Abstract: Polishing pads are provided having a polishing surface formed from a material. The polishing surface has a topography produced by a thermoforming process. The topography consists of large and small features that facilitate the flow of polishing fluid and facilitate smoothing and planarizing.

Abstract: An improved method and apparatus for enabling unsupported packaging film (e.g., low density polyethylene, linear low density polyethylene, and high density polyethylene) to be sealed in a tube in the process of making a flexible package. A “following belt” is provided which allows for a sandwiching effect to be imported on the film as it passes through its welding zone. In the prior art, while in this welding zone the polyethylene film would move with a conventional band seal assembly. But the opposite side of the polyethylene film would have to move relative to a drag iron this causing potential friction, seam failure and poor tracking. The present invention's use of a following belt allows the elements on both sides of the unsupported film to move with the film.

Abstract: Polishing pads are provided having a polishing surface formed from a material. The polishing surface has a topography produced by a thermoforming process. The topography consists of large and small features that facilitate the flow of polishing fluid and facilitate smoothing and planarizing.

Abstract: Polishing pads are provided having a polishing surface formed from a material. The polishing surface has a topography produced by a thermoforming process. The topography consists of large and small features that facilitate the flow of polishing fluid and facilitate smoothing and planarizing.

Abstract: Polishing pads are provided having a polishing surface formed from a hydrophilic material. The polishing surface has a topography produced by a thermoforming process. The topography consists of large and small features that facilitate the flow of polishing fluid and facilitate smoothing and planarizing.

Abstract: An improved polishing pad is provided comprising a solid uniform polymer sheet having no intrinsic ability to absorb or transport slurry particles having during use a surface texture or pattern which has both large and small flow channels present simultaneously which permit the transport of slurry across the surface of the polishing pad, where said channels are not part of the material structure but are mechanically produced upon the pad surface. In a preferred version of the invention, the pad texture consists of a macrotexture produced prior to use and a microtexture which is produced by abrasion by a multiplicity of small abrasive points at a regular selected interval during the use of the pad.

Abstract: Apparatus for withdrawing a gas from a source and conditioning the gas for subsequent analysis for total reduced sulfur content comprising a gas probe having an inlet for a stream of gas and an outlet therefor, a conduit having means to provide heat to a gas stream flowing therein extending from the probe outlet to a condenser for cooling the gas and condensing out water, a second conduit from the condenser to a vacuum which causes a gas stream to enter the probe and flow through the heatable conduit to the condenser and then the second conduit, a third conduit for delivering a stream of gas from the second conduit to a scrubber to wash the gas stream with a scrubbing liquid, a demistor for removing the gas stream from the scrubber and separating entrained scrubbing liquid, and a pump for pumping the scrubbed gas stream, from which scrubbing liquid has been removed, to an analyzer and flow meter.A method of conditioning the gas for analysis using the apparatus is also disclosed.