Patents by Inventor Chang-Ping Lin

Chang-Ping Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240184671
    Abstract: A using method of a statistics table in a solid state storage device is provided. When the solid state storage device is powered on, the statistics table is loaded from a non-volatile memory into a volatile memory. A content of the statistics table contains plural ranges. The plural ranges respectively correspond to plural counting values. If an update cycle is reached, the statistics table is updated according to a sensed value. A first sum value is calculated according to the plural counting values corresponding to the plural ranges in the statistics table. The timing of enabling a data verification process for the non-volatile memory is determined according to the first sum value and a first threshold value.
    Type: Application
    Filed: May 9, 2023
    Publication date: June 6, 2024
    Inventors: Liang-You LIN, Ya-Ping PAN, Po-Lin LIU, Chang-Chun ZHENG
  • Patent number: 6711956
    Abstract: In accordance with the present invention, an apparatus and a method for regulating exhaust pressure in an evacuation system of a semiconductor process chamber are provided. The method comprises steps of generating a first pressure in the semiconductor process chamber with the evacuation system, monitoring the first pressure to generate a first signal, determining a set point for the exhaust pressure responsive to the first signal, and regulating the exhaust pressure by a controller till reaching the set point. The key aspect of the present invention is to maintain the equilibrium of the chamber pressure and the exhaust pressure by implementing an exhaust controller to control the gas flow rate introduced into the evacuation system. In other words, when the chamber pressure is increased, the gas is introduced into the evacuation system at an increased flow rate. On the other hand, when the chamber pressure is decreased, the gas is introduced into the evacuation system at a decreased flow rate.
    Type: Grant
    Filed: October 31, 2001
    Date of Patent: March 30, 2004
    Assignee: Macronix International Co., Ltd.
    Inventors: Yu-An Lin, Long-Wen Lin, Wen-Cheng Lai, Chang-Ping Lin
  • Publication number: 20030079550
    Abstract: In accordance with the present invention, an apparatus and a method for regulating exhaust pressure in an evacuation system of a semiconductor process chamber are provided. The method comprises steps of generating a first pressure in the semiconductor process chamber with the evacuation system, monitoring the first pressure to generate a first signal, determining a set point for the exhaust pressure responsive to the first signal, and regulating the exhaust pressure by a controller till reaching the set point. The key aspect of the present invention is to maintain the equilibrium of the chamber pressure and the exhaust pressure by implementing an exhaust controller to control the gas flow rate introduced into the evacuation system. In other words, when the chamber pressure is increased, the gas is introduced into the evacuation system at an increased flow rate. On the other hand, when the chamber pressure is decreased, the gas is introduced into the evacuation system at a decreased flow rate.
    Type: Application
    Filed: October 31, 2001
    Publication date: May 1, 2003
    Applicant: MACRONIX INTERNATIONAL CO., LTD.
    Inventors: Yu-An Lin, Long-Wen Lin, Wen-Cheng Lai, Chang-Ping Lin
  • Patent number: D645043
    Type: Grant
    Filed: January 8, 2009
    Date of Patent: September 13, 2011
    Assignee: General Electric Company
    Inventors: Samuel Miller, Joseph Marc McConnaughey, Chen Te Sheng, Chang-Ping Lin, Wen-Chieh Wang, Michael James Stauffer