Patents by Inventor Charles A. Odegard

Charles A. Odegard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090189299
    Abstract: A method of forming a probe pad layout/design, and related device. At least some of the illustrative embodiments are methods comprising testing a semiconductor device by electrically contacting a first portion of a semiconductor die by way of a first pad within a scribe street adjacent to the semiconductor die, and electrically contacting a second portion of the semiconductor die by way of a first bond pad within the semiconductor die.
    Type: Application
    Filed: January 30, 2008
    Publication date: July 30, 2009
    Applicant: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Ariel L. Miranda, Norihiro Kawakami, Charles A. Odegard
  • Publication number: 20090039524
    Abstract: Methods and apparatus to support an overhanging region of stacked die are disclosed. A disclosed method comprises bonding a first die onto a substrate, placing a support element on the substrate; and bonding a second die onto the first die, wherein the second die overhangs at least one edge of the first die and the support element is positioned to limit bending of the second die.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Applicant: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Charles A. Odegard, Richard W. Arnold, Marvin W. Cowens
  • Patent number: 7445960
    Abstract: A plasma conditioning method of improving the adhesion between an integrated circuit chip, having active and passive surfaces, the active surface polymer-coated and having a plurality of electrical coupling members, and an insulating underfill material. The method comprises the steps of positioning a wafer having a plurality of integrated circuits, including the coupling members, in a vacuum chamber of a plasma apparatus so that the polymer-coated surface faces the plasma source. Next, a plasma is initiated; the ion mean free path is controlled so that the ions reach the wafer surface with predetermined energy. The wafer surface is then exposed to the plasma for a length of time sufficient to roughen the polymer surface, clean the polymer surface from organic contamination and improve the surface affinity to adhesion. The adhesion ability of this surface to organic underfill material is thus enhanced.
    Type: Grant
    Filed: June 14, 2007
    Date of Patent: November 4, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Marvin W. Cowens, Masood Murtuza, Vinu Yamunan, Charles Odegard, Phillip R. Coffman
  • Publication number: 20080246491
    Abstract: In a method and system for testing a presence of a crack (240) in a device under test (DUT) (190), a test system includes a bridge circuit (BC) (120) coupled to an electrical signal source (ESS) (110) capable of generating an electrical signal (102). The BC (120) includes four impedances that are coupled in a bridge structure having two floating nodes (132, 134). The DUT (190) includes a test bond pad (TBP) (192) and an access bond pad (ABP) (194). An impedance measurable across the TBP (192) and the ABP (194) is selectable as one of the four impedances. A stimulus (140) is provided to the DUT (190) to induce stress. A sensor (130) coupled across the two floating nodes (132, 134) detects a change in a value of the electrical signal measured across the two floating nodes (132, 134) in response to the stimulus (140). The change is triggered by the presence of the crack (240) under the TBP (192) caused by the stress, the crack (240) changing the impedance.
    Type: Application
    Filed: April 6, 2007
    Publication date: October 9, 2008
    Applicant: Texas Instruments Incorporated
    Inventors: Ennis T. Ogawa, Daryl R. Heussner, Charles A. Odegard
  • Publication number: 20080085573
    Abstract: Disclosed are methods for dispensing underfill material in an IC assembly having a die mounted on a substrate with a gap therebetween. One or more aperture is provided in the substrate for receiving underfill material into the gap. Underfill material is dispensed into the gap through the one or more apertures, thereby filling the gap with underfill material and providing a favorable flow rate and improved underfilling. Embodiments of the invention are disclosed in which capillary action, a vacuum, or positive pressure, are used to assist in the flow of the underfill material.
    Type: Application
    Filed: November 29, 2007
    Publication date: April 10, 2008
    Applicant: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Charles Odegard, Marvin Cowens, Leon Stiborek
  • Publication number: 20080050860
    Abstract: A plasma conditioning method of improving the adhesion between an integrated circuit chip, having active and passive surfaces, the active surface polymer-coated and having a plurality of electrical coupling members, and an insulating underfill material. The method comprises the steps of positioning a wafer having a plurality of integrated circuits, including the coupling members, in a vacuum chamber of a plasma apparatus so that the polymer-coated surface faces the plasma source. Next, a plasma is initiated; the ion mean free path is controlled so that the ions reach the wafer surface with predetermined energy. The wafer surface is then exposed to the plasma for a length of time sufficient to roughen the polymer surface, clean the polymer surface from organic contamination and improve the surface affinity to adhesion. The adhesion ability of this surface to organic underfill material is thus enhanced.
