Abstract: Photoreactive compounds are synthesized from 2,5- or 2,6-dinitrobenzyl groups. Also disclosed are methods of synthesizing reactive monomers containing 2,5- or 2,6-dinitrobenzyl groups.

Abstract: This invention provides an improved electrodepositable photoimageable resist composition which includes a photosensitive composition and a microgel. The photosensitive composition can be either a negative-acting or a positive-acting photoresist. Moreover, with regard to each of these, the photoresist component can be either cationic or anionic. The microgel includes a plurality of crosslinked organic particles which can form a stable aqueous dispersion. Moreover, the microgel is present in an amount ranging from between about 0.1 to about 30 weight percent. These weight percentages are based upon the total weight of the resin solids in the photoimageable resist composition. At these concentrations, the microgels promote edge coverage, but do not significantly reduce the photosensitivity and developability properties of the photosensitive composition with which they are combined.

Abstract: An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid.

Abstract: Photoreactive compounds are synthesized from 2,5- or 2,6-dintrobenzyl groups. Also disclosed are methods of synthesizing reactive monomers containing 2,5- or 2,6-dintrobenzyl groups.

Abstract: An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid.

Abstract: Described is a method of preparing dinitrobis(hydroxymethyl)benzene, useful as a photoreactive monomer, from a derivative of stilbene. Also disclosed is a novel dinitrocarbomethoxybenzaldehyde compound useful as an intermediate.

Abstract: Described is a method of preparing dinitrobis(hydroxymethyl)benzene, useful as a photoreactive monomer, from a derivative of stilbene. Also disclosed is a novel dinitrocarbomethoxybenzaldehyde compound useful as an intermediate.

Abstract: A method of treating a nonferrous metal substrate such as aluminum with an acid activating agent such as HF followed by treating with an organophosphate or organophosphonate. The treatment provides for improved adhesion and flexibility as well as resistance to humidity, salt spray corrosion and detergents of subsequently applied coatings.

Abstract: An electrodepositable photoresist composition for producing non-tacky films on an electroconductive substrate comprises an aqueous dispersion of a water-dispersible photosensitive ionic polymeric material and a polyalkylene oxide-modified polysiloxane sufficient to give slip and blocking properties that enables direct placement of a photomask on the resultant dehydrated film. The composition also preferably contains a nonionic unsaturated material and a photoinitiator.

Abstract: The disclosure is directed to a compound which is a reaction product of at least one phosphonic acid group of an alpha-aminomethylene phosphonic acid containing at least one group corresponding to the formula, ##STR1## with an epoxy group of a compound containing at least one epoxy group. The disclosure is also directed to waterborne coating compositions, organic solvent-borne coating compositions, and powder coating compositions containing the aforesaid reaction product.

Abstract: The disclosure is directed to a compound which is a reaction product of at least one phosphonic acid group of an alpha-aminomethylene phosphonic acid containing at least one group corresponding to the formula, ##STR1## with an epoxy group of a compound containing at least one epoxy group. The disclosure is also directed to waterborne coating compositions, organic solvent-borne coating compositions, and powder coating compositions containing the aforesaid reaction product.

Abstract: Alkyl primary amines, e.g., tertiary alkyl primary amines, are prepared by reaction of the corresponding alkyl primary isocyanates with an alkanolamine to form an intermediate area reaction product, followed by heating to decompose the urea reaction product and form the amine product. The amine product can be recovered in high yield by vacuum distillation.