Patents by Inventor Charles J. Parrish

Charles J. Parrish has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120149133
    Abstract: Methods for the controlled manufacture of high aspect ratio features. The method may include forming a layer stack on a top surface of a substrate and forming features in the layers of the layer stack. The high aspect ratio features may be defined using a resist layer that is patterned with a photolithographic condition. After removing at least one of the layers removed from the top of the layer stack, a feature dimension may be measured for features at different locations on the substrate. The method may further include changing the photolithographic condition based on the measured dimension and processing another substrate using the changed photolithographic condition.
    Type: Application
    Filed: December 13, 2010
    Publication date: June 14, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Charles J. Parrish, Steven M. Shank
  • Patent number: 8193005
    Abstract: Methods for the controlled manufacture of high aspect ratio features. The method may include forming a layer stack on a top surface of a substrate and forming features in the layers of the layer stack. The high aspect ratio features may be defined using a resist layer that is patterned with a photolithographic condition. After removing at least one of the layers removed from the top of the layer stack, a feature dimension may be measured for features at different locations on the substrate. The method may further include changing the photolithographic condition based on the measured dimension and processing another substrate using the changed photolithographic condition.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: June 5, 2012
    Assignee: International Business Machines Corporation
    Inventors: Charles J. Parrish, Steven M. Shank
  • Patent number: 6856378
    Abstract: A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive at a new dose level estimating an optimum dose. When the system discovers that a new batch of resist is loaded to a tool, historical data is used to calculate a reference dose for each tool. A batch factor is continuously calculated and using historical data along with the batch factor, a dose adjustment is made to maintain proper image size.
    Type: Grant
    Filed: October 23, 2003
    Date of Patent: February 15, 2005
    Assignee: International Business Machines Corporation
    Inventors: Keith J. Machia, Matthew C. Nicholls, Charles J. Parrish, Craig E. Schneider, Charles A. Whiting
  • Publication number: 20040080738
    Abstract: A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive at a new dose level estimating an optimum dose. When the system discovers that a new batch of resist is loaded to a tool, historical data is used to calculate a reference dose for each tool. A batch factor is continuously calculated and using historical data along with the batch factor, a dose adjustment is made to maintain proper image size.
    Type: Application
    Filed: October 23, 2003
    Publication date: April 29, 2004
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Keith J. Machia, Matthew C. Nicholls, Charles J. Parrish, Craig E. Schneider, Charles A. Whiting
  • Patent number: 6694498
    Abstract: A method and system embodying the present invention for predicting systematic overlay affects in semiconductor lithography. This method is a feed-forward method, based on correlation of current and prior aligned levels, to predict optimum overlay offsets for a given lot. Instead of using population averaging, which ignores process variability, it acknowledges the variability and uses prior measurements to advantage. The principle, backed by production data, is that “systematic” overlay errors are just that: Image placement errors which persist through processing and will be predictable through time and processing.
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: February 17, 2004
    Assignee: Internationl Business Machines Corporation
    Inventors: Edward W. Conrad, Charles J. Parrish, Charles A. Whiting
  • Patent number: 6674516
    Abstract: A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive at a new dose level estimating an optimum dose. When the system discovers that a new batch of resist is loaded to a tool, historical data is used to calculate a reference dose for each tool. A batch factor is continuously calculated and using historical data along with the batch factor, a dose adjustment is made to maintain proper image size.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: January 6, 2004
    Assignee: International Business Machines Corporation
    Inventors: Keith J. Machia, Matthew C. Nicholls, Charles J. Parrish, Craig E. Schneider, Charles A. Whiting
  • Publication number: 20030156267
    Abstract: A predictive method is used to compensate for intermediate batch sensitivities which inevitably occur during resist batch changeover. The compensation is applied to historical dose levels to arrive at a new dose level estimating an optimum dose. When the system discovers that a new batch of resist is loaded to a tool, historical data is used to calculate a reference dose for each tool. A batch factor is continuously calculated and using historical data along with the batch factor, a dose adjustment is made to maintain proper image size.
    Type: Application
    Filed: February 20, 2002
    Publication date: August 21, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Keith J. Machia, Matthew C. Nicholls, Charles J. Parrish, Craig E. Schneider, Charles A. Whiting
  • Publication number: 20030115556
    Abstract: A method and system embodying the present invention for predicting systematic overlay affects in semiconductor lithography. This method is a feed-forward method, based on correlation of current and prior aligned levels, to predict optimum overlay offsets for a given lot. Instead of using population averaging, which ignores process variability, it acknowledges the variability and uses prior measurements to advantage. The principle, backed by production data, is that “systematic” overlay errors are just that: Image placement errors which persist through processing and will be predictable through time and processing.
    Type: Application
    Filed: December 13, 2001
    Publication date: June 19, 2003
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Edward W. Conrad, Charles J. Parrish, Charles A. Whiting