Abstract: Provided are a vehicle control apparatus and a vehicle control method, a vehicle control apparatus including: a sensor configured to sense at least one of a vehicle speed value and a lateral acceleration value of a vehicle; an active camber device including a knuckle for supporting a wheel of the vehicle, an upper arm having one end rotatably connected to the knuckle to form a stroke node, and a actuator for rotationally shifting the stroke node of the upper arm with respect to a connection point with the knuckle in a vertical direction; and a controller configured to vary a position of the stoke node of the upper arm through the actuator on the basis of one of the sensed vehicle speed value and the sensed lateral acceleration value.

Abstract: Provided is an active roll control apparatus for controlling a stiffness value of a stabilizer bar by moving the stabilizer bar, which is installed between left and right wheels of a vehicle and extends in a first direction, and a stabilizer link connected with the stabilizer bar to improve turning stability of the vehicle by actively controlling roll stiffness of the vehicle. The active roll control apparatus includes rotating shafts having one ends connected to both ends of the stabilizer bar, moving units into which the rotating shafts are inserted and which are movable along outer side surfaces of the rotating shafts in a second direction perpendicular to the first direction, and a driving unit configured to rotate the rotating shafts to move the moving units.

Abstract: Provided are a vehicle control apparatus and a vehicle control method, a vehicle control apparatus including: a sensor configured to sense at least one of a vehicle speed value and a lateral acceleration value of a vehicle; an active camber device including a knuckle for supporting a wheel of the vehicle, an upper arm having one end rotatably connected to the knuckle to form a stroke node, and a actuator for rotationally shifting the stroke node of the upper arm with respect to a connection point with the knuckle in a vertical direction; and a controller configured to vary a position of the stoke node of the upper arm through the actuator on the basis of one of the sensed vehicle speed value and the sensed lateral acceleration value.

Abstract: An active roll control apparatus is provided. To adjust a stiffness value of the stabilizer bar by moving a stabilizer bar installed between left and right wheels of a vehicle and extending in a first direction and a stabilizer link connected to the stabilizer bar, the active roll control apparatus includes a sliding part having one side connected to the stabilizer bar and the other side connected to the stabilizer link to slide the stabilizer link in a second direction perpendicular to the first direction, and a movement restricting part installed at the sliding part to restrict movement when the sliding part slides.

Abstract: Disclosed are a phase-shift blankmask and a phase-shift photomask, which includes a phase-shift film made of silicon (Si) or a silicon (Si) compound on a transparent substrate and has a high transmittance characteristic. In the phase-shift blankmask according to the present disclosure, the phase-shift film has a high transmittance of 50% or higher, thereby achieving a micro pattern smaller than or equal to 32 nm, preferably 14 nm, and more preferably 10 nm for a semiconductor device, for example, a DRAM, a flash memory, a logic device.

Abstract: Provided is an active roll control apparatus for controlling a stiffness value of a stabilizer bar by moving the stabilizer bar, which is installed between left and right wheels of a vehicle and extends in a first direction, and a stabilizer link connected with the stabilizer bar to improve turning stability of the vehicle by actively controlling roll stiffness of the vehicle. The active roll control apparatus includes rotating shafts having one ends connected to both ends of the stabilizer bar, moving units into which the rotating shafts are inserted and which are movable along outer side surfaces of the rotating shafts in a second direction perpendicular to the first direction, and a driving unit configured to rotate the rotating shafts to move the moving units.

Abstract: Disclosed are a blankmask and a photomask, in which compositions of metal and light elements of a light-shielding film are controlled so that the light-shielding film can guarantee a light-shielding efficiency, increase an etching speed, become thinner, and have a minimum sheet-resistance. To this end, the blankmask according to the present invention includes at least a light-shielding film on a transparent substrate, and the light-shielding film includes a first light-shielding layer adjacent to the transparent substrate and a second light-shielding layer formed on the first light-shielding layer, in which the first and the second light-shielding film contains chrome (Cr) and molybdenum (Mo).

Abstract: Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14 nm, and more preferably not greater than 10 nm. To this end, a phase-shift film, a light-shielding film, an etch-stopping film and a hard film are provided on a transparent substrate, in which the light-shielding film has a multi-layered structure of two or more layers different in composition, one of which essentially contains oxygen (O), a light-shielding layer essentially having oxygen (O) occupies 50%˜100% of the whole thickness of the light-shielding film, and the phase-shift film has a transmissivity of 10%˜50%.

Abstract: Disclosed is a phase-shift blankmask, in which a light-shielding film includes a metal compound and having a structure of a multi-layer film or a continuous film, which includes a first light-shielding layer and a second light-shielding layer. The second light-shielding layer has higher optical density at an exposure wavelength per unit thickness (?) than the first light-shielding layer. The first light-shielding layer occupies 70% to 90% of the whole thickness of the light-shielding film. With this, the blankmask secures a light-shielding effect, has an improved etching speed, and makes a resist film thinner, thereby achieving a fine pattern.

Abstract: An active roll control apparatus is provided. To adjust a stiffness value of the stabilizer bar by moving a stabilizer bar installed between left and right wheels of a vehicle and extending in a first direction and a stabilizer link connected to the stabilizer bar, the active roll control apparatus includes a sliding part having one side connected to the stabilizer bar and the other side connected to the stabilizer link to slide the stabilizer link in a second direction perpendicular to the first direction, and a movement restricting part installed at the sliding part to restrict movement when the sliding part slides.

