Patents by Inventor Chang-Young Jeong

Chang-Young Jeong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240161981
    Abstract: A multilayer electronic component includes a body including a capacitance forming portion including a dielectric layer and internal electrodes alternately disposed with the dielectric layer in a first direction and a cover portion disposed on one surface and the other surface of the capacitance forming portion in the first direction, and external electrodes disposed on the body, wherein a secondary phase including Al is disposed at an interface between the internal electrode and the dielectric layer, and the ratio of an area occupied by the secondary phase to an area of the capacitance forming portion is 0.03% or more and 0.40% or less.
    Type: Application
    Filed: February 2, 2023
    Publication date: May 16, 2024
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Mun Seong JEONG, Jung Min KIM, Jin Kyung PARK, Chang Soo JANG, Su Ji KANG, Na Young KIM
  • Publication number: 20240109350
    Abstract: The present disclosure relates to a portable printer including a main body in a portable form which is capable of accommodating a cartridge having a nozzle for delivering a printing material to a target having a soft or hard surface, a seating part which is provided to be exposed to an outside from a lower portion of the main body to face the surface of the target and at least partially surrounds the nozzle, a roller provided respectively at the front and rear of the nozzle at the lower portion of the main body with respect to a direction in which the main body moves along the surface of the target to deliver the printing material to the target, and a printing adjustment unit configured to adjust a height difference between the nozzle and the roller to adjust a height difference between the nozzle and the surface of the target.
    Type: Application
    Filed: October 20, 2022
    Publication date: April 4, 2024
    Applicant: LG HOUSEHOLD & HEALTH CARE LTD.
    Inventors: Chang Hwan HYUN, Ji Hee LEE, Kang Ug LEE, Sung Hyoun JANG, Hyeon Jin KWEON, Hae Na CHEONG, Ji Hee JEONG, Jung Yong LEE, Ha Young KIM
  • Publication number: 20240112762
    Abstract: The present disclosure relates to an apparatus for obtaining a raw material which extracts a color raw material for cosmetics having a target color, wherein when a target color development value is input, raw material information is extracted using a genetic algorithm.
    Type: Application
    Filed: December 17, 2021
    Publication date: April 4, 2024
    Applicant: LG HOUSEHOLD & HEALTH CARE LTD.
    Inventors: Se Heon OH, Hye Jin JEONG, Chang Young PARK
  • Patent number: 11949881
    Abstract: The present invention discloses an encoding apparatus using a Discrete Cosine Transform (DCT) scanning, which includes a mode selection means for selecting an optimal mode for intra prediction; an intra prediction means for performing intra prediction onto video inputted based on the mode selected in the mode selection means; a DCT and quantization means for performing DCT and quantization onto residual coefficients of a block outputted from the intra prediction means; and an entropy encoding means for performing entropy encoding onto DCT coefficients acquired from the DCT and quantization by using a scanning mode decided based on pixel similarity of the residual coefficients.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: April 2, 2024
    Assignees: Electronics and Telecommunications Research Institute, Kwangwoon University Research Institute for Industry Cooperation, Industry-Academia Cooperation Group of Sejong University
    Inventors: Se-Yoon Jeong, Hae-Chul Choi, Jeong-Il Seo, Seung-Kwon Beack, In-Seon Jang, Jae-Gon Kim, Kyung-Ae Moon, Dae-Young Jang, Jin-Woo Hong, Jin-Woong Kim, Yung-Lyul Lee, Dong-Gyu Sim, Seoung-Jun Oh, Chang-Beom Ahn, Dae-Yeon Kim, Dong-Kyun Kim
  • Publication number: 20240098382
    Abstract: An image processing device including: a decision pixel manager for setting a decision area for a defect candidate pixel, and determining a first decision pixel and a second decision pixel, based on first phase information of pixels included in the decision area with respect to a first modulation frequency of a sensing light source among the pixels; a target pixel determiner for calculating a phase difference between the first decision pixel and the second decision pixel, based on second phase information of the pixels with respect to a second modulation frequency of the sensing light source, and determining the defect candidate pixel as a target pixel, corresponding to that the phase difference exceeds a predetermined reference value; and a phase corrector for changing a phase of the target pixel, based on the phase difference.