    Type: Application
    Filed: June 14, 2007
    Publication date: February 28, 2008
    Inventors: Marvin Cowens, Masood Murtuza, Vinu Yamunan, Charles Odegard, Phillip Coffman
  • Patent number: 7323362
    Abstract: A system (100) for manufacturing product, in which a first work station (101) is operable to perform a first manufacturing action on the product parts; this first station has a first entrance (101a) and a first exit 101b). A second work station (102) is operable to perform a second manufacturing action on the product parts; this second station has a second entrance (102a) and a second exit (102b). A transport line (103) between the first exit and the second entrance is operable to move the product parts under computer control. A chamber (104) encloses a portion of the line and is constructed so that the transport achieves a balanced throughput from the first station to the second station, while the product parts are exposed to computer-controlled environmental conditions (110) during transport through the chamber. The balanced throughput in the chamber is achieved by waiting lines for the product with computer-controlled monitors (105a) for product parts' positions and times in the chamber.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: January 29, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Charles A. Odegard, Vinu Yamunan, Tz-Cheng Chiu
  • Patent number: 7319275
    Abstract: A plasma conditioning method of improving the adhesion between an integrated circuit chip, having active and passive surfaces, the active surface polymer-coated and having a plurality of electrical coupling members, and an insulating underfill material. The method comprises the steps of positioning a wafer having a plurality of integrated circuits, including the coupling members, in a vacuum chamber of a plasma apparatus so that the polymer-coated surface faces the plasma source. Next, a plasma is initiated; the ion mean free path is controlled so that the ions reach the wafer surface with predetermined energy. The wafer surface is then exposed to the plasma for a length of time sufficient to roughen the polymer surface, clean the polymer surface from organic contamination and improve the surface affinity to adhesion. The adhesion ability of this surface to organic underfill material is thus enhanced.
    Type: Grant
    Filed: February 1, 2005
    Date of Patent: January 15, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Marvin W. Cowens, Masood Murtuza, Vinu Yamunan, Charles Odegard, Phillip R. Coffman
  • Publication number: 20080003721
    Abstract: A semiconductor assembly comprising an integrated circuit chip with a first plurality of metallic contact pads exposed, having a pitch center-to-center of less than 180 ?m. A metallic bump of reflowable metal is attached to each of these contact pads. The assembly further has an electrically insulating substrate with a second plurality of metallic terminal pads in locations matching the locations of the contact pads. Each of the bumps also attached to these matching terminal pads, respectively, whereby the chip is interconnected with the substrate spaced apart by a gap. An adherent polymeric encapsulant fills the gap so that the encapsulant is free of voids. It is a pivotal feature in the method that vibration energy, up to ultrasonic frequencies, is used while the encapsulant is still in a low-viscosity precursor state in order to ensure the void-free spreading of the precursor throughout the gap between chip and substrate.
    Type: Application
    Filed: September 14, 2007
    Publication date: January 3, 2008
    Applicant: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Charles Odegard, Willmar Subido
  • Patent number: 7276401
    Abstract: A plasma conditioning method of improving the adhesion between an integrated circuit chip, having active and passive surfaces, the active surface polymer-coated and having a plurality of electrical coupling members, and an insulating underfill material. The method comprises the steps of positioning a wafer having a plurality of integrated circuits, including the coupling members, in a vacuum chamber of a plasma apparatus so that the polymer-coated surface faces the plasma source. Next, a plasma is initiated; the ion mean free path is controlled so that the ions reach the wafer surface with predetermined energy. The wafer surface is then exposed to the plasma for a length of time sufficient to roughen the polymer surface, clean the polymer surface from organic contamination and improve the surface affinity to adhesion. The adhesion ability of this surface to organic underfill material is thus enhanced.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: October 2, 2007
    Assignee: Texas Instruments Incorporated
    Inventors: Marvin W. Cowens, Masood Murtuza, Vinu Yamunan, Charles Odegard, Phillip R. Coffman
  • Patent number: 7271494
    Abstract: A plasma conditioning method of improving the adhesion between an integrated circuit chip, having active and passive surfaces, the active surface polymer-coated and having a plurality of electrical coupling members, and an insulating underfill material. The method comprises the steps of positioning a wafer having a plurality of integrated circuits, including the coupling members, in a vacuum chamber of a plasma apparatus so that the polymer-coated surface faces the plasma source. Next, a plasma is initiated; the ion mean free path is controlled so that the ions reach the wafer surface with predetermined energy. The wafer surface is then exposed to the plasma for a length of time sufficient to roughen the polymer surface, clean the polymer surface from organic contamination and improve the surface affinity to adhesion. The adhesion ability of this surface to organic underfill material is thus enhanced.
