Abstract: A solar cell includes a photoelectric conversion layer, a doped layer, a first passivation layer, a first TCO layer, a front electrode and a back electrode. The doped layer is disposed on the front surface of the photoelectric conversion layer. The first passivation layer is disposed on the doped layer, wherein the first passivation layer has a plurality of openings exposing a portion of the doped layer. The first TCO layer is disposed on the first passivation layer and in the openings, and directly contacts the exposed doped layer via the openings, wherein a ratio of an area of the openings to an area of the first TCO layer is between 0.01 and 0.5. The front electrode is disposed on the first TCO layer. The back electrode is disposed on the back surface of the photoelectric conversion layer.

Abstract: A solar cell includes a photoelectric conversion layer, a doped layer, a first passivation layer, a first TCO layer, a front electrode and a back electrode. The doped layer is disposed on the front surface of the photoelectric conversion layer. The first passivation layer is disposed on the doped layer, wherein the first passivation layer has a plurality of openings exposing a portion of the doped layer. The first TCO layer is disposed on the first passivation layer and in the openings, and directly contacts the exposed doped layer via the openings, wherein a ratio of an area of the openings to an area of the first TCO layer is between 0.01 and 0.5. The front electrode is disposed on the first TCO layer. The back electrode is disposed on the back surface of the photoelectric conversion layer.

Abstract: A solar cell is provided. The solar cell includes a Si substrate having a first surface and a second surface opposite to each other, an emitter, a first electrode, a doped region, a passivation layer, a doped polysilicon layer, a semiconductor layer, and a second electrode. The emitter is disposed on the first surface. The first electrode is disposed on the emitter. The doped region is disposed in the second surface. The passivation layer is disposed on the second surface. The doped polysilicon layer is disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface. The semiconductor layer is disposed on the doped polysilicon layer and in the holes. The band gap of the semiconductor layer is greater than that of the Si substrate. The second electrode is disposed on the semiconductor layer.

Abstract: A solar cell includes a silicon substrate, a passivation structure, and a metal electrode. The passivation structure is disposed on a surface of the silicon substrate, and the passivation structure includes a tunneling layer and a doped polysilicon layer. The tunneling layer is disposed on the surface of the silicon substrate. The doped polysilicon layer is disposed on the tunneling layer and includes a first region and a second region having different thicknesses from each other, and the thickness of the first region is greater than that of the second region, wherein the thickness of the first region is between 50 nm and 500 nm, and the thickness of the second region is greater than 0 and equal to or less than 250 nm. The metal electrode is disposed on the first region of the doped polysilicon layer.

Abstract: A solar cell is provided. The solar cell includes a Si substrate having a first surface and a second surface opposite to each other, an emitter, a first electrode, a doped region, a passivation layer, a doped polysilicon layer, a semiconductor layer, and a second electrode. The emitter is disposed on the first surface. The first electrode is disposed on the emitter. The doped region is disposed in the second surface. The passivation layer is disposed on the second surface. The doped polysilicon layer is disposed on the passivation layer, wherein a plurality of holes penetrates the doped polysilicon layer and the passivation layer and exposes a portion of the second surface. The semiconductor layer is disposed on the doped polysilicon layer and in the holes. The band gap of the semiconductor layer is greater than that of the Si substrate. The second electrode is disposed on the semiconductor layer.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivsation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A remote control method comprises: providing a receiving device electrically connected with a display device; the receiving device establishing wireless communication connections respectively with a mobile internet device and a computer; a user inputting a control instruction to the mobile internet device to transmit the control instruction to the receiving device therefrom; the receiving device forwarding the control instruction to the computer; and the computer responding to the control instruction and transmitting a screen frame to the receiving device for the display device to output the screen frame. The remote control method may simplify the operating procedures for switching computers and enhance the communication quality between the mobile internet device and the computer.

Abstract: A liquid crystal display panel includes a display region, a periphery circuit region, a joint obligate region, a plurality of first test thin-film transistors (TFTs), a plurality of second TFTs, a plurality of first lines, a plurality of second lines, a blank region, and at least one first adjustment TFT. The first and second test TFTs are disposed on the joint obligate region according to a regular distance. Each of the first and second test TFTs has a transistor width. The first adjustment TFT is disposed on the blank region. The width of the blank region is not smaller than the sum of the twice regular distance and the transistor width. Thereby, the present invention can prevent the band mura of the liquid crystal display panel effectively when the liquid crystal display panel is in testing.

