Abstract: A method for manufacturing a distributed Bragg reflector is provided. The distributed Bragg reflector is applied to a 1550 nm vertical-cavity surface-emitting laser, which structurally includes a top distributed Bragg reflector, a bottom distributed Bragg reflector, and a vertical cavity (including a P-type and an N-type electrode) and a multiple quantum well light-emitting layer that are positioned therebetween. An optical multilayer film of the distributed Bragg reflector is formed by sputtering, and includes silicon layers and silicon dioxide layers alternately stacked to each other. The silicon dioxide layers are produced by a process of nano-sputtering and micro-plasma oxidation. A reflectance of the bottom distributed Bragg reflector at 1,550 nm is greater than 99.9%, and a reflectance of the top distributed Bragg reflector at 1,550 nm is controlled to be between 95% and 99%, so that basic physical/optical requirements for forming a resonant laser can be improved.

Abstract: An electrode coupled double heterojunction solar cell having double active regions for photoelectric effect and method of manufacturing the same are provided. The electrode coupled double heterojunction solar cell includes a first terminal electrode, a first solar cell, a second solar cell, a common electrode structure, and a second terminal electrode. The first solar cell is connected to the first terminal electrode and includes a first PIN heterojunction structure. The second solar cell is disposed on the first solar cell and includes a second PIN heterojunction structure. The common electrode structure is disposed between the first solar cell and the second solar cell, so that the first solar cell and the second solar cell are electrically connected to each other in a parallel manner. The second terminal electrode is disposed on the second solar cell.

Abstract: A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of conductive circuits arranged to form a predetermined circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer. The second coating layer has a touching surface formed on the top side thereof for an external object to touch. The second coating layer is substantially formed by mixing silicon oxide, aluminum oxide, lithium oxide and Teflon.

Abstract: A manufacturing method of a composite poly-silicon substrate of solar cells includes the following steps: providing a first substrate layer having a purity ranging from 2N to 3N; and forming a second substrate layer on the first substrate layer, where the purity of the second substrate layer ranges from 6N to 9N.

Abstract: A composite poly-silicon substrate for solar cell having a first substrate layer and a second substrate layer is disclosed. The purity of the first substrate layer ranges from 2N to 3N. The second substrate layer is formed on the first substrate layer, and the purity of the second substrate layer ranges from 6N to 9N.

Abstract: The present invention discloses a conductive film including a substrate, a reflective index adjusting structure, and a transparent conductive layer. The reflective index adjusting structure may be disposed on the substrate, and the transparent conductive layer may be disposed on the reflective index adjusting structure, which may be disposed between the transparent conductive layer and the substrate. The transparent conductive layer may cover parts of the reflective index adjusting structure. When a light enters into the transparent conductive layer/the reflective index adjusting structure of the conductive film with an incident angle, the light may be associated with a first reflectance/a second reflectance. The difference between the first reflectance and the second reflectance is designed to be lower than a first threshold value. Accordingly, the present invention may eliminate the display difference between an etched and a non-etched area of the conductive film and improve the visual quality.

Abstract: The present invention discloses a conductive film including a substrate, a hard coated layer, a first refraction layer, a second refraction layer, and a transparent conductive layer. The hard coated layer may be disposed on the substrate with the silicon-based material accounting for certain percentages of the weight thereof. Placement of the first refraction layer, the second refraction layer, and the transparent conductive layer may be arranged in a predetermined order. The transparent conductive layer may cover parts of the second refraction layer. When a light enters into the transparent conductive layer and the second refraction layer with an incident angle, the light may be associated with a first reflectance and a second reflectance, respectively. The difference between the first reflectance and the second reflectance may be lower than a first threshold value for eliminating the display difference between an etched and a non-etched area of the conductive film.

