Patents by Inventor Chao-Wei Kuo

Chao-Wei Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240142748
    Abstract: An optical system is provided. The optical system is used for disposing on an electronic device. The optical system includes a movable portion, a fixed portion, a first driving assembly, and a support module. The movable portion is used for connecting to an optical module. The fixed portion is affixed on the electronic device, and the movable portion is movable relative to the fixed portion. The first driving assembly is used for driving the movable portion to move relative to the fixed portion. The movable portion is movably connected to the fixed portion through the support module.
    Type: Application
    Filed: January 4, 2024
    Publication date: May 2, 2024
    Inventors: Ying-Jen WANG, Ya-Hsiu WU, Chen-Chi KUO, Chao-Chang HU, Yi-Ho CHEN, Che-Wei CHANG, Ko-Lun CHAO, Sin-Jhong SONG
  • Publication number: 20240107682
    Abstract: An embodiment composite material for semiconductor package mount applications may include a first component including a tin-silver-copper alloy and a second component including a tin-bismuth alloy or a tin-indium alloy. The composite material may form a reflowed bonding material having a room temperature tensile strength in a range from 80 MPa to 100 MPa when subjected to a reflow process. The reflowed bonding material may include a weight fraction of bismuth that is in a range from approximately 4% to approximately 15%. The reflowed bonding material may an alloy that is solid solution strengthened by a presence of bismuth or indium that is dissolved within the reflowed bonding material or a solid solution phase that includes a minor component of bismuth dissolved within a major component of tin. In some embodiments, the reflowed bonding material may include intermetallic compounds formed as precipitates such as Ag3Sn and/or Cu6Sn5.
    Type: Application
    Filed: April 21, 2023
    Publication date: March 28, 2024
    Inventors: Chao-Wei Chiu, Chih-Chiang Tsao, Jen-Jui Yu, Hsuan-Ting Kuo, Hsiu-Jen Lin, Ching-Hua Hsieh
  • Publication number: 20240071952
    Abstract: A method includes depositing solder paste over first contact pads of a first package component. Spring connectors of a second package component are aligned to the solder paste. The solder paste is reflowed to electrically and physically couple the spring connectors of the second package component to the first contact pads of the first package component. A device includes a first package component and a second package component electrically and physically coupled to the first package component by way of a plurality of spring coils. Each of the plurality of spring coils extends from the first package component to the second package component.
    Type: Application
    Filed: January 10, 2023
    Publication date: February 29, 2024
    Inventors: Chih-Chiang Tsao, Hsuan-Ting Kuo, Chao-Wei Chiu, Hsiu-Jen Lin, Ching-Hua Hsieh
  • Patent number: 8982634
    Abstract: The present invention provides a flash memory including a memory cell, a current limiter and a program voltage generator. The memory cell is programmed in response to a program current and a program voltage. The current limiter reflects amount of the program current by a data-line signal, e.g., a data-line voltage. The program voltage generator generates and controls the program voltage in response to the data-line voltage, such that the program current can track to a constant reference current.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: March 17, 2015
    Assignee: eMemory Technology Inc.
    Inventors: Yu-Hsiung Tsai, Yuan-Tai Lin, Ching-Yuan Lin, Chao-Wei Kuo, Shang-Wei Fang, Wein-Town Sun
  • Patent number: 8817543
    Abstract: The present invention provides a flash memory including a memory cell, a current limiter and a program voltage generator. The memory cell is programmed in response to a program current and a program voltage. The current limiter reflects amount of the program current by a data-line signal, e.g., a data-line voltage. The program voltage generator generates and controls the program voltage in response to the data-line voltage, such that the program current can track to a constant reference current.
    Type: Grant
    Filed: July 11, 2012
    Date of Patent: August 26, 2014
    Assignee: Ememory Technology Inc.
    Inventors: Yu-Hsiung Tsai, Yuan-Tai Lin, Ching-Yuan Lin, Chao-Wei Kuo, Shang-Wei Fang, Wein-Town Sun
  • Publication number: 20140119125
    Abstract: The present invention provides a flash memory including a memory cell, a current limiter and a program voltage generator. The memory cell is programmed in response to a program current and a program voltage. The current limiter reflects amount of the program current by a data-line signal, e.g., a data-line voltage. The program voltage generator generates and controls the program voltage in response to the data-line voltage, such that the program current can track to a constant reference current.
