Patents by Inventor Changsheng Yuan

Changsheng Yuan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate
    Patent number: 9676123
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Grant
    Filed: April 5, 2016
    Date of Patent: June 13, 2017
    Assignee: NANJING UNIVERSITY
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu
  • FLEXIBLE NANOIMPRINT MOLD, METHOD FOR FABRICATING THE SAME, AND MOLD USAGE ON PLANAR AND CURVED SUBSTRATE
    Publication number: 20160214281
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Application
    Filed: April 5, 2016
    Publication date: July 28, 2016
    Applicant: Nanjing University
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu
  • Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate
    Patent number: 9316903
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: April 19, 2016
    Assignee: Nanjing University
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu
  • FLEXIBLE NANOIMPRINT MOLD, METHOD FOR FABRICATING THE SAME, AND MOLD USAGE ON PLANAR AND CURVED SUBSTRATE
    Publication number: 20150024308
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Application
    Filed: September 29, 2014
    Publication date: January 22, 2015
    Applicant: NANJING UNIVERSITY
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu
  • Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate
    Patent number: 8871048
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Grant
    Filed: February 26, 2009
    Date of Patent: October 28, 2014
    Assignee: Nanjing University
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu
  • FLEXIBLE NANOIMPRINT MOLD, METHOD FOR FABRICATING THE SAME, AND MOLD USAGE ON PLANAR AND CURVED SUBSTRATE
    Publication number: 20100109203
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Application
    Filed: February 26, 2009
    Publication date: May 6, 2010
    Applicant: NANJING UNIVERSITY
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu