Patents by Inventor Chang Feng Xia

Chang Feng Xia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6203623
    Abstract: An aerosol assisted chemical cleaning method to remove wall deposition from reaction chambers is provided. The method generates cleaning chemicals in an aerosol state, and then feeds them into the reaction chamber by a carrier gas. The cleaning chemicals interact quickly with unwanted deposits on all internal surfaces of the reaction chamber. By controlling the pressure in the closed reaction chamber, the deposits can be stripped off from the wall and fall into a waste acid collector. The acid collector can then process the waste to prevent contamination.
    Type: Grant
    Filed: December 28, 1999
    Date of Patent: March 20, 2001
    Assignee: Ball Semiconductor, Inc.
    Inventor: Chang Feng Xia