Abstract: A method for batch processing wafers by liquid phase epitaxy (LPE) dipping methods for uniformity of film thickness wafer-to-wafer and uniformity of film on each individual wafer for use in bubble (domain) memories comprising, supporting a plurality of wafers substantially horizontal on a substrate holder and lowering and immersing said wafers into the melt to be deposited as a thin film on each wafer and, while immersed, continually moving the wafers up and down as well as continually oscillating the wafers through substantially 360.degree..

Abstract: A substrate holder for use in liquid phase epitaxy growth of magnetic garnet films for bubble memories comprising a dipping rod having substrate holding means including hooks at one end which confine the substrate securely yet permit tilting movement so as to allow the substrate to assume a horizontal position for liquid phase epitaxy growth in the flux in which the substrate is immersed and to assume a tilted position as the substrate is being withdrawn from the flux for flux runoff. One embodiment discloses a substrate holder for one substrate while a second embodiment shows a holder for supporting a plurality of substrates for processing a batch of substrates in one operation.