Abstract: The present disclosure provides a semiconductor device and a method of fabricating the same, the semiconductor device includes a substrate, an insulating layer, a plurality of bit lines, and a bit line contact. The insulating layer is disposed on the substrate, the bit lines are disposed on the insulating layer, and the bit line contact is disposed between the bit lines and the substrate, to electrically connect the bit lines, wherein the bit line contact comprises a first conductive layer and a first oxidized interface layer, and a bottommost surface of the first oxidized interface layer is lower than a top surface of the insulating layer. Through these arrangements, the semiconductor device includes the bit line contact having a composite semiconductor layer, which is allowable to improve the structural reliability of the bit lines and the bit line contacts, thereby achieve better performance.

Abstract: A memory device and a manufacturing method thereof are disclosed in the present invention. The memory device includes a substrate, trenches, an oxide semiconductor layer, a gate dielectric layer, and word line structures. The substrate includes active regions and an isolation structure located between the active regions. The active regions contain silicon. The trenches are disposed in the active regions and the isolation structure. The oxide semiconductor layer is disposed in each trench. The gate dielectric layer is disposed on the oxide semiconductor layer and located in each trench. The word line structures are disposed on the gate dielectric layer and located in the trenches, respectively. At least a portion of the gate dielectric layer is disposed between the oxide semiconductor layer and each word line structure.

Abstract: A vehicle charging station includes a track configured to extend across a plurality of vehicle parking spaces. The charging station further includes a movable charging apparatus supported by the track and translatable along the track between the plurality of vehicle parking spaces. The charging station further includes a first contact wire extending approximately parallel to the track. The charging station further includes a first conductor pole configured to couple the movable charging apparatus to the first contact wire at a plurality of locations along a width of the first contact wire. The first conductor pole is configured to move with the movable charging apparatus. In such a manner, a one-to-many charging station can be accomplished.

Abstract: A vehicle charging station includes a track configured to extend across a plurality of vehicle parking spaces. The charging station further includes a movable charging apparatus supported by the track and translatable along the track between the plurality of vehicle parking spaces. The charging station further includes a first contact wire extending approximately parallel to the track. The charging station further includes a first conductor pole configured to couple the movable charging apparatus to the first contact wire at a plurality of locations along a width of the first contact wire. The first conductor pole is configured to move with the movable charging apparatus. In such a manner, a one-to-many charging station can be accomplished.