Abstract: An integrated circuit structure includes a substrate, semiconductor devices, an inter-layer dielectric (ILD) structure, an interconnect, a dielectric layer, an etching barrier layer, a conductive layer, and memory units. The semiconductor devices are on the substrate. The ILD structure is over the semiconductor devices. The interconnect is in the ILD structure and electrically connected to the semiconductor devices. The dielectric layer is over the ILD structure. The etching barrier layer is on the first dielectric layer. The conductive layer is on the etching barrier layer. The memory units are stacked in a vertical direction over the etching barrier layer.

Abstract: A method for manufacturing semiconductor device is provided. A substrate having a memory region and a capacitance region is provided. A plurality of word line structures are formed on the memory region of the substrate. A capacitance structure is formed on the capacitance region of the substrate. The word line structures and the capacitance structure each include a first dielectric layer on the substrate, a first conductive layer on the first dielectric layer, a second dielectric layer on the first conductive layer, and a second conductive layer on the second dielectric layer. The second conductive layers of the word line structures close to an edge of the memory region and a portion of the second conductive layer of the capacitance structure are removed at the same time to form a trench exposing a portion of the second dielectric layer.