Patents by Inventor Chantal J. Arena-Foster

Chantal J. Arena-Foster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Developing photoresist with supercritical fluid and developer
    Patent number: 7044662
    Abstract: An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
    Type: Grant
    Filed: August 3, 2004
    Date of Patent: May 16, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Chantal J. Arena-Foster, Allan Wendell Awtrey, Nicholas Alan Ryza, Paul Schilling
  • Drying resist with a solvent bath and supercritical CO2
    Patent number: 6928746
    Abstract: A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the object. The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath. A drying process is performed.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 16, 2005
    Assignee: Tokyo Electron Limited
    Inventors: Chantal J. Arena-Foster, Allan Wendell Awtrey, Nicholas Alan Ryza, Paul Schilling
  • Developing photoresist with supercritical fluid and developer
    Patent number: 6924086
    Abstract: A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 2, 2005
    Assignee: Tokyo Electron Limited
    Inventors: Chantal J. Arena-Foster, Allan Wendell Awtrey, Nicholas Alan Ryza, Paul Schilling
  • Removal of contaminants using supercritical processing
    Publication number: 20040072706
    Abstract: A method of cleaning a surface of an object is disclosed. The object is placed onto a support region within a pressure chamber. The pressure chamber is then pressurized. A cleaning process is performed. A series of decompression cycles are performed. The pressure chamber is then vented.
    Type: Application
    Filed: March 21, 2003
    Publication date: April 15, 2004
    Inventors: Chantal J. Arena-Foster, Allan Wendell Awtrey, Nicholas Alan Ryza, Paul Schilling
  • Drying resist with a solvent bath and supercritical CO2
    Publication number: 20040035021
    Abstract: A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the object. The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath. A drying process is performed.
    Type: Application
    Filed: February 14, 2003
    Publication date: February 26, 2004
    Inventors: Chantal J. Arena-Foster, Allan Wendell Awtrey, Nicholas Alan Ryza, Paul Schilling