Patents by Inventor Changquing Hu

Changquing Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Determining source patterns for use in photolithography
    Patent number: 8683396
    Abstract: Embodiments of a computer system, a process, a computer-program product (i.e., software), and a data structure or a file for use with the computer system are described. These embodiments may be used to determine or generate source patterns that define illumination patterns on photo-masks during a photolithographic process. Moreover, a given source pattern may be determined concurrently with an associated mask pattern (to which a given photo-mask corresponds) or sequentially (i.e., either the given source pattern may be determined before the associated mask pattern or vice versa.). During the determining, the given source pattern may be represented using one or more level-set functions. Additionally, the source pattern may be determined using an Inverse Lithography (ILT) calculation.
    Type: Grant
    Filed: July 22, 2009
    Date of Patent: March 25, 2014
    Assignee: Synopsys, Inc.
    Inventors: Changquing Hu, Linyong Pang
  • Determining Source Patterns for Use in Photolithography
    Publication number: 20110022994
    Abstract: Embodiments of a computer system, a process, a computer-program product (i.e., software), and a data structure or a file for use with the computer system are described. These embodiments may be used to determine or generate source patterns that define illumination patterns on photo-masks during a photolithographic process. Moreover, a given source pattern may be determined concurrently with an associated mask pattern (to which a given photo-mask corresponds) or sequentially (i.e., either the given source pattern may be determined before the associated mask pattern or vice versa.). During the determining, the given source pattern may be represented using one or more level-set functions. Additionally, the source pattern may be determined using an Inverse Lithography (ILT) calculation.
    Type: Application
    Filed: July 22, 2009
    Publication date: January 27, 2011
    Applicant: Luminescent Technologies Inc.
    Inventors: Changquing Hu, Linyong Pang