Patents by Inventor Chao-Yi Fang

Chao-Yi Fang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050145872
    Abstract: A nitride-based light-emitting diode is provided, including a substrate having a light extraction layer grown on the substrate, and a nitride semiconductor epitaxy layer grown on the light extraction layer. The external quantum efficiency is improved by changing the traveling path of the emitted light and by matching the refraction index between the light extraction layer and the substrate. Also, a high power nitride-based light-emitting diode having a sacrificial layer is disclosed. A sacrificial layer is used for growing a light-emitting structure, and a binding layer made of two or more metals or alloys is used to bind the grown light-emitting structure and a substrate with high thermoconductivity. The sacrificial layer is later entirely etched away with a chemical solution used in a chemical etching process, and the nitrogen epitaxy structure is placed on the substrate with high thermoconductivity so that the diode can operate at high electrical current to improve external quantum efficiency.
    Type: Application
    Filed: December 29, 2003
    Publication date: July 7, 2005
    Inventors: Chao-Yi Fang, Kuang-Neng Yang, Fen-Ren Chien, Lung-Chien Chen