Patents by Inventor Charles Paquette

Charles Paquette has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11977919
    Abstract: Techniques for secure and efficient interfacing with a cloud computing service are described. In an embodiment, a cloud computing management service is programmed or configured to communicate with a cloud computing service. The cloud computing management service can be accessed by software engineers that are looking to deploy a software instance to a computing device of the cloud computing service. Thus, the cloud computing management service acts as an intermediary layer in front of the cloud computing service. In an embodiment, the cloud computing management service may store one or more frequently-used system parameters for deployment of software instances. The parameters conform to company's security protocols, compliance protocols, and/or other standards.
    Type: Grant
    Filed: June 4, 2021
    Date of Patent: May 7, 2024
    Assignee: Palantir Technologies Inc.
    Inventors: Daniel Paquette, Huw Pryce, Alexander Feldman, Ryan Zheng, Daniel Walker, Cody Moore, Patricio Velez, Gustav Brodman, Jakub Kozlowski, Eric Wong, Steven Capetta, Charles Post, Rick White
  • Publication number: 20140224512
    Abstract: An aeration tine includes a non-boronized elongated body including a first longitudinal end configured to support the tine relative to an aeration machine, and a second longitudinal end opposite the first longitudinal end, and a tapered nose attached to the second longitudinal end of the non-boronized elongated body, the tapered nose formed of a metal base treated by a boronization process such that the tapered nose has a an outer layer that is hardened relative to an inner portion of the metal base.
    Type: Application
    Filed: February 13, 2013
    Publication date: August 14, 2014
    Applicant: Enduratech Manufacturing, LLC
    Inventors: Habib Skaff, Clayton Ross, Charles Paquette
  • Patent number: 4725560
    Abstract: An annealing process carried out at 800.degree. C. in a wet O.sub.2 ambient permits the manufacture of a reliable storage capacitor wherein the dielectric layer is comprised of silicon oxynitride formed by low pressure chemical vapor deposition (LPCVD). The manufacturing process includes first depositing the silicon oxynitride film by LPCVD, second annealing in wet O.sub.2 at 800.degree. C. or N.sub.2 at 1000.degree. C., third forming an N-type region in the silicon substrate by As.sup.+ ion implantation through the silicon oxynitride film, fourth annealing in wet O.sub.2 at 800.degree. C., and fifth depositing an electrode.
    Type: Grant
    Filed: September 8, 1986
    Date of Patent: February 16, 1988
    Assignee: International Business Machines Corp.
    Inventors: John R. Abernathey, David L. Johnson, Pai-Hung Pan, Charles A. Paquette