Abstract: A valve assembly including an actuated valve and a sensor module is disclosed. The actuated valve includes a body defining a chamber, a first fluid port coupled to the chamber, and a second fluid port coupled to the chamber. The actuated valve further includes a movable stem disposed at least partially within the chamber, the movable stem having a closed position and an open position relative to the chamber, and an actuator coupled to the stem. The sensor module is attached to the actuated valve, and the sensor module includes a microcontroller, and at least one sensor coupled to the microcontroller, the at least one sensor providing a signal associated with a status of the actuated valve.

Abstract: A valve assembly including an actuated valve and a sensor module is disclosed. The actuated valve includes a body defining a chamber, a first fluid port coupled to the chamber, and a second fluid port coupled to the chamber. The actuated valve further includes a movable stem disposed at least partially within the chamber, the movable stem having a closed position and an open position relative to the chamber, and an actuator coupled to the stem. The sensor module is attached to the actuated valve, and the sensor module includes a microcontroller, and at least one sensor coupled to the microcontroller, the at least one sensor providing a signal associated with a status of the actuated valve.

Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.

Abstract: A fluid mixing apparatus and method include a first fluid assembly having at least one fluid nozzle for providing a first fluid; a second fluid assembly having at least one fluid mixing nozzle sized and shaped to be received by the at least one fluid nozzle for providing a second fluid into the first fluid; a mixing region disposed where the at least one fluid nozzle and the at least one fluid mixing nozzle coact in spaced relationship for providing turbulence to the first and second fluids, thereby providing a fluid mixture thereof; and a passageway in communication with the mixing region for expanding the fluid mixture into a different phase.

Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.

Abstract: A nozzle and method of providing CO2 for cleaning includes providing a CO2 flow; phase transferring the CO2 flow into gaseous CO2 and CO2 pellets; interrupting the CO2 flow with a screen member; retaining the CO2 pellets of a select larger size upstream of the screen member; permitting the CO2 pellets of a select smaller size to pass through the screen member for cleaning.

Abstract: A fluid mixing apparatus and method include a first fluid assembly having at least one fluid nozzle for providing a first fluid; a second fluid assembly having at least one fluid mixing nozzle sized and shaped to be received by the at least one fluid nozzle for providing a second fluid into the first fluid; a mixing region disposed where the at least one fluid nozzle and the at least one fluid mixing nozzle coact in spaced relationship for providing turbulence to the first and second fluids, thereby providing a fluid mixture thereof; and a passageway in communication with the mixing region for expanding the fluid mixture into a different phase.

Abstract: A nozzle and method of providing CO2 for cleaning includes providing a CO2 flow; phase transferring the CO2 flow into gaseous CO2 and CO2 pellets; interrupting the CO2 flow with a screen member; retaining the CO2 pellets of a select larger size upstream of the screen member; permitting the CO2 pellets of a select smaller size to pass through the screen member for cleaning.

Abstract: There is provided a method for purifying a gas stream such as for example a carbon dioxide gas stream by removing hydrocarbons from the carbon dioxide by heat exchange, impurity adsorption and cooling.

Abstract: An apparatus and method for cleaning polymer film are provided and include a support assembly for supporting the polymer film to be cleaned, the support assembly being constructed and arranged to move the polymer film for cleaning, and at least one nozzle disposed adjacent the polymer film for providing CO2 to the polymer film for dislodging particulate matter from the polymer film and the at least one aperture, and for cleaning thereof.

Abstract: A method for the selective removal of the metal film layer accumulated upon a photoresist layer during processing of substrates using a stream of carbon dioxide spray without disturbing conductor portions is provided. A constant stream of high pressure CO2 snow is applied to the metal film layer thereby rapidly cooling the metal layer on top of said resist layer causing it to shrink rapidly, and to debond, and peel from the photoresist layer underneath. The temperature of the substrate is raised and maintained at significantly higher than room temperature. Continuing the application of the CO2 spray causes thermal shock to the photoresist under the metalized layer causing large cracks in the remaining metal layer portions, said cracks typically including at least one loose metal edge. The CO2 spray is continually applied to the cracks thereby peeling away the remaining metal portions, leaving the exposed photoresist and underlying surface features.

Abstract: Liquid CO2 is expanded in specially designed primary and secondary nozzles to produce frozen solid CO2. The impurities initially contained in the liquid CO2 are trapped inside of the frozen CO2, which is collected in a clean container. The container is emptied on top of a high purity surface. The impurities are concentrated on the surface, since these impurities are non-volatile and do not escape with the CO2 gas formed as the frozen CO2 is heated by the ambient temperature to its sublimation point. After all of the frozen CO2 has sublimed, the surface can be analysed by standard analysis methods to determine quantity and composition of the impurities. The determination and quantification of non-volatile impurities, such as organic oils and greases, in the CO2 supply that feeds, for example, cleaning systems utilizing CO2, is thus made possible.

Abstract: Liquid CO2 is expanded in specially designed primary and secondary nozzles to produce frozen solid CO2. The impurities initially contained in the liquid CO2 are trapped inside of the frozen CO2, which is collected in a clean container. The container is emptied on top of a high purity surface. The impurities are concentrated on the surface, since these impurities are non-volatile and do not escape with the CO2 gas formed as the frozen CO2 is heated by the ambient temperature to its sublimation point. After all of the frozen CO2 has sublimed, the surface can be analysed by standard analysis methods to determine quantity and composition of the impurities. The determination and quantification of non-volatile impurities, such as organic oils and greases, in the CO2 supply that feeds, for example, cleaning systems utilizing CO2, is thus made possible.