    Type: Grant
    Filed: May 2, 2005
    Date of Patent: September 18, 2007
    Assignee: Texas Instruments Incorporated
    Inventors: Marvin W. Cowens, Masood Murtuza, Vinu Yamunan, Charles Odegard, Phillip R. Coffman
  • Publication number: 20070128881
    Abstract: A plasma conditioning method of improving the adhesion between an integrated circuit chip, having active and passive surfaces, the active surface polymer-coated and having a plurality of electrical coupling members, and an insulating underfill material. The method comprises the steps of positioning a wafer having a plurality of integrated circuits, including the coupling members, in a vacuum chamber of a plasma apparatus so that the polymer-coated surface faces the plasma source. Next, a plasma is initiated; the ion mean free path is controlled so that the ions reach the wafer surface with predetermined energy. The wafer surface is then exposed to the plasma for a length of time sufficient to roughen the polymer surface, clean the polymer surface from organic contamination and improve the surface affinity to adhesion. The adhesion ability of this surface to organic underfill material is thus enhanced.
    Type: Application
    Filed: October 16, 2006
    Publication date: June 7, 2007
    Inventors: Marvin Cowens, Masood Murtuza, Vinu Yamunan, Charles Odegard, Phillip Coffman
  • Publication number: 20060270106
    Abstract: System and method for a polymer encapsulated solder lid attach. A preferred embodiment comprises one or more metallic islands distributed throughout the combination attach, wherein each metallic island overlays one or more heat producing portions of the integrated circuit die, and a polymer encapsulant to encircle each metallic island and to bind the one or more metallic islands in place. The one or more metallic islands, with their high thermal conductivity, can effectively dissipate large amounts of heat, while the polymer encapsulant binds the one or more metallic islands in place, preventing (or reducing) movement occurring during thermal cycles that can lead to delamination and separation.
    Type: Application
    Filed: May 31, 2005
    Publication date: November 30, 2006
    Inventors: Tz-Cheng Chiu, Charles Odegard
  • Publication number: 20060234427
    Abstract: Disclosed are methods for dispensing underfill material in an IC assembly having a die mounted on a substrate with a gap therebetween. One or more aperture is provided in the substrate for receiving underfill material into the gap. Underfill material is dispensed into the gap through the one or more apertures, thereby filling the gap with underfill material and providing a favorable flow rate and improved underfilling. Embodiments of the invention are disclosed in which capillary action, a vacuum, or positive pressure, are used to assist in the flow of the underfill material.
    Type: Application
    Filed: April 19, 2005
    Publication date: October 19, 2006
    Inventors: Charles Odegard, Marvin Cowens, Leon Stiborek
  • Publication number: 20060234490
    Abstract: Disclosed are integrated circuit assemblies with increased stand-off height and methods and systems for their manufacture. Methods of the invention provide for assembling a semiconductor device by aligning a die with a substrate and interposing solder between corresponding substrate and die bond pads. A lifting force is applied to the die during heating of the solder to a liquescent state, thereby increasing the stand-off height of the die above the substrate. The lifting force is maintained during cooling of the solder to a solid state, thereby forming increased stand-off height solder connections.
