Abstract: A high precision, high throughput submicrometer workpiece positioning system, particularly useful as a workpiece positioning means in electron beam lithography tools. The positioning system increases mechanical stability by essentially eliminating mechanical hysteresis, which allows state of the art electron beam lithography systems to provide the repeatable, accurate and dense circuit patterns that modern semiconductor trends demand.The positioning system in preferred form comprises a movable positioning table, a workpiece supporting superstructure which is elastically joined to the movable positioning table by three geometrically distinct kinematic support means and a two-stage coupling means which mounts a workpiece (i.e., semiconductor mask or wafer) to the workpiece supporting superstructure. A laser interferometer locating-positioning system is utilized to position the workpiece. The interferometer mirrors are integral with the workpiece supporting superstructure.

Abstract: Described is an improved common faced terminated multi-layer ceramic capacitor structure capable of embodying multiple capacitors of various maximum voltage and capacitance rating and method for its making. The structure features a ceramic body including multiple sections having a dielectric element and companion plate of one or more types, the types defined by the number and placement on the plate of plate tabs. The sections are aligned in the body such that the plates are located at displaced intervals in the direction of the body length while the plate tabs are located at displaced intervals in the direction of the body width and exposed at a common body face. Buses interconnect the tabs and plate in groups at common face. By selectively connecting the buses, one or more capacitors may be formed in the body.