Abstract: Liquid CO2 is expanded in specially designed primary and secondary nozzles to produce frozen solid CO2. The impurities initially contained in the liquid CO2 are trapped inside of the frozen CO2, which is collected in a clean container. The container is emptied on top of a high purity surface. The impurities are concentrated on the surface, since these impurities are non-volatile and do not escape with the CO2 gas formed as the frozen CO2 is heated by the ambient temperature to its sublimation point. After all of the frozen CO2 has sublimed, the surface can be analysed by standard analysis methods to determine quantity and composition of the impurities. The determination and quantification of non-volatile impurities, such as organic oils and greases, in the CO2 supply that feeds, for example, cleaning systems utilizing CO2, is thus made possible.

Abstract: An apparatus and method that enhances removal of contaminating particles from surfaces of a non-electrostatically sensitive components that are cleaned using a carbon dioxide cleaning spray. The apparatus includes a programmable power supply that is connected to ground and to the non-electrostatically sensitive component. The surface charge of the component is determined by cleaning the surface without adding any voltage or charge bias to the component. Then the surface is reversed-biased with a voltage having the opposite polarity by a large amount using the programmable power supply. The surface is then cleaned a second time, which removes the contaminating particles that were bound to the surface by electrostatic forces generated during the first cleaning. Thus, reversing the polarity of the charge on the surface that is to be cleaned removes the strong attraction between the contaminating particles and the surface and enhances removal of the contaminating particles from the surface.

Abstract: Apparatus and methods for removing particles from a surface of a semiconductor wafer or optical component using a carbon dioxide snow spray directed at the wafer or component while simultaneously irradiating the surface with a laser beam. The apparatus comprises a carbon dioxide jet spray cleaning system disposed within an environmental cleaning station of a processing system that processes the wafer or component. The processing system is a conveyorized system wherein a conveyor belt or web transports wafers or components from processing station to processing station. The cleaning station includes a recirculating blower system, a laminar flow screen, a high efficiency particulate air filter, and a ducting system for recirculating purified air or inert gas. The cleaning station contains a jet spray nozzle that produces a carbon dioxide snow spray. The jet spray nozzle is coupled by way of a manifold to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the jet spray nozzle.

Abstract: Apparatus for cleaning, assembling, testing and inspecting contamination sensitive hardware. The apparatus includes an environmental process enclosure having an inner processing chamber, and a carbon dioxide jet spray cleaning system. The enclosure includes a loadlock pass-through having front and rear access doors for providing access to the inner processing chamber. A blower is disposed in the enclosure for circulating purified gas therethrough. A prefilter disposed prior to an inlet of the blower, and a high purity filter and laminar flow screen are disposed in the inner processing chamber. A heater is provided for heating the purified gas and a temperature controller is coupled to the heater for controlling the temperature of the purified gas. A table is disposed in the inner processing chamber upon which contamination sensitive hardware and testing and assembly apparatus may be placed.

Abstract: A method of removing photoresist or redeposited material from a substrate or other surface using a carbon dioxide jet spray. A substrate having photoresist or redeposited material on its surface is disposed in an environmental enclosure. A carbon dioxide jet spray is generated and directed onto the surface of the substrate and photoresist or redeposited material. The carbon dioxide jet spray cools or freezes the material and causes a mismatch in the thermal coefficient of expansion of the material and the substrate. The material debonds from the substrate due to the induced thermal shock to the material. This rapid shrinkage loosens the material and allows the solid particles in the spray to knock the material from the surface of the substrate. The removed photoresist or redeposited material may be collected in a filter, and removed.

Abstract: An apparatus and method that enhances removal of contaminating particles from surfaces of a static-sensitive components that are cleaned using a carbon dioxide cleaning spray produced by a jet spray gun. The apparatus has a programmable power supply that is connected to ground, to the static-sensitive component, and to the jet spray gun. The static-sensitive component is cleaned using the cleaning spray and the surface charge generated on the surface of the component or substrate is simultaneously monitored to determine the amount and polarity of the charge that is generated thereon. The programmable power supply then applies a reverse bias to the jet spray gun that is equal to and has the opposite polarity of the charge that is generated on the surface of the static-sensitive component or substrate, which neutralizes the charge generated on the surface of the component.

Abstract: Apparatus for cleaning a wafer carrying cassette. The cassette is fabricated as open top box having closed sides and a plurality of grooves formed in its interior that each hold a wafer. The apparatus includes an enclosure having an entry and an exit, and a conveyor is provided for transporting the cassette through the enclosure. A first plurality of jet spray nozzles are disposed adjacent to the entry that produce a carbon dioxide jet spray that cleans exterior surfaces of the cassette as it travels through the entry. A blower produces a flow of air through the enclosure and a filter filters the air flowing through the enclosure. A second plurality of moveable jet spray nozzles is controlled to move into the interior of the cassette to generate a carbon dioxide spray that cleans the interior of the cassette. An electrostatic control system is provided that controls buildup of electrostatic charge on the cassette caused by the carbon dioxide spray.