    Type: Application
    Filed: January 10, 2014
    Publication date: May 1, 2014
    Applicant: eMemory Technology Inc.
    Inventors: Yu-Hsiung Tsai, Yuan-Tai Lin, Ching-Yuan Lin, Chao-Wei Kuo, Shang-Wei Fang, Wein-Town Sun
  • Publication number: 20140016414
    Abstract: The present invention provides a flash memory including a memory cell, a current limiter and a program voltage generator. The memory cell is programmed in response to a program current and a program voltage. The current limiter reflects amount of the program current by a data-line signal, e.g., a data-line voltage. The program voltage generator generates and controls the program voltage in response to the data-line voltage, such that the program current can track to a constant reference current.
    Type: Application
    Filed: July 11, 2012
    Publication date: January 16, 2014
    Applicant: eMemory Technology Inc.
    Inventors: Yu-Hsiung Tsai, Yuan-Tai Lin, Ching-Yuan Lin, Chao-Wei Kuo, Shang-Wei Fang, Wein-Town Sun
  • Publication number: 20080080249
    Abstract: A non-volatile memory having a memory cell formed on a substrate is provided. A trench is formed in the substrate. The memory cell has a first gate, a second gate, a charge storage layer, a first source/drain region and a second source/drain region. The first gate is disposed in the trench of the substrate. The second gate is disposed on the substrate at one side of the trench. The charge storage layer is disposed between the first gate and the substrate and between the second gate and the substrate. The first source/drain region is disposed in the substrate at the bottom of the trench. The second source/drain region is disposed in the substrate at one side of the second gate.
    Type: Application
    Filed: June 13, 2007
    Publication date: April 3, 2008
    Applicant: POWERCHIP SEMICONDUCTOR CORP.
    Inventors: Shi-Hsien Chen, Chao-Wei Kuo, Saysamone Pittikoun, Michael Yingli Liu
  • Publication number: 20070206424
    Abstract: A method for erasing a non-volatile memory is provided. The non-volatile memory includes a first conductive type substrate, a second conductive type well disposed in the first conductive type substrate, a first conductive type well disposed on the second conductive type well, and a memory cell disposed on the first conductive type substrate. The memory cell includes a charge trapping layer and a gate. The erasing method includes the following steps. A first voltage is applied to the gate, a second voltage is applied to the first conductive type substrate, and the second conductive type well is floating. The second voltage is large enough to induce a substrate hot hole effect. The holes are injected into the charge trapping layer by applying the first voltage.
    Type: Application
    Filed: September 13, 2006
    Publication date: September 6, 2007
    Applicant: POWERCHIP SEMICONDUCTOR CORP.
    Inventors: Chao-Wei Kuo, Chih-Ming Chao, Hann-Ping Hwang
  • Publication number: 20060216893
    Abstract: A manufacturing method of a flash memory cell is provided. The flash memory cell includes a first conductive type substrate, a stacked gate structure, a first conductive type source/drain region, a metal silicide layer, an inter-layer dielectric layer and a contact plug. The first conductive type substrate has a second conductive type shallow well already formed thereon. The metal silicide layer is disposed within the first conductive type drain region. The contact plug is disposed within the inter-layer dielectric layer and electrically connected with the metal silicide layer in the first conductive type drain region to reduce resistance between the contact plug, the first conductive type drain region and the second conductive type shallow well and increase read-out speed of the flash memory.
    Type: Application
    Filed: May 9, 2006
    Publication date: September 28, 2006
    Inventors: Leo Wang, Chien-Chih Du, Chao-Wei Kuo, Cheng-Tung Huang, Saysamone Pittikoun
  • Publication number: 20050280068
    Abstract: A flash memory cell includes a first conductive type substrate, a stacked gate structure, a first conductive type source/drain region, a metal silicide layer, an inter-layer dielectric layer and a contact plug. The first conductive type substrate has a second conductive type shallow well already formed thereon. The metal silicide layer is disposed within the first conductive type drain region. The contact plug is disposed within the inter-layer dielectric layer and electrically connected with the metal silicide layer in the first conductive type drain region to reduce resistance between the contact plug, the first conductive type drain region and the second conductive type shallow well and increase read-out speed of the flash memory.
    Type: Application
    Filed: May 18, 2005
    Publication date: December 22, 2005
    Inventors: Leo Wang, Chien-Chih Du, Chao-Wei Kuo, Cheng-Tung Huang, Saysamone Pittikoun