Abstract: The present invention discloses a display device and a manufacturing method thereof, including the following steps: forming a thin-film transistor array substrate, the thin-film transistor array substrate including a first surface and a second surface that are disposed opposite to each other; forming a protective layer on the first surface; forming a metal layer on the second surface by a first patterning; forming a metal member by performing a second patterning on the metal layer; forming a patterned insulating layer on the second surface; forming an electrode layer on the metal member; forming a planarization layer on the electrode layer and the insulating layer; and removing the protective layer.

Abstract: A micro light-emitting diode transfer device and a method of transferring thereof are provided. The micro light-emitting diode transfer device includes an operating board, a light source generator, and a photomagnetic substrate. The light source generator is disposed above the operating board and includes a plurality of light emitting units, each of the light emitting units comprises a light emitting side, and the light emitting side faces the operating board. The photomagnetic substrate includes a plurality of photomagnetic units, which attract micro light-emitting diodes.

Abstract: The present invention discloses a display device and a manufacturing method thereof, including the following steps: forming a thin-film transistor array substrate, the thin-film transistor array substrate including a first surface and a second surface that are disposed opposite to each other; forming a protective layer on the first surface; forming a metal layer on the second surface by a first patterning; forming a metal member by performing a second patterning on the metal layer; forming a patterned insulating layer on the second surface; forming an electrode layer on the metal member; forming a planarization layer on the electrode layer and the insulating layer; and removing the protective layer.

Abstract: A thin film transistor (TFT) array substrate and a display panel are provided. The TFT array substrate has a base substrate, an anti-reflection layer, and a gate electrode insulating layer. The TFT array substrate has a light-transmitting region. The anti-reflection layer is disposed on the base substrate of the light-transmitting region. The gate electrode insulating layer is disposed on the anti-reflection layer. Light refractive indexes of the base substrate, the anti-reflection layer, and the gate electrode insulating layer are increasing sequentially.

Abstract: A thin film transistor (TFT) array substrate and a display panel are provided. The TFT array substrate has a base substrate, an anti-reflection layer, and a gate electrode insulating layer. The TFT array substrate has a light-transmitting region. The anti-reflection layer is disposed on the base substrate of the light-transmitting region. The gate electrode insulating layer is disposed on the anti-reflection layer. Light refractive indexes of the base substrate, the anti-reflection layer, and the gate electrode insulating layer are increasing sequentially.

Abstract: A liquid crystal panel and a manufacturing method are disclosed. The liquid crystal panel includes a glass substrate, an array substrate disposed opposite to the glass substrate, and a liquid crystal, a reflection reducing film and a color filter disposed between the glass substrate and the array substrate, wherein, the reflection reducing film is disposed at an inner side of the glass substrate, and the color filter is disposed at an inner side of the array substrate. Through disposing a color filter at a side of the array substrate and disposing a reflection reducing film at an inner side of a substrate opposite to the array substrate, the present invention is beneficial to decrease the light reflection rate of the liquid crystal panel and improve the visual effects.

Abstract: The present invention provides a method for manufacturing a light-shielding mask for curing a sealant, including the following steps: step 1: providing a transparent substrate (20); step 2: sequentially forming a metal layer (22) and a photoresist layer (24) on the transparent substrate (20); Step 3: carrying out exposure on an edge of the photoresist layer (24) to form an inspection mark (242); step 4: subjecting the photoresist layer (24) to exposure along a predetermined trace by adopting an edge exposure process, wherein the predetermined trace corresponds to a predetermined trace of a sealant to be formed in a liquid crystal display panel; step 5: removing the exposed portion of the photoresist layer (24) to expose the metal layer (22); step 6: subjecting the exposed portion of the metal layer (22) to etching and removing the unexposed portion of the photoresist layer (24); and step 7: forming a transparent protection layer (26) on the metal layer (22) and the transparent substrate (20).

Abstract: The present invention provides a method for manufacturing a light-shielding mask for curing a sealant, including the following steps: step 1: providing a transparent substrate (20); step 2: sequentially forming a metal layer (22) and a photoresist layer (24) on the transparent substrate (20); Step 3: carrying out exposure on an edge of the photoresist layer (24) to form an inspection mark (242); step 4: subjecting the photoresist layer (24) to exposure along a predetermined trace by adopting an edge exposure process, wherein the predetermined trace corresponds to a predetermined trace of a sealant to be formed in a liquid crystal display panel; step 5: removing the exposed portion of the photoresist layer (24) to expose the metal layer (22); step 6: subjecting the exposed portion of the metal layer (22) to etching and removing the unexposed portion of the photoresist layer (24); and step 7: forming a transparent protection layer (26) on the metal layer (22) and the transparent substrate (20).