Abstract: A method and system are provided for an integrated fluid and vapor delivery system design that optimizes vapor delivery. The method and system utilize a purgeable valve assembly which is closely coupled to a vaporizer. The purgeable valve assembly includes a liquid control valve and a purge gas valve which are connected by an outlet to the vaporizer in a manner minimizing the dead volume of the liquid supplied to the vaporizer. The system does not require the liquid precursor to be subjected to vacuum prior to entry into the vaporizer.

Abstract: A method and system are provided for an integrated fluid and vapor delivery system design that optimizes vapor delivery. The method and system utilize a purgeable valve assembly which is closely coupled to a vaporizer. The purgeable valve assembly includes a liquid control valve and a purge gas valve which are connected by an outlet to the vaporizer in a manner minimizing the dead volume of the liquid supplied to the vaporizer. The system does not require the liquid precursor to be subjected to vacuum prior to entry into the vaporizer.

Abstract: A method for purifying a precursor material for use in a chemical vapor deposition system comprising providing a precursor material suitable for chemical vapor deposition, and distilling the precursor material to provide, as a distillate, a purified precursor material from which at least one non-volatile component, at least one metal impurity, or a combination thereof has been removed. The method may be used to purify siloxane and silane precursor materials and reduce clogging of chemical vapor deposition components.

Abstract: An integrated fluid delivery system (IFDS) is provided for delivering fluid streams such as high purity fluid streams to a processing destination, such as a wafer processing chamber. The delivery system includes a first modular manifold for internally channeling the high purity fluid streams along seamless slots. The first modular manifold receives each of the high purity fluid streams at a corresponding porting aperture. At least one fluid device from a group consisting of a flow controller, a valve, a filter and a pressure transducer is provided. The at least one fluid device is in fluidic communication with a corresponding one of the high purity liquid streams of the first modular manifold to dispense the high purity fluid streams from the integrated liquid delivery system to the wafer processing chamber.

Abstract: An atomizer is provided for combining a precise mass of atomized liquid into a gas stream. The atomizer includes a mixing slot formed in a face of a base member. The mixing slot comprises a throat in fluid communication with a gas inlet side having a smoothly decreasing cross-sectional area and a mixture outlet side having a smoothly increasing cross-sectional area. A gas stream enters the mixing slot via gas inlet side and a liquid enters the mixing slot via a liquid inlet in fluid communication with the throat of the mixing slot. The mixing slot is sealed by a sealing member abutting the face of the base member with the mixing slot in it. The liquid is atomized and combined with a gas stream by venturi effect.

Abstract: A flow controller is provided for delivering a precise volume of fluid such as high purity fluid streams to a processing destination, such as a wafer processing chamber. The flow controller includes a base with a seamless slot formed in a face thereof, providing a predictable pressure drop. The seamless slot is in fluidic communication with a sensor channel extending downwardly from the seamless slot first having temperature sensors thereon for inferring the mass flow through the flow controller. A valve is in fluidic communication with the seamless slot and is operably connected to the temperature sensors such that the valve opening is adjusted until the mass flow inferred by the temperature sensors is equal to a desired mass flow.

Abstract: A vaporizer is provided for delivering vapor streams such as high purity streams to a processing destination, such as a wafer processing chamber. The vaporizer includes a heated base having one or more seamless slots formed in one of its faces for carrying a liquid which is vaporized by heat from the heated plate. In one embodiment, the vaporizer includes an atomizer for atomizing the liquid prior to vaporization to reduce the temperature of vaporization. In one embodiment, the vaporizer includes a heat exchanger having cross-slots intersecting a plurality of seamless slots to reduce unvaporized liquid from exiting the vaporizer.

Abstract: An atomizer is provided for combining a precise mass of atomized liquid into a gas stream. The atomizer includes a mixing slot formed in a face of a base member. The mixing slot comprises a throat in fluid communication with a gas inlet side having a smoothly decreasing cross-sectional area and a mixture outlet side having a smoothly increasing cross-sectional area. A gas stream enters the mixing slot via gas inlet side and a liquid enters the mixing slot via a liquid inlet in fluid communication with the throat of the mixing slot. The mixing slot is sealed by a sealing member abutting the face of the base member with the mixing slot in it. The liquid is atomized and combined with a gas stream by venturi effect.

Abstract: A flow controller is provided for delivering a precise volume of fluid such as high purity fluid streams to a processing destination, such as a wafer processing chamber. The flow controller includes a base with a seamless slot formed in a face thereof, providing a predictable pressure drop. The seamless slot is in fluidic communication with a sensor channel extending downwardly from the seamless slot first having temperature sensors thereon for inferring the mass flow through the flow controller. A valve is in fluidic communication with the seamless slot and is operably connected to the temperature sensors such that the valve opening is adjusted until the mass flow inferred by the temperature sensors is equal to a desired mass flow.

Abstract: An integrated fluid delivery system (IFDS) is provided for delivering fluid streams such as high purity fluid streams to a processing destination, such as a wafer processing chamber. The delivery system includes a first modular manifold for internally channeling the high purity fluid streams along seamless slots. The first modular manifold receives each of the high purity fluid streams at a corresponding porting aperture. At least one fluid device from a group consisting of a flow controller, a valve, a filter and a pressure transducer is provided. The at least one fluid device is in fluidic communication with a corresponding one of the high purity liquid streams of the first modular manifold to dispense the high purity fluid streams from the integrated liquid delivery system to the wafer processing chamber.

Abstract: A vaporizer is provided for delivering vapor streams such as high purity streams to a processing destination, such as a wafer processing chamber. The vaporizer includes a heated base having one or more seamless slots formed in one of its faces for carrying a liquid which is vaporized by heat from the heated plate. In one embodiment, the vaporizer includes an atomizer for atomizing the liquid prior to vaporization to reduce the temperature of vaporization. In one embodiment, the vaporizer includes a heat exchanger having cross-slots intersecting a plurality of seamless slots to reduce unvaporized liquid from exiting the vaporizer.

Abstract: A highly efficient evaporative cooler having high cooling capacity in relation to its size, wherein the incoming air is directed to flow along an evaporative pad, rather than directly therethrough, resulting in highly efficient temperature reduction of the incoming air.

Abstract: A calibration system for a mechanical gas volume corrector which has a first shaft turned at a rate corresponding to the otherwise uncorrected volumetric flow rate through the meter, a second shaft, a variable ratio transmission coupled between the first and second shafts, and a mechanism for altering the ratio of the transmission in response to changes of a physical condition of the gas. The calibration system includes an arrangement for applying a representation of a reference state of the physical condition to the ratio altering mechanism, and indicator for indicating a fixed number of revolutions of one of the shafts, an arrangement for determining the number of revolutions of the other of the shafts corresponding to the fixed number of revolutions of the one shaft, and a calculator for determining and displaying the ratio of the other shaft revolution number to the fixed number.

Abstract: An adjustable tangent assembly for a positive displacement diaphragm gas meter is provided with a pair of concentric face gears coaxial with the axis of rotation of the crank shaft and accessible through a small plug hole in the meter cover. An adjusting tool inserted through the plug hole allows independent self locking adjustment of the timing and stroke with high resolution.

Abstract: A gas meter is disclosed having a one-way index incorporated therein for causing the indicating means thereof to run only in a forward direction regardless of the actual direction of gas flow. A pivoting member is oscillated by a rotating cam coupled to the measuring means of the meter and includes pawls attached thereto for driving a ratchet wheel, coupled to the indicating means, in one direction only. By this arrangement, the oscillation of the member is independent of the direction of rotation of the cam, which rotation is indicative of the direction of gas flow.