Abstract: The present invention relates to a high voltage-type redox flow battery comprising: a plurality of modules (1001, 1002, 1003, . . , 100n) which are serially connected; and a battery management system (BMS) for monitoring a state-of-charge (SOC) of each of the plurality of modules (1001, 1002, 1003, ..

Abstract: A smart drilling system includes a terminal configured to map a design space to an actual space and having perforation location information in the design space, a drilling machine including a drill for perforation and configured to perform perforation in the actual space under control of the terminal based on the perforation location information, and a total station configured to acquire location information of a reference point in the actual space for mapping the design space to the actual space and location information of the drilling machine in the actual space, and to transmit the location information of the reference point in the actual space and the location information of the drilling machine to the terminal, wherein the terminal recognizes and displays a perforable region or a perforable point at a current position of the drilling machine.

Abstract: A method of reinforcement learning of a neural network device for generating a verification vector for verifying a circuit design comprising a circuit block includes inputting a test vector to the circuit block, generating one or more rewards based on a coverage corresponding to the test vector, the coverage being determined based on a state transition of the circuit block based on the test vector, and applying the one or more rewards to a reinforcement learning.

Abstract: A photo process system for semiconductor wafers prevents air from flowing across the top of a baking region to produce a stable downward laminar air flow in front of baking units disposed at several levels in the baking region. The baking region is located on one side of a housing, and a coating unit for coating a wafer with a photoresist is located on the other side of the housing. The housing has a clean air entrance and air filters at an upper portion thereof, and a clean air discharge opening at the very bottom thereof. An air flow containment dam prevents clean air entering the housing from flowing horizontally at the top of the baking region. Such a horizontal flow of air would otherwise produce turbulence severely affecting the ability of the air to flow downward across the front of the baking units and toward the discharge opening as a laminar air flow. The laminar air flow hardly passes into the baking units and thus, hardly induces temperature variations in the coated wafers that are being baked.

Abstract: A microelectronic fabrication system that includes a service area, a process area in the service area where microelectronic devices are processed, and a transfer area in the service area where microelectronic devices are transferred to and from the process area, is cleaned by maintaining higher pressure in the process area than in the transfer area, to thereby reduce particle flow from the transfer area to the process area. It has been found that conventional microelectronic fabrication system cleaning methods and systems can allow air to flow backward to the wafer process area. By allowing backward flow of air to the wafer process area, air may be induced from a place where a lower degree of cleanliness is maintained to a place where a higher degree of cleanliness should be maintained. Due to the backward flow of air, particles contained in the transfer area, that may be generated by the transfer system, may flow onto the wafer that is being processed in the process area.