    Type: Application
    Filed: February 28, 2023
    Publication date: March 21, 2024
    Applicant: SK hynix Inc.
    Inventors: Woo Young JEONG, Ja Min KOO, Tae Hyun KIM, Jae Hwan JEON, Chang Hun CHO
  • Publication number: 20220135855
    Abstract: An adhesive composition, a method for preparing the same, a reticle assembly including the same, and a method for fabricating the reticle assembly including the same are provided. The adhesive composition includes a polyphenol compound including tannic acid, a polymer including polyvinyl alcohol, and a solvent including water and alcohol.
    Type: Application
    Filed: November 1, 2021
    Publication date: May 5, 2022
    Applicants: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and Technology
    Inventors: Mun Ja KIM, Byungchul YOO, Haeshin LEE, Chang Young JEONG, Yunhan LEE
  • Patent number: 11025571
    Abstract: A message sharing method includes: receiving image data captured via an imaging unit; receiving text input by a user via the input unit; analyzing, by a processor, the text and the image data and extracting a first object related to the user by using at least one of a result of analyzing the text, a result of analyzing the image data, and a sensed value obtained from a sensor unit; editing the image data to further include the extracted first object, and converting the edited image data to a thumbnail format; sharing the converted image data and the text with another user via a chat room.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: June 1, 2021
    Assignee: SNOW CORPORATION
    Inventors: Sang Cheol Jeon, Chang Young Jeong, Young Hun Kim
  • Patent number: 10437143
    Abstract: Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: October 8, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hwan-chul Jeon, Mun Ja Kim, Sung-won Kwon, Hee-bom Kim, Chang-young Jeong
  • Publication number: 20190190865
    Abstract: A message sharing method includes: receiving image data captured via an imaging unit; receiving text input by a user via the input unit; analyzing, by a processor, the text and the image data and extracting a first object related to the user by using at least one of a result of analyzing the text, a result of analyzing the image data, and a sensed value obtained from a sensor unit; editing the image data to further include the extracted first object, and converting the edited image data to a thumbnail format; sharing the converted image data and the text with another user via a chat room.
    Type: Application
    Filed: February 22, 2019
    Publication date: June 20, 2019
    Applicant: Snow Corporation
    Inventors: Sang Cheol JEON, Chang Young JEONG, Young Hun KIM
  • Publication number: 20180284599
    Abstract: Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.
    Type: Application
    Filed: June 20, 2017
    Publication date: October 4, 2018
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Hwan-chul JEON, Mun Ja KIM, Sung-won KWON, Hee-bom KIM, Chang-young JEONG
  • Patent number: 9846956
    Abstract: In one example embodiment, an image providing method includes capturing, by a processor, a first partial image while applying a first image processing filter at a first time, capturing, by the processor, a second partial image while applying a second image filter at a second time after the first time, and generating, by the processor, a collage image by merging the first partial image and the second partial image at a third time after the second time.
    Type: Grant
    Filed: August 13, 2015
    Date of Patent: December 19, 2017
    Assignee: Line Corporation
    Inventors: Se Dong Nam, Chang Young Jeong, Sang Cheol Jeon, Young Hun Kim
  • Publication number: 20160267634
    Abstract: In one example embodiment, an image providing method includes capturing, by a processor, a first partial image while applying a first image processing filter at a first time, capturing, by the processor, a second partial image while applying a second image filter at a second time after the first time, and generating, by the processor, a collage image by merging the first partial image and the second partial image at a third time after the second time.
    Type: Application
    Filed: August 13, 2015
    Publication date: September 15, 2016
    Inventors: Se Dong NAM, Chang Young JEONG, Sang Cheol JEON, Young Hun KIM
  • Publication number: 20150131071
    Abstract: A semiconductor device manufacturing apparatus includes a mask stage including a mask holder system that fixes a photomask, the mask holder system having a first fixing portion mounted at a first position of the mask holder system to fix the photomask, and a second fixing portion at a second position of the mask holder system and spaced apart from the first position, the second fixing portion fixing a pellicle assembly to be spaced apart from the photomask on the first fixing portion.
