Abstract: A method for manufacturing an amorphous multielement metal oxide hydroxide film includes: A liquid mixture is formed by dissolving an oxidizing agent selected from a group consisting of potassium permanganate, potassium chromate, potassium dichromate and potassium ferrate, and a reducing agent in a solvent. The oxidizing agent forms an oxometallate anion having a first metal atom with a first valence number. The reducing agent forms a metal cation having a second metal atom with a third valence number. An amorphous multielement metal oxide hydroxide film is deposited on a substrate by soaking the substrate in the liquid mixture. The amorphous multielement metal oxide hydroxide film includes a multielement metal oxide hydroxide having the first metal atom with a second valence smaller than the first valence number and the second metal atom with a fourth valence number larger than the third valence number.

Abstract: Disclosed is an electrical discharge machining apparatus at least comprising a carrier platform and an electrical discharge machining unit. The carrier platform is used to carry at least one to-be-machined object. The electrical discharge machining unit comprises an electrode, a jig and a power supply unit. When the electrical discharge machining unit performs an electrical discharge machining procedure on a machined target area of the to-be-machined object along a machining direction, an electrical discharge section of the electrode and the machined target area of the to-be-machined object move relatively. The invention is capable of improving a machining procedure, saving an overall machining time and saving a time required for electrode replacement.

Abstract: Disclosed is an electrical discharge machining apparatus at least comprising a carrier platform, an electrical discharge machining unit and a repairing device. The carrier platform is used for carrying at least one to-be-machined object. The electrical discharge machining unit comprises at least one electrode and a power supply unit, and is used for performing an electrical discharge machining procedure on a machined target area of the to-be-machined object by the electrode along a machining direction. When there is an area to be repaired on an appearance of the electrode, the repairing device performs a repairing procedure on the electrode, thereby achieving effects of stable electrical discharge and preventing short-circuit problem in the electrical discharge machining procedure.

Abstract: A welding process involves a fixture for holding a workpiece and a welder, or welding electrode. The fixture imposes ultrasonic vibration on the workpiece. The welder vibrates during vibration, and is operable at a first voltage for welding and a second voltage for peening. The peening may occur while the weldmetal is crystallizing. The welding process may be a process of welding two part as together, or of filling a groove or other feature, or of applying or restoring a surface, or of applying a hard facing or ceramic to a parent metal or object. The weldmetal may be the same, or substantially the same, as the parent metal, or it may be different. The different material may be a ceramic material.

Abstract: Provided herein are new compositions and methods for use in introducing transgenes into cells. The compositions are non-viral but achieve levels of transgene integration comparable to those obtained with viral-mediated methods, and can be used for targeted integration of a transgene at a specific genomic locus.

Abstract: A method for manufacturing an amorphous multielement metal oxide hydroxide film includes: A liquid mixture is formed by dissolving an oxidizing agent selected from a group consisting of potassium permanganate, potassium chromate, potassium dichromate and potassium ferrate, and a reducing agent in a solvent. The oxidizing agent forms an oxometallate anion having a first metal atom with a first valence number. The reducing agent forms a metal cation having a second metal atom with a third valence number. An amorphous multielement metal oxide hydroxide film is deposited on a substrate by soaking the substrate in the liquid mixture. The amorphous multielement metal oxide hydroxide film includes a multielement metal oxide hydroxide having the first metal atom with a second valence smaller than the first valence number and the second metal atom with a fourth valence number larger than the third valence number.

Abstract: A compression state measuring method is adapted to measure a compressed state of a compressed object compressed by a compressing object. First, at least one image of a first surface region of the compressed object not covered by the compressing object is captured. A first strain distribution value of the first surface region is obtained according to the at least one image. At least one strain distribution function is obtained according to the first strain distribution value. A second strain distribution value of a second surface region of the compressed object covered by the compressing object is obtained according to the at least one strain distribution function.

Abstract: The invention relates to a method for producing an optoelectronic device (1) including a matrix array of light-emitting diodes (4) and a plurality of photoluminescent pads (61, 62, 63 . . . ) that are each located facing at least some of said light-emitting diodes (4), including the following steps: forming said plurality of photoluminescent pads (61, 62, 63 . . . ) by photolithography from at least one photoresist (51, 52, 53 . . . ) containing photoluminescent particles, said photoresist having been deposited beforehand on a supporting surface (3; 3?); forming reflective walls (101, 102, 103 . . . ) covering lateral flanks (81, 82, 83 . . . ) of said photoluminescent pads (61, 62, 63 . . . ) by deposition of at least one thin-layer section (91, 92, 93 . . . ) on the lateral flanks.

Abstract: A stretchable electronics generating apparatus and layout method thereof are provided. The layout method includes: establishing a layout database, wherein the layout database recodes a plurality of layout selection information respectively corresponding to a plurality of strain/stress information; detecting a layout target area to obtain a strain/stress distribution status of the layout target area; generating a wire routing information according to the strain/stress distribution status based on the layout database; and transporting the wire routing information to a manufacture device of the conductive wires for disposing a plurality of physical conductive wires on the layout target area by the manufacture device.

Abstract: A surface modification process and apparatus for the electro-spark deposition (ESD) on a workpiece may include mounting a workpiece on a rotationally driven mounting. The contact surface of the workpiece is ESD coated. Ultrasonic vibration is applied to the deposition layer during its crystallization phase. The workpiece may be a resistance spot welding electrode. The apparatus may have a vibrating applicator, ESD power supply, integrated ultrasonic transducer assembly, a work station having a rotational drive and an ultrasonic generator. The ultrasonic generator is connected to the ultrasonic transducer. The ultrasonic transducer assembly and the rotating driving work bench unit are integrated in a single assembly. The workpiece seats on the ultrasonic transducer assembly. The deposition of a surface coating occurs during simultaneous application of electro-spark deposition and ultrasonic vibration.

