Abstract: A color filter substrate, a preparing method thereof and a display device are provided. The method includes: preparing a black matrix pattern and a color filter pattern on a substrate; preparing planarization layer and spacers including primary spacers and secondary spacers. The black matrix pattern includes primary areas and secondary areas, and the primary area has a width in the column direction of the black matrix pattern greater than the width of the secondary area in the column direction of the black matrix pattern. The primary spacers are located on primary areas of the black matrix pattern; and the secondary spacers are located on secondary areas of the black matrix pattern, the primary spacers have a height greater than that of the secondary spacers.

Abstract: The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.

Abstract: The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.

Abstract: The present disclosure provides a color filter substrate and a manufacturing method thereof, and a display device. The color filter substrate comprises a plurality of pixel regions and a matrix provided between every two adjacent pixel regions, the pixel region comprises a color filter layer and the color filter layer and the matrix are partially overlapped. Wherein, a height compensation part is provided above the color filter layer, and a top surface of the height compensation part is configured to be planar so as to compensate for unevenness of a surface of the color filter layer.

Abstract: A coating apparatus for manufacturing a color filter substrate, comprising a roller and a resin-pressing device, the roller is provided with a plurality of openings on its external surface, the openings have a shape identical to a shape of color pixel units of the substrate to be coated, the roller is further provided with a cavity communicating with the openings, the cavity is configured for housing resin; the resin-pressing device is configured for forcing the resin within the cavity out through the openings. Also disclosed is a process for manufacturing a color filter substrate, comprising: providing a substrate, on which a predetermined area forming patterns for color filter units is provided; and coating the predetermined area of the substrate with the coating apparatus to form the patterns for color filter units.

Abstract: An exposure apparatus is provided. It comprises: a substrate stage on which a holding region is provided to hold a substrate to be exposed, the holding region being provided with a support portion thereon for supporting the substrate to be exposed; a supporter configured to support a mask; a light source system configured to provide an exposure light which is illuminated on the substrate to be exposed via the mask to reproduce a pattern of the mask onto the substrate, wherein the support portion has a height which decreases gradually from an outer periphery of the holding region to a center of the holding region, such that an exposure distance is constant at all of positions on the holding region. With the above structure, the graph dimension may be kept uniform on the substrate even if the mask becomes bent.

Abstract: A color filter substrate, a preparing method thereof and a display device are provided. The method includes: preparing a black matrix pattern and a color filter pattern on a substrate; preparing planarization layer and spacers including primary spacers and secondary spacers. The black matrix pattern includes primary areas and secondary areas, and the primary area has a width in the column direction of the black matrix pattern greater than the width of the secondary area in the column direction of the black matrix pattern. The primary spacers are located on primary areas of the black matrix pattern; and the secondary spacers are located on secondary areas of the black matrix pattern, the primary spacers have a height greater than that of the secondary spacers.

Abstract: An exposure apparatus is provided. It comprises: a substrate stage on which a holding region is provided to hold a substrate to be exposed, the holding region being provided with a support portion thereon for supporting the substrate to be exposed; a supporter configured to support a mask; a light source system configured to provide an exposure light which is illuminated on the substrate to be exposed via the mask to reproduce a pattern of the mask onto the substrate, wherein the support portion has a height which decreases gradually from an outer periphery of the holding region to a center of the holding region, such that an exposure distance is constant at all of positions on the holding region. With the above structure, the graph dimension may be kept uniform on the substrate even if the mask becomes bent.

Abstract: A coating apparatus for manufacturing a color filter substrate, comprising a roller and a resin-pressing device, the roller is provided with a plurality of openings on its external surface, the openings have a shape identical to a shape of color pixel units of the substrate to be coated, the roller is further provided with a cavity communicating with the openings, the cavity is configured for housing resin; the resin-pressing device is configured for forcing the resin within the cavity out through the openings. Also disclosed is a process for manufacturing a color filter substrate, comprising: providing a substrate, on which a predetermined area forming patterns for color filter units is provided; and coating the predetermined area of the substrate with the coating apparatus to form the patterns for color filter units.