Abstract: Methods of finishing an edge of a glass sheet comprise the step of machining the edge of the glass sheet into a predetermined cross-sectional profile along a plane taken transverse to the edge of the glass sheet with an initial average edge strength ESi. The methods also include the step of finishing the edge with at least one finishing member, such as an endless belt, without substantially changing a shape of the predetermined cross-sectional profile. In one example, a wet slurry including an abrasive can be applied to at least one of a finishing member and the edge of the glass sheet. After finishing the edge, example finished average edge strengths ESf can be at least about 250 MPa. In addition or alternatively, in another example, the ratio ESf/ESi can be within a range of from about 1.6 to about 5.6.

Abstract: Methods of finishing an edge of a glass sheet comprise the step of machining the edge of the glass sheet into a predetermined cross-sectional profile along a plane taken transverse to the edge of the glass sheet with an initial average edge strength ESi. The methods also include the step of finishing the edge with at least one finishing member, such as an endless belt, without substantially changing a shape of the predetermined cross-sectional profile. In one example, a wet slurry including an abrasive can be applied to at least one of a finishing member and the edge of the glass sheet. After finishing the edge, example finished average edge strengths ESf can be at least about 250 MPa. In addition or alternatively, in another example, the ratio ESf/ESi can be within a range of from about 1.6 to about 5.6.

Abstract: The invention utilizes colloidal silica soot (62) in a semiconductor process for chemical-mechanical planarizing a semiconductor integrated circuit workpiece (24) with a slurry (60). The particulate abrasive agent colloidal solid sphere fused silica soot (62) provides a beneficial CMP slurry/process for semiconductor device manufacturing compared to standard semiconductor CMP slurries with conventional colloidal sol-gel or fumed silica.

Abstract: A method for producing lenses includes assembling a plurality of glass rods having a desired length into a single unit and cutting the single unit into multiple slices, each slice having a plurality of individual lenses. The method further includes finishing the slices to a desired thickness and surface finish and extracting the individual lenses from the slices.

Abstract: A method for producing lenses includes assembling a plurality of glass rods having a desired length into a single unit and cutting the single unit into multiple slices, each slice having a plurality of individual lenses. The method further includes finishing the slices to a desired thickness and surface finish and extracting the individual lenses from the slices.

Abstract: A two-part reagent method for polishing an inorganic silicate substrate is provided. The method comprises: providing a silicate substrate; providing a reagent comprising: a first part consisting essentially of an aqueous solution of at least one metal oxide abrasive selected from the group consisting of titania, zirconia, germania, and germania-doped silica; and a second part consisting essentially of an alkali aqueous solution of colloidal silica having a buffered pH value of at least about 10; polishing a surface of said substrate with the metal oxide abrasive aqueous solution to a surface roughness (Ra) ranging from about 6 Å to about 10 Å; and further polishing the surface with said alkali aqueous solution of colloidal silica to a roughness of less than or equal to about 5 Å.

Abstract: Methods of bonding glass articles that are subsequently drawn into sheets, rods, fibers, etc. are disclosed. Bonding is achieved without use of adhesives or high temperature fusion. The invention is particularly useful for bonding optical fiber preforms prior to drawing of the optical fiber.

Abstract: The invention provides a means for making below 200 nm VUV optical microlithography lens elements and preforms therefor. The inventive methods include polishing a fluoride optical lithography crystal with cerium to a surface roughness less than five angstroms. The invention includes making a 157 nm VUV optical lithography element preform by polishing a calcium fluoride crystal with cerium oxide polish.

Abstract: An aqueous solution of colloidal silica buffered to a pH value of about 10 or above, and inorganic silicate substrates finished to a surface roughness (Ra) of about 5 Å or less using such aqueous solution. The polished silicate substrate surface is consistently below about 2 Å Ra.

Abstract: A polishing application uses alkali, colloidal silica for polishing silicate-based glasses. Preferably, the silica solutions are adjusted to a pH of or above 10. The polished silicate-based glass surfaces have surface finishes consistently below 2 Å Ra. The unique method first polishes a surface of the substrate with an aqueous solution of at least one metal oxide abrasive and further polishes the surface of the substrate with an alkali aqueous solution of colloidal silica. Preferably, to the final smoothness of 2 Å Ra or less.

Abstract: An optical surface on a glass preform for an optical lens is simultaneously ground and polished. A glass blank is rotated by a work spindle mounted in an air bearing. A resin bonded diamond cutting ring is rotated by a tool spindle mounted in an air bearing. The axis of the tool spindle is set at an angle with respect to the axis of the work spindle with the edge of the cutting ring being centered on the axis of rotation of the blank. One of the spindles is moved linearly with respect to the other to move the cutting ring into engagement with the blank for grinding a precisely shaped, polished optical surface thereon. The spindles are mounted on a table and a driving motor for the linear drive is remote from the table to isolate the spindles from the vibration of the motor.

Abstract: Disclosed is an optical waveguide fiber coating system having means for cooling the hot fiber prior to the time that the fiber enters the coating apparatus. The cooling means comprises an elongated coolant tube through which the fiber passes. Cool dry helium is flowed into that end of the coolant tube into which the fiber enters. In a preferred embodiment, the coolant tube is surrounding by a chamber containing a liquified gas. The helium is cooled by flowing through a coil submerged in the liquified gas prior to being flowed into the tube. An iris diaphragm located at the fiber input end of the coolant tube prevents the entry of moist, warm air into that tube.