Abstract: Disclosed are a blankmask and a photomask, in which compositions of metal and light elements of a light-shielding film are controlled so that the light-shielding film can guarantee a light-shielding efficiency, increase an etching speed, become thinner, and have a minimum sheet-resistance. To this end, the blankmask according to the present invention includes at least a light-shielding film on a transparent substrate, and the light-shielding film includes a first light-shielding layer adjacent to the transparent substrate and a second light-shielding layer formed on the first light-shielding layer, in which the first and the second light-shielding film contains chrome (Cr) and molybdenum (Mo).

Abstract: A blankmask and a photomask using the same are provided. The blankmask can be useful in preventing the loss in thickness of lateral, top and bottom surfaces of a pattern of a light shielding film or a phase shifting film after the manufacture of the photomask by forming protective film, which has an etch selectivity with respect to a pattern of a hard film or the light shielding film, on the light shielding film or the phase shifting film so that the loss of the phase shifting film formed under the light shielding film or the phase shifting film can be prevented when a process of removing the light shielding film disposed under the hard film or a pattern of the light shielding film is performed during a washing process and a process of removing a pattern of the hard film in a method of manufacturing a photomask, thereby securing uniformity in thickness.

Abstract: Provided is a photomask having a high-resolution pattern of a half-pitch of 32 nm or less (particularly, a half-pitch of 22 nm or less), which is manufactured by forming a blankmask in which a light-proof film and a hard film having a small thickness and high etch selectivity with respect to the light-proof film are formed on a transparent substrate. The photomask may have a high quality by adjusting a composition ratio of a metal, silicon (Si), and light elements that constitute the light-proof film to suppress damage to the pattern caused by an XeF2 gas in an electron-beam repair process.

Abstract: Disclosed is a phase-shift blankmask for manufacturing a photomask, which can achieve a fine pattern of not greater than 32 nm, preferably not greater than 14 nm, and more preferably not greater than 10 nm. To this end, a phase-shift film, a light-shielding film, an etch-stopping film and a hard film are provided on a transparent substrate, in which the light-shielding film has a multi-layered structure of two or more layers different in composition, one of which essentially contains oxygen (O), a light-shielding layer essentially having oxygen (O) occupies 50%˜100% of the whole thickness of the light-shielding film, and the phase-shift film has a transmissivity of 10%˜50%.

Abstract: Disclosed is a phase-shift blankmask, in which a light-shielding film includes a metal compound and having a structure of a multi-layer film or a continuous film, which includes a first light-shielding layer and a second light-shielding layer. The second light-shielding layer has higher optical density at an exposure wavelength per unit thickness (?) than the first light-shielding layer. The first light-shielding layer occupies 70% to 90% of the whole thickness of the light-shielding film. With this, the blankmask secures a light-shielding effect, has an improved etching speed, and makes a resist film thinner, thereby achieving a fine pattern.

Abstract: A blankmask and a photomask using the same are provided. The blankmask can be useful in preventing the loss in thickness of lateral, top and bottom surfaces of a pattern of a light shielding film or a phase shifting film after the manufacture of the photomask by forming protective film, which has an etch selectivity with respect to a pattern of a hard film or the light shielding film, on the light shielding film or the phase shifting film so that the loss of the phase shifting film formed under the light shielding film or the phase shifting film can be prevented when a process of removing the light shielding film disposed under the hard film or a pattern of the light shielding film is performed during a washing process and a process of removing a pattern of the hard film in a method of manufacturing a photomask, thereby securing uniformity in thickness.

Abstract: Provided is a photomask having a high-resolution pattern of a half-pitch of 32 nm or less (particularly, a half-pitch of 22 nm or less), which is manufactured by forming a blankmask in which a light-proof film and a hard film having a small thickness and high etch selectivity with respect to the light-proof film are formed on a transparent substrate. The photomask may have a high quality by adjusting a composition ratio of a metal, silicon (Si), and light elements that constitute the light-proof film to suppress damage to the pattern caused by an XeF2 gas in an electron-beam repair process.

Abstract: Disclosed is a cooling fan including a fan rotated by a motor, for forcibly circulating the air, and a fan housing having a through hole with a predetermined inside diameter so that the fan can be mounted thereon. A curvature radius of the end of the inner circumference of the through hole sucking the air is smaller than a curvature radius of the end of the inner circumference of the through hole discharging the air. As a result, the cooling fan can minimize noises in the operation.

Abstract: Disclosed is a cooling fan including a fan rotated by a motor, for forcibly circulating the air, and a fan housing having a through hole with a predetermined inside diameter so that the fan can be mounted thereon. A curvature radius of the end of the inner circumference of the through hole sucking the air is smaller than a curvature radius of the end of the inner circumference of the through hole discharging the air. As a result, the cooling fan can minimize noises in the operation.

Abstract: In a fully-automated washing machine, a rotating cylindrical tub in which laundry is cleaned has an agitating rod installed through the center of the tub. A water-supply pipe is axially formed within the agitating rod by penetrating the same and connected to an external water supplying source. A sprinkler unit installed on top of the agitating rod injects water supplied through the water-supply pipe into the tub. The water is supplied such that it is widely dispersed on the clothes in the tub.