Abstract: A method for depositing a metal oxide film in a liquid environment is provided, and includes steps of: dissolving an oxidizing agent in solvent with hydrogen bond to form a solution, and placing a substrate into the solution for performing a deposition reaction to deposit a metal oxide hydroxide film on the substrate. The oxidizing agent is potassium permanganate, potassium chromate, or potassium dichromate, a reaction temperature of the deposition reaction ranges from 1 to 99 degrees Celsius, and a reaction pressure environment of the deposition reaction is an atmospheric pressure environment.

Abstract: A stretchable electronics generating apparatus and layout method thereof are provided. The layout method includes: establishing a layout database, wherein the layout database recodes a plurality of layout selection information respectively corresponding to a plurality of strain/stress information; detecting a layout target area to obtain a strain/stress distribution status of the layout target area; generating a wire routing information according to the strain/stress distribution status based on the layout database; and transporting the wire routing information to a manufacture device of the conductive wires for disposing a plurality of physical conductive wires on the layout target area by the manufacture device.

Abstract: A welding process involves a fixture for holding a workpiece and a welder, or welding electrode. The fixture imposes ultrasonic vibration on the workpiece. The welder vibrates during vibration, and is operable at a first voltage for elding and a second voltage for peening. The peening may occur while the weldmetal is crystallizing. The welding process may be a process of welding two part as together, or of filling a groove or other feature, or of applying or restoring a surface, or of applying a hard facing or ceramic to a parent metal or object. The weldmetal may be the same, or substantially the same, as the parent metal, or it may be different. The different material may be a ceramic material.

Abstract: The invention relates to a method for producing an optoelectronic device (1) including a matrix array of light-emitting diodes (4) and a plurality of photoluminescent pads (61, 62, 63 . . . ) that are each located facing at least some of said light-emitting diodes (4), including the following steps: forming said plurality of photoluminescent pads (61, 62, 63 . . . ) by photolithography from at least one photoresist (51, 52, 53 . . . ) containing photoluminescent particles, said photoresist having been deposited beforehand on a supporting surface (3; 3?); forming reflective walls (101, 102, 103 . . . ) covering lateral flanks (81, 82, 83 . . . ) of said photoluminescent pads (61, 62, 63 . . . ) by deposition of at least one thin-layer section (91, 92, 93 . . . ) on the lateral flanks.

Abstract: A welding process involves a fixture for holding a workpiece and a welder, or welding electrode. The fixture imposes ultrasonic vibration on the workpiece. The welder vibrates during vibration, and is operable at a first voltage for welding and a second voltage for peening. The peening may occur while the weld metal is crystallizing. The welding process may be a process of welding two parts together, or of filling a groove or other feature, or of applying or restoring a surface, or of applying a hard facing or ceramic to a parent metal or object. The weld metal may be the same, or substantially the same, as the parent metal, or it may be different. The different material may be a ceramic material.

Abstract: A cutting method of a multilayer structure containing a brittle layer is provided. The cutting method includes: cutting the multilayer structure to form a cut edge; removing a material of the multilayer structure other than the brittle layer along the cut edge, wherein the material of the multilayer structure other than the brittle layer has a width ranging from 1 micron to 2 millimeter; and modifying an edge of the brittle layer remaining after removing the material of the multilayer structure other than the brittle layer by a laser beam.

Abstract: A storage phosphor panel can include an extruded inorganic storage phosphor layer including a thermoplastic polyolefin and an inorganic storage phosphor material, where the extruded inorganic storage phosphor panel has a DQE comparable to that of a traditional extruded inorganic solvent coated inorganic storage phosphor screen. Also disclosed is an inorganic storage phosphor detection system including an extruded inorganic storage phosphor panel that can include an extruded inorganic storage phosphor layer including a thermoplastic olefin and an inorganic storage phosphor material; and photodetector(s) coupled to the extruded inorganic storage phosphor panel to detect photons generated from the extruded inorganic storage phosphor panel.

Abstract: A light emitting device including a substrate, a first electrode structure, an organic light emitting structure and a second electrode structure is provided. The first electrode structure includes a first transparent conductive layer, a patterned conductive layer and a second transparent conductive layer disposed on the substrate in sequence, so that the patterned conductive layer is interposed between the second transparent conductive layer and the first transparent conductive layer in a thickness direction of the substrate. The organic light emitting structure and the second electrode structure are disposed on the substrate, and the organic light emitting structure is located between the first electrode structure and the second electrode structure in the thickness direction of the substrate. An electrode structure and a manufacturing method thereof are also provided.

Abstract: A welding process involves a fixture for holding a workpiece and a welder, or welding electrode. The fixture imposes ultrasonic vibration on the workpiece. The welder vibrates during vibration, and is operable at a first voltage for welding and a second voltage for peening. The peening may occur while the weld metal is crystallizing. The welding process may be a process of welding two parts together, or of filling a groove or other feature, or of applying or restoring a surface, or of applying a hard facing or ceramic to a parent metal or object. The weld metal may be the same, or substantially the same, as the parent metal, or it may be different. The different material may be a ceramic material.

Abstract: A cutting method of a multilayer structure containing a brittle layer is provided. The cutting method includes: cutting the multilayer structure to form a cut edge; removing a material of the multilayer structure other than the brittle layer along the cut edge, wherein the material of the multilayer structure other than the brittle layer has a width ranging from 1 micron to 2 millimeter; and modifying an edge of the brittle layer remaining after removing the material of the multilayer structure other than the brittle layer by a laser beam.