Abstract: A reaction vessel pickup mechanism, an automatic loading device, a sample analyzer, and a loading method are disclosed. Driven by a driving structure, each of the pickup blocks moves in a first preset time or a preset distance and then stops or shakes, so that a reaction vessel is dropped from the pickup blocks more easily.

Abstract: A reaction vessel pickup mechanism, an automatic loading device, a sample analyzer, and a loading method are disclosed. Driven by a driving structure, each of the pickup blocks moves in a first preset time or a preset distance and then stops or shakes, so that a reaction vessel is dropped from the pickup blocks more easily.

Abstract: According to one embodiment of the invention, a method for enhancing multiple feature lithography is provided. The method includes generating a plurality of maps each associated with a particular one of a plurality of circuit features. Each map maps an illumination field comprising a plurality of point sources and indicates, in terms of a process metric and for each point source, a level of feature quality that will result from using the each point source to image the each circuit feature. The method also includes identifying, based on the maps, a group of one or more of the point sources that, if used to image the circuit features onto a target surface, will result in an overall feature quality level equal to or greater than a predetermined quality threshold.

Abstract: According to one embodiment of the invention, a method for enhancing multiple feature lithography is provided. The method includes generating a plurality of maps each associated with a particular one of a plurality of circuit features. Each map maps an illumination field comprising a plurality of point sources and indicates, in terms of a process metric and for each point source, a level of feature quality that will result from using the each point source to image the each circuit feature. The method also includes identifying, based on the maps, a group of one or more of the point sources that, if used to image the circuit features onto a target surface, will result in an overall feature quality level equal to or greater than a predetermined quality threshold.

Abstract: The invention provides a machine for washing a mop, which includes a housing, a driving mechanism, a controlling mechanism, a pulsator, a water tank, a water removal barrel, a draining mechanism, and a mop supporting means, wherein an integrated device of the pulsator and the water removal barrel consists of the water removal barrel which is a cylinder without bottoms and the pulsator which is fixed together with the lower end of the barrel. The mop supporting means is a protrusion supporting element which is on the upper end of the center of the pulsator.

Abstract: Characterizing an exposure tool involves receiving data describing a pattern formed at a wafer. The pattern is formed by illuminating the wafer using an exposure tool, and the data has a scan direction and slit direction. An image field is mapped according to the data to determine an image field error of the data, and the image field error is separated from the data to reduce variation of the data in the scan direction. The data is reduced to the slit direction. Errors associated with the exposure tool are determined from the data in order to characterize the exposure tool.

Abstract: Characterizing an exposure tool involves receiving data describing a pattern formed at a wafer. The pattern is formed by illuminating the wafer using an exposure tool, and the data has a scan direction and slit direction. An image field is mapped according to the data to determine an image field error of the data, and the image field error is separated from the data to reduce variation of the data in the scan direction. The data is reduced to the slit direction. Errors associated with the exposure tool are determined from the data in order to characterize the exposure tool.