Abstract: A remote control method comprises: providing a receiving device electrically connected with a display device; the receiving device establishing wireless communication connections respectively with a mobile internet device and a computer; a user inputting a control instruction to the mobile internet device to transmit the control instruction to the receiving device therefrom; the receiving device forwarding the control instruction to the computer; and the computer responding to the control instruction and transmitting a screen frame to the receiving device for the display device to output the screen frame. The remote control method may simplify the operating procedures for switching computers and enhance the communication quality between the mobile internet device and the computer.

Abstract: Non-volatile memories formed on a substrate and fabrication methods are disclosed. A bottom electrode comprising a metal layer is disposed on the substrate. A buffer layer comprising a LaNiO3 film is disposed over the metal layer. A resistor layer comprising a SrZrO3 film is disposed on the buffer layer. A top electrode is disposed on the resistor layer.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.

Abstract: Non-volatile memories formed on a substrate and fabrication methods are disclosed. A bottom electrode comprising a metal layer is disposed on the substrate. A buffer layer comprising a LaNiO3 film is disposed over the metal layer. A resistor layer comprising a SrZrO3 film is disposed on the buffer layer. A top electrode is disposed on the resistor layer.

Abstract: Non-volatile memories formed on a substrate and fabrication methods are disclosed. A bottom electrode comprising a metal layer is disposed on the substrate. A buffer layer comprising a LaNiO3 film is disposed over the metal layer. A resistor layer comprising a SrZrO3 film is disposed on the buffer layer. A top electrode is disposed on the resistor layer.

Abstract: A photosensitive monomer of formula. “L1”, “L2”, “L3”, “L4”, “L5”, “L6” are selected from hydrogen, fluorine, chlorine, cyano, alkyl, alkylcarbonyl, alkoxycarbonyl, and alkylcarbonyloxy having 1 to 7 carbon atoms, in which one or more hydrogen atoms may be substituted by fluorine or chlorine. “R1”, “R2”, “R3” and “R4” are selected from hydrogen, fluorine, chlorine, cyano, thiocyanato, pentafluoro sulfanyl, nitrite, straight-chained alkyl/branched alkyl, and a “Z-Sp-P” group. At least one of “R1”, “R2”, “R3” and “R4” is “Z-Sp-P” group. “Z” is selected from oxygen, sulfur, methyoxy, carbonyl, caroboxyl, carbamoyl, methylthio, ethenylcarbonyl, carbonylethenyl, and a single bond. “Sp” is selected from straight-chained alkyl or branched alkyl and a single bond. “P” comprises a polymerizable group.

Abstract: A flat display panel includes a first substrate, a second substrate opposite to the first substrate, a sealant disposed between the first and second substrates. The sealant, the edge of the inner surface of the first substrate, and the edge of the inner surface of the second substrate form a space, and the flat display panel further includes a protection layer disposed inside the space so as to reinforce the structural strength of the flat display panel.

Abstract: A liquid crystal display panel includes a display region, a periphery circuit region, a joint obligate region, a plurality of first test thin-film transistors (TFTs), a plurality of second TFTs, a plurality of first lines, a plurality of second lines, a blank region, and at least one first adjustment TFT. The first and second test TFTs are disposed on the joint obligate region according to a regular distance. Each of the first and second test TFTs has a transistor width. The first adjustment TFT is disposed on the blank region. The width of the blank region is not smaller than the sum of the twice regular distance and the transistor width. Thereby, the present invention can prevent the band mura of the liquid crystal display panel effectively when the liquid crystal display panel is in testing.

Abstract: A multi-domain liquid crystal display (LCD) including an active device array substrate, an opposite substrate, an electric field shielding layer, and a liquid crystal layer is provided. The active device array substrate has a plurality of pixels, wherein each pixel has a pixel electrode. The opposite substrate has a common electrode disposed between the opposite substrate and the active device array substrate. The electric field shielding layer is disposed on a part of each pixel electrode. The liquid crystal layer is disposed between the active device array substrate and the opposite substrate. The liquid crystal layer corresponding to each pixel is divided into a low-voltage domain and a high-voltage domain having the same cell gap, wherein the position of the electric field shielding layer is corresponding to the position of the low-voltage domain. Color shift of the multi-domain LCD is improved effectively at oblique viewing angles.

Abstract: A first etching stop layer and an active layer are formed on an inner surface of a first glass substrate, and a second etching stop layer and a cover layer are formed on an inner surface of a second glass substrate. A display media is formed between the first glass substrate and the second glass substrate. A first passivation layer is formed on an outer surface of the second glass substrate. A first etching process is performed to expose the first etching stop layer. A first flexible substrate is formed on the exposed first etching stop layer, and a second passivation layer is formed on the first flexible substrate. The first passivation layer is removed. A second etching process is performed to expose the second etching stop layer. A second flexible substrate is formed on the exposed second etching stop layer, and the second passivation layer is removed.