Abstract: A diffraction apparatus and a method for non-destructively testing internal crystal orientation uniformity of a workpiece are provided. The apparatus includes: an X-ray irradiation system for irradiating an X-ray to a measured part of a sample under testing, and an X-ray detection system for simultaneously detecting a plurality of diffracted X-rays formed by diffraction of a plurality of parts of the sample under testing, to measure an X-ray diffraction intensity distribution of the sample under testing, where the detected diffracted X-rays are short-wavelength characteristic X-rays, and the X-ray detection system is an array detection system. By the apparatus and the method, the detection efficiency is greatly improved.

Abstract: A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.

Abstract: A diffraction device and a method for non-destructive testing of internal crystal orientation uniformity of a workpiece. The diffraction device comprises: an X-ray irradiation system used for irradiating X-ray to a measuring part of a measured sample (4); an X-ray detection system used for detecting a plurality of diffraction X-rays formed by diffracting the X-ray with a plurality of parts of the measured sample (4), to measure X-ray diffraction intensity distribution of the measured sample (4). The detected X-ray is short-wavelength feature X-ray, and the X-ray detection system is an array detection system (5). The method comprises steps of selecting the short-wavelength feature X-ray, performing texture analysis on the measured sample (4), and determining a diffraction vector Q to be measured; and obtaining the X-ray diffraction intensity of the corresponding part of the measured sample (4).

Abstract: A measuring device for the short-wavelength X-ray diffraction for test samples or work pieces made of lower-atomic-number crystalline and a method thereof are disclosed in the present invention. The measuring device comprises: an X-ray tube, an incident diaphragm, a table, a position-restricting receiving slit for a position-restricted part of a measured sample or work piece, a goniometer, a detector and an energy analyzer, the said X-ray tube and detector are arranged in the two sides of the table on which the sample or work pieces is located, the detector is intended to receive the transmitted diffracted ray. With the short-wavelength X-ray diffraction transmission method in the present invention X-ray diffracting patterns at different depths and different parts of a thicker test sample or work piece made of crystalline material and their distribution can be obtained without destructing the test sample or work piece, and then the data are processed by a computer to obtain phase, residual stress, etc.

Abstract: The present utility model relates to the field of X-ray diffraction technology. With different combinations, the X-ray diffractometer in the utility model is enabled to have functions of powder diffraction measurement, double crystal diffraction measurement, mirror reflection measurement and diffuse scattering measurement, thus becoming a multi-functional X-ray diffractometer. Further, the X-ray diffractometer is fully automatic in operation, with data collection being under the control of a microcomputer; and is suitable for microstructure analysis of materials, especially for microstructure analysis of solid film materials. The X-ray diffractometer has convenient operation and stable performance, and the technical parameters thereof may meet a general demand in the research of epitaxial film. Also, the X-ray diffractometer is low in cost, and may provide experience for the reconstruction of a diffractometer of the same kind.