Abstract: A cathode assembly including certain features designed to protect the integrity of a filament contained therein is disclosed. In particular, the cathode assembly is configured to prevent damage to the filament should it inadvertently contact another portion of the cathode assembly. In an example embodiment, an x-ray tube incorporating features of the present invention is disclosed. The x-ray tube includes an evacuated enclosure containing a cathode assembly and an anode. The cathode assembly includes a head portion having a head surface. A slot is defined on the head surface and an electron-emitting filament is included in the slot. A protective surface is defined on the head surface proximate to a central portion of the filament. The protective surface in one embodiment is composed of tungsten and is configure to prevent fusing of the filament to the protective surface should the filament inadvertently contact the protective surface.

Abstract: An improved cathode assembly, including a filament for producing an electron stream having a highly uniform cross sectional density. The cathode assembly comprises a support base, a cathode cup affixed to the support base, and a filament disposed in a slot defined on the bottom face of the cup. In one embodiment, the side walls of the slot are shaped so as to allow greater electric field penetration about regions of the filament that typically produce relatively low quantities of electrons, thereby increasing electron emission therefrom. Other embodiments are directed to modifying either the filament winding configuration or the wire from which the filament is formed, in order to equalize electron production by the filament. The uniformly dense electron stream is preferably directed toward the anode of an x-ray tube, thereby producing a superior x-ray beam for a variety of applications.

Abstract: An apparatus and method for reducing the incidence of electric field stress on portions of insulating structures within high voltage devices is disclosed. Each of the embodiments disclosed herein modifies the conductive properties of the insulating structure surface in a non-uniform manner such that the distribution of voltage potential along the surface thereof is more fully equalized during operation of the high voltage device. This, in turn, reduces the per unit stress on the insulating structure caused by the electric field of the high voltage device. Though embodiments of the present invention are preferably directed to utilization in x-ray tube devices, a variety of high voltage devices may benefit from application of the disclosed matter.