    Type: Application
    Filed: April 19, 2005
    Publication date: October 19, 2006
    Inventors: Charles Odegard, Tz-Cheng Chiu
  • Publication number: 20060211172
    Abstract: In accordance with the present invention, a system and method to increase die stand-off height in a flip chip are provided. The system includes a plurality of separator pedestals disposed between a first face of a die and a second face of a substrate, the substrate positioned generally parallel with, and spaced apart from, the die, and the first face being opposite the second face. The plurality of separator pedestals are operable to selectively force the die and substrate apart, increasing the stand-off height of the flip chip assembly.
    Type: Application
    Filed: June 6, 2006
    Publication date: September 21, 2006
    Inventor: Charles Odegard
  • Publication number: 20060148136
    Abstract: A patterned plasma treatment may be provided on the chip and/or the substrate to enhance the distribution of underfill material between the chip and the substrate. The underfill material is typically dispensed after the chip is electrically connected to the substrate. The chip may be electrically connected to the substrate by an array of solder bumps, as one example. The underfill material is draw into a gap between the chip and the substrate by a capillary action. The patterned plasma-treated area formed on the chip and/or on the substrate may cause greater capillary force on the underfill material, as compared to non-plasma-treated areas. Such patterned plasma-treatment area may be designed and laid out to provide for more or better control of the underfill distribution between the chip and substrate while forming a chip package.
    Type: Application
    Filed: March 13, 2006
    Publication date: July 6, 2006
    Inventors: Charles Odegard, Mohammad Yunus, Ferdinand Arabe
  • Publication number: 20060027907
    Abstract: A system (100) for manufacturing product, in which a first work station (101) is operable to perform a first manufacturing action on the product parts; this first station has a first entrance (101a) and a first exit 101b). A second work station (102) is operable to perform a second manufacturing action on the product parts; this second station has a second entrance (102a) and a second exit (102b). A transport line (103) between the first exit and the second entrance is operable to move the product parts under computer control. A chamber (104) encloses a portion of the line and is constructed so that the transport achieves a balanced throughput from the first station to the second station, while the product parts are exposed to computer-controlled environmental conditions (110) during transport through the chamber. The balanced throughput in the chamber is achieved by waiting lines for the product with computer-controlled monitors (105a) for product parts' positions and times in the chamber.
    Type: Application
    Filed: September 30, 2005
    Publication date: February 9, 2006
    Inventors: Charles Odegard, Vinu Yamunan, Tz-Cheng Chiu
  • Patent number: 6977429
    Abstract: A system (100) for manufacturing product, in which a first work station (101) is operable to perform a first manufacturing action on the product parts; this first station has a first entrance (101a) and a first exit 101b). A second work station (102) is operable to perform a second manufacturing action on the product parts; this second station has a second entrance (102a) and a second exit (102b). A transport line (103) between the first exit and the second entrance is operable to move the product parts under computer control. A chamber (104) encloses a portion of the line and is constructed so that the transport achieves a balanced throughput from the first station to the second station, while the product parts are exposed to computer-controlled environmental conditions (110) during transport through the chamber. The balanced throughput in the chamber is achieved by waiting lines for the product with computer-controlled monitors (105a) for product parts' positions and times in the chamber.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: December 20, 2005
    Assignee: Texas Instruments Incorporated
    Inventors: Charles A. Odegard, Vinu Yamunan, Tz-Cheng Chiu
  • Publication number: 20050253281
    Abstract: A semiconductor assembly comprising an integrated circuit chip with a first plurality of metallic contact pads exposed, having a pitch center-to-center of less than 180 ?m. A metallic bump of reflowable metal is attached to each of these contact pads. The assembly further has an electrically insulating substrate with a second plurality of metallic terminal pads in locations matching the locations of the contact pads. Each of the bumps also attached to these matching terminal pads, respectively, whereby the chip is interconnected with the substrate spaced apart by a gap. An adherent polymeric encapsulant fills the gap so that the encapsulant is free of voids. It is a pivotal feature in the method that vibration energy, up to ultrasonic frequencies, is used while the encapsulant is still in a low-viscosity precursor state in order to ensure the void-free spreading of the precursor throughout the gap between chip and substrate.
    Type: Application
    Filed: April 4, 2005
    Publication date: November 17, 2005
    Inventors: Charles Odegard, Willmar Subido