Abstract: The present invention discloses a conductive film including a substrate, a first hard coated layer, a second hard coated layer, a first refraction layer, a second refraction layer, and a transparent conductive layer, which are arranged in a predetermined order. The second hard coated layer has the silicon-based material accounting for certain percentages of the weight thereof, and the transparent conductive layer may cover parts of the second refraction layer. When a light enters into the transparent conductive layer/the second refraction layer with an incident angle, the light may be associated with a first reflectance/a second reflectance. The difference between the first reflectance and the second reflectance is designed to be lower than a first threshold value. Accordingly, the present invention may eliminate the display difference between an etched and a non-etched area of the conductive film and improve the visual quality.

Abstract: A conductive multilayer structure includes a substrate, a transparent conductive film, a hard-coated layer and a protective layer. The substrate has opposite first and second surfaces, and has non-organic powders mixed therein. The thickness of the substrate is ranged from 100 micrometers to 125 micrometers. The transparent conductive film is formed on the first surface. The hard-coated layer is formed on the second surface. The protective layer is formed on the hard-coated layer.

Abstract: A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of embedded conductive circuits embedded therein and arranged to form a predetermined embedded circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer to cover the embedded conductive circuits. The second coating layer has a touching surface formed on the top side thereof, and the touching surface allows an external object (such as user's finger or touch pen) to touch.

Abstract: A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of conductive circuits arranged to form a predetermined circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer. The second coating layer has a touching surface formed on the top side thereof for an external object to touch. The second coating layer is substantially formed by mixing silicon oxide, aluminum oxide, lithium oxide and Teflon.

Abstract: A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes two transparent conductive films stacked on top of each other and a plurality of embedded conductive circuits formed between the two transparent conductive films and arranged to form a predetermined embedded circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer. The second coating layer has a touching surface on the top side thereof for an external object to touch.

Abstract: A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of embedded conductive circuits embedded into the first coating layer and arranged to form a predetermined embedded circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer. The second coating layer has a touching surface formed on the top side thereof, and the touching surface allows an external object (such as user's finger, any type of touch pen, or etc.) to touch.

Abstract: A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of conductive circuits arranged to form a predetermined circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer to cover the conductive circuits. The second coating layer has a touching surface formed on the top side thereof, and the touching surface allows an external object (such as user's finger, any type of touch pen, or etc.) to touch.

Abstract: A transparent conductive structure includes a substrate unit, a first coating unit, a diffusion barrier structure, a second coating unit, a third coating unit and a conductive unit. The substrate unit includes a plastic substrate. The first coating unit includes a first coating layer formed on the plastic substrate. The diffusion barrier structure is formed on the first coating layer. The diffusion barrier structure includes a first oxide unit having a plurality of first oxide layers and a second oxide unit having a plurality of second oxide layers. The first oxide layers and the second oxide layers are stacked on top of each other alternately. The second coating unit includes a second coating layer formed on the diffusion barrier structure. The third coating unit includes a third coating layer formed on the second coating layer. The conductive unit includes a transparent conductive film formed on the third coating layer.

Abstract: A transparent conductive structure includes a substrate unit and a conductive unit. The substrate unit includes at least one plastic substrate. The conductive unit includes at least one transparent conductive film and at least one nanometer conductive group formed at the same time, wherein the transparent conductive film is formed on the plastic substrate, and the nanometer conductive group includes a plurality of conductive nanowire filaments mixed or embedded in the transparent conductive film. In other words, both the transparent conductive film and the nanometer conductive group in the instant disclosure can be respectively formed by two different forming methods (such as sputtering and vaporing) at the same time, and the conductive nanowire filaments of the nanometer conductive group can be formed inside the transparent conductive film.

Abstract: A manufacturing method of conductive circuits of a touch panel includes the following steps: providing a substrate with a conductive area thereon; providing at least one hard coating layer on the conductive area of the substrate; forming a plurality of grooves on the hard coating layer; forming a metal layer on the hard coating layer and in the grooves; and heating the metal layer so as to condense the metallic materials thereof in the grooves due to surface tension, thus forming a plurality of conductive circuits.