Abstract: The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.

Abstract: The embodiments of the present disclosure relate to an array substrate, a thin film transistor, methods for fabricating the same, and a display device. The method for fabricating the array substrate provided by the embodiments of the present disclosure comprises: forming an active layer on a substrate; forming a gate on the active layer; forming a first insulation layer on the gate; forming a light blocking portion on the first insulation layer, the light blocking portion being arranged above an edge portion of the gate, so that the light blocking portion blocks light entering the active layer from the edge portion of the gate.

Abstract: An OLED substrate (1) and a preparation method therefor, an OLED panel, and an OLED display apparatus. An inter-layer insulation layer (12) is formed in an edge area of the OLED substrate (1), and a concave is formed on the surface of the inter-layer insulation layer (12), so that the lateral tensile-resistance strength of the inter-layer insulation layer (12) and a package substrate can be increased, i.e. increasing a lateral tensile-resistance force between the OLED substrate (1) and the package substrate, thereby improving the stability of the OLED panel, ensuring the sealing effect of the OLED panel and improving the service life of the OLED panel.

Abstract: The embodiments of the present disclosure relate to an array substrate, a thin film transistor, methods for fabricating the same, and a display device. The method for fabricating the array substrate provided by the embodiments of the present disclosure comprises: forming an active layer on a substrate; forming a gate on the active layer; forming a first insulation layer on the gate; forming a light blocking portion on the first insulation layer, the light blocking portion being arranged above an edge portion of the gate, so that the light blocking portion blocks light entering the active layer from the edge portion of the gate.

Abstract: An OLED substrate (1) and a preparation method therefor, an OLED panel, and an OLED display apparatus. An inter-layer insulation layer (12) is formed in an edge area of the OLED substrate (1), and a concave is formed on the surface of the inter-layer insulation layer (12), so that the lateral tensile-resistance strength of the inter-layer insulation layer (12) and a package substrate can be increased, i.e. increasing a lateral tensile-resistance force between the OLED substrate (1) and the package substrate, thereby improving the stability of the OLED panel, ensuring the sealing effect of the OLED panel and improving the service life of the OLED panel.

Abstract: The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.