Abstract: An article includes a substrate having an inner surface and an outer surface. A coating is deposited directly on at least a portion of the substrate outer surface. The coating consists essentially of titania and at least one additional photoabsorption band modifying material selected from vanadium (V), manganese (Mn), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof. The coating is a substantially non-porous CVD or MSVD coating and an outer surface of the coating is exposed to the environment.

Abstract: An article includes a substrate having an inner surface and an outer surface. A coating is deposited directly on at least a portion of the substrate outer surface. The coating consists essentially of titania and at least one additional photoabsorption band modifying material selected from vanadium (V), manganese (Mn), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof. The coating is a substantially non-porous CVD or MSVD coating and an outer surface of the coating is exposed to the environment.

Abstract: A method is provided for forming a photoactive coating having a photoabsorption band in the visible region of the electromagnetic spectrum. The method includes depositing a precursor composition over at least a portion of a float glass ribbon in a molten metal bath by a CVD coating device. The precursor composition includes a titania precursor material and at least one other precursor material selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof.

Abstract: A method is provided for forming a photoactive coating having a photoabsorption band in the visible region of the electromagnetic spectrum. The method includes depositing a precursor composition over at least a portion of a float glass ribbon in a molten metal bath by a CVD coating device. The precursor composition includes a titania precursor material and at least one other precursor material selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: A method of forming a photocatalytic coating includes depositing a precursor composition over at least a portion of a substrate surface by a coating device. The precursor composition includes a titania precursor material and at least one other precursor material having a metal selected from boron, strontium, zirconium, lead, barium, calcium, hafnium, lanthanum, and mixtures thereof. Sufficient other precursor material is added to the composition such that a molar ratio of the selected metal to titanium in the applied photocatalytic coating is in the range of about 0.001 to about 0.05.

Abstract: A method is provided for forming a photoactive coating having a photoabsorption band in the visible region of the electromagnetic spectrum. The method includes depositing a precursor composition over at least a portion of a float glass ribbon in a molten metal bath by a CVD coating device. The precursor composition includes a titania precursor material and at least one other precursor material selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: The present invention provides a method of forming an aperture in an electronic support, comprising: (A) positioning an electronic support in registry with an aperture forming device; and (B) forming an aperture at least partially through the electronic support with the aperture forming device while dispensing a fluid stream comprising at least one solid lubricant, proximate the aperture forming device during at least a position of the forming, such that the at least one solid lubricant contacts at least a portion of an interface between the aperture forming device and the electronic support.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: An appliance is rendered self-cleaning of accumulated organic contaminants on one or more surfaces of the appliance, by coating such surfaces of the appliance with a photocatalytically-activated self-cleaning coating. Upon exposing such coated surfaces to radiation of the appropriate wavelength, for a sufficient interval of time, at least a portion of the organic contaminants present on the photocatalytically-activated self-cleaning coating are removed. The coated surface is thereby cleaned without the need of manual effort or high temperatures. The radiation is generally actinic radiation, and more particularly includes ultraviolet radiation.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: An electrochromic transparency comprising an electrochromic film and a preformed, preconditioned ion-conductive polymer sheet laminated between a pair of electrode bearing cell members is disclosed wherein the optimum moisture content of the ion-conducting polymer sheet is maintained by means of a moisture vapor barrier surrounding the perimeter of the cell.

Abstract: An electrochromic window includes a first transparent substrate, an electroconductive film electrode, a transparent electrochromic film in contact with said electroconductive film, an ion-conductive layer in contact with said electrochromic film, a counter electrode in contact with said ion-conductive layer, and a second transparent substrate overlaying the counter electrode. A plurality of bus bars extend across the electroconductive film electrode to distribute electrical current throughout the film electrode and provide a more uniform current density between the film electrode and the counter electrode.

Abstract: An electrochromic transparency comprising an electrochromic film and an ion-conductive layer disposed between a pair of electrodes is disclosed wherein the optical properties and electrochromic efficiency are improved by means of a metal grid electrode.

Abstract: A method is disclosed for depositing metal containing films using relatively water-insoluble coating reactants by dispersing said coating reactants in ultrafine powder form into an aqueous medium containing a wetting agent to form an aqueous chemical suspension.

Abstract: A method is disclosed for producing a thermochromic window comprising a glass substrate and a coating containing VO.sub.2 with a depressed switching temperature by doping the VO.sub.2 film with a compound of a metal having an ionic radius larger than that of vanadium, such as tungsten, niobium, tantalum, iridium or molybdenum.

Abstract: Cuprous oxide films are directly deposited by chemical reduction from an aqueous solution of a copper salt, a complexing agent and a reducing agent maintained at a critical pH of at least about 12.9.