Abstract: Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis.

Abstract: Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis.

Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.

Abstract: Thin-film magnetic recording heads and systems and processes for manufacturing the same are disclosed. In one embodiment, the invention is understood as a focused particle beam system that includes a pattern recognition element and that employs the pattern recognition element to image and analyze the pole-tip assembly footprint of a recording head and that employs a processor to generate instruction signals that direct a focused particle beam to remove selected portions of the recording head and thereby shape the pole-tip assembly of the recording head. The focused particle beam system provides a precision milling device that can employ the coordinate information to mill selectively the recording head and thereby shape the geometry of the pole-tip assembly footprint, including geometries that have contoured surfaces.

Abstract: Apparatus and method of an improved gas delivery system for delivering reactant material to a workpiece, such as a substrate, being operated on by a particle beam employs a shroud-type concentrator having an interior axial passage. Fluid reactant material is supplied to the axial passage for delivery to the workpiece. A particle beam can traverse the axial passage for impingement on the workpiece surface, concurrently if desired with the reactant delivery.

Abstract: An arc welding system with image acquisition utilizing a non-planar beam of electro-magnetic radiation, such as, a hollow conical beam of light, to illuminate at least a portion of the welding object is disclosed. The conical beam of light is generated by impinging a light beam on the surface of a concave, cylindrical reflector having a longitudinal axis that preferably is parallel to the longitudinal axis of the welding torch. The light beam enters the concave cylindrical reflector through the hollow shaft of a motor. Rotation of the motor angularly positions the reflected light beam on the welding object. The illuminated portion of the object is imaged on an array of photosensitive elements to produce corresponding signals that are representative of the image on the array. These signals are used to obtain identification information concerning the welding object and guidance information for a plural axis manipulator that guides the welding torch tool along a welding seam.

Abstract: A method and apparatus for image acquisition utilizing a non-planar beam of electro-magnetic radiation, such as, a hollow conical beam of light, to illuminate at least a portion of an object. The conical beam of light is generated by impinging a light beam on the surface of a concave, cylindrical reflector. The light beam enters the concave cylindrical reflector through the hollow shaft of a motor. The illuminated portion of the object is imaged on an array of photosensitive elements to produce corresponding signals that are representative of the image on the array. These signals can be used to obtain identification information concerning the object and guidance information for a plural axis manipulator employed in conjunction with the object. In one application the image acquisition apparatus is used in a robot to provide control signals for guiding the robot tool along a path, such as, a welding seam.

Abstract: A method and apparatus for image acquisition utilizing a non-planar beam of electro-magnetic radiation, such as, a hollow conical beam of light, to illuminate at least a portion of an object. The conical beam of light is generated by impinging a light beam on the surface of a concave, cylindrical reflector. The illuminated portion of the object is imaged on an array of photosensitive elements to produce corresponding signals that are representative of the image on the array. These signals can be used to obtain identification information concerning the object and guidance information for a plural axis manipulator employed in conjunction with the object. In one application the image acquisition apparatus is used in a robot to provide control signals for guiding the robot tool along a path, such as, a welding seam.