    Type: Application
    Filed: November 6, 2014
    Publication date: May 14, 2015
    Inventors: Dong-wan KIM, Seong-sue KIM, Chang-young JEONG, Dong-gun LEE
  • Publication number: 20120064676
    Abstract: A thin film transistor includes a substrate, a semiconductor layer on the substrate, a thermal oxide layer on the semiconductor layer, a gate electrode on the thermal oxide layer, the gate electrode positioned to correspond to a channel region of the semiconductor layer, an interlayer insulating layer on the substrate, and source and drain electrodes electrically connected to the semiconductor layer.
    Type: Application
    Filed: November 21, 2011
    Publication date: March 15, 2012
    Applicant: SAMSUNG MOBILE DISPLAY CO., LTD.
    Inventors: Hye-Hyang PARK, Byoung-Deog Choi, Dae-Woo Lee, Chang-Young Jeong, Moo-Jin Kim, Kyoung-Bo Kim
  • Patent number: 7932546
    Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: April 26, 2011
    Assignee: Crosstek Capital, LLC
    Inventors: Chang-Young Jeong, Dai-Ung Shin, Hong-Ik Kim
  • Patent number: 7670867
    Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.
    Type: Grant
    Filed: October 3, 2005
    Date of Patent: March 2, 2010
    Inventors: Chang-Young Jeong, Dae-Ung Shin, Hong-Ik Kim
  • Publication number: 20100044819
    Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.
    Type: Application
    Filed: October 27, 2009
    Publication date: February 25, 2010
    Inventors: Chang-Young Jeong, Dai-Ung Shin, Hong-Ik Kim
  • Publication number: 20090121231
    Abstract: Aspects of the invention relate to thin film transistors, a method of fabricating the same, and an organic light-emitting diode device using the same. A thin film transistor according to an aspect of the invention includes a semiconductor layer formed from polysilicon in which a grain size deviation is within a range of substantially ±10%. Accordingly, aspects of the invention can improve non-uniformity of image characteristics due to a non-uniform grain size in polysilicon produced by a sequential lateral solidification (SLS) crystallization process.
    Type: Application
    Filed: November 13, 2008
    Publication date: May 14, 2009
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Kyoung-Bo KIM, Yong-Woo Park, Chang-Young Jeong, Sung-Won Doh, Dae-Woo Lee, Jong-Mo Yeo
  • Publication number: 20080135893
    Abstract: A thin film transistor includes a substrate, a semiconductor layer on the substrate, a thermal oxide layer on the semiconductor layer, a gate electrode on the thermal oxide layer, the gate electrode positioned to correspond to a channel region of the semiconductor layer, an interlayer insulating layer on the substrate, and source and drain electrodes electrically connected to the semiconductor layer.
    Type: Application
    Filed: December 6, 2007
    Publication date: June 12, 2008
    Inventors: Hye-Hyang Park, Byoung-Deog Choi, Dae-Woo Lee, Chang-Young Jeong, Moo-Jin Kim, Kyoung-Bo Kim
  • Publication number: 20060019426
    Abstract: The method for manufacturing a CMOS image sensor is employed to prevent bridge phenomenon between adjacent microlenses by employing openings between the microlenses. The method includes the steps of: preparing a semiconductor substrate including isolation regions and photodiodes therein obtained by a predetermined process; forming an interlayer dielectric (ILD), metal interconnections and a passivation layer formed on the semiconductor substrate in sequence; forming a color filter array having a plurality of color filters on the passivation layer; forming an over-coating layer (OCL) on the color filter array by using a positive photoresist or a negative photoresist; forming openings in the OCL by patterning the OCL by using a predetermined mask; and forming dome-typed microlenses on a patterned OCL.
    Type: Application
    Filed: October 3, 2005
    Publication date: January 26, 2006
    Inventors: Chang-Young Jeong, Dae-Ung Shin, Hong-Ik Kim