed over the substrate. The plurality of first dielectric layers and the plurality of metal layers are alternately formed over the substrate. The plurality of second dielectric layers are formed on one side away from the substrate of the plurality of metal layers and located between the plurality of metal layers and the plurality of first dielectric layers. An optical element fabricated by the method is also provided.

Abstract: A wafer shipping box includes a case and a positioning unit. The case includes a base, a cover, and a receiving space defined by the base and the cover. The positioning unit is disposed in the receiving space and includes a lower retaining member connected to the base, an upper retaining member connected to the cover, and a cassette disposed therebetween. The cassette includes two upright holding walls spaced apart from each other, each of which has a plurality of lateral confining slots aligned in a front-rear direction. The lower retaining member is formed with a plurality of lower confining slots, each of which is defined by two slot walls interconnected at bottom ends thereof to form a slot bottom. The slot bottoms are respectively misaligned from central positions of the lateral confining slots along the front-rear direction.

Abstract: An image sensor is provided. The image sensor includes a substrate having a first pixel region and a second pixel region. The image sensor also includes a resonator structure disposed over the substrate. The resonator structure includes a first metal layer over the first pixel region and the second pixel region. The resonator structure also includes a first insulating layer over the first metal layer and the first pixel region. The first insulating layer has a first thickness. The resonator structure further includes a second insulating layer over the first metal layer and the second pixel region. The second insulating layer has a second thickness that is greater than the first thickness. In addition, the resonator structure includes a second metal layer over the first insulating layer